Anchorless electrostatically activated micro electromechanical system switch

1. A micro electromechanical system switch comprising:

a substrate:

a stress free beam disposed above the substrate and provided within first and second platforms, the first and second platforms being disposed on the substrate to limit displacement of the stress free beam in directions that are not substantially parallel to the substrate; and

a set of one or more control pads disposed in a vicinity of a first lengthwise side of the stress free beam, for creating a potential on the first lengthwise side of the stress free beam,

wherein,

the stress free beam is displaceable in directions substantially parallel to the substrate in accordance with the potential for providing a signal path, and

the first and second platforms are further for receiving an input signal.

2. The micro electromechanical system switch of claim 1 , further comprising:

at least one additional stress free beam substantially identical to the stress free beam; and

a primary stress free beam structurally and electrically coupled to the stress free beam and the at least one additional stress free beam;

wherein the primary stress free beam is displaceable in the directions substantially parallel to the substrate for providing the signal path as a result of the displacement of the at least one additional stress free beam and the stress free beam.

3. The micro electromechanical system switch of claim 1 , further comprising an output contact pad disposed on the substrate and in the vicinity of the first lengthwise side of the stress free beam, wherein the output contact pad is for becoming electrically coupled to the stress free beam to thereby provide the signal path between the output contact pad, the stress free beam and the first and second platforms when the potential is created by the one or more control pads.

4. The micro electromechanical system switch of claim 3 , further comprising:

another set of one or more control pads disposed on the substrate and in a vicinity of a second lengthwise side of the stress free beam, for creating another potential on the second lengthwise side of the stress free beam; and

another output contact pad disposed on the substrate and in the vicinity of the second lengthwise side of the stress free beam.

5. The micro electromechanical system switch of claim 4 , wherein:

the set of one or more control pads and the another set of one or more control pads are further for creating a relative potential between the first and second lengthwise sides of the stress free beam that is based on a difference between the potential and the another potential; and

the stress free beam is displaced either to the output contact pad and maintains contact therewith or to the another output contact pad and maintains contact therewith when the relative potential is greater than or equal to a threshold potential.

6. The micro electromechanical system switch of claim 5 , wherein:

the substrate is transparent; and

the stress free beam is further for permitting a light signal to be transmitted through the substrate when the stress free beam is in contact with a first of the output contact pad or the another output contact pad and is for blocking the light signal when the stress free beam is in contact with a second of the output contact pad or the another output contact pad.

7. The micro electromechanical system switch of claim 5 , wherein the stress free beam includes a light reflective layer on a top surface thereof for reflecting a light signal when the stress free beam is in contact with a first of the output contact pad or the another contact output pad and for permitting the light signal to be absorbed by the substrate when the stress free beam is in contact with a second of the output contact pad or the another output contact pad.

8. The micro electromechanical system switch of claim 5 , wherein:

the stress free beam includes a light reflecting mirror;

each of the set of one or more control pads and the another set of one or more control pads comprises at least two control pads, the at least two control pads of the set of one or more control pads respectively oppose the at least two control pads of the another set of one or more control pads;

the stress free beam is angularly displaceable in accordance with the relative potential when the relative potential is between non-opposing control pads to displace a light signal in accordance with the angular displacement of the stress free beam; and

the stress free beam is further laterally displaceable in accordance with the relative potential when the relative potential is between opposing control pads to displace the light signal perpendicularly to the stress free beam.

9. The micro electromechanical system switch of claim 3 , wherein the stress free beam comprises extended width portions within the first and second platforms and opposing the output contact pad, respectively for preventing the stress free beam from becoming substantially electrically coupled to the set of one or more control pads and the another set of one or more control pads.

10. The micro electromechanical system switch of claim 1 , wherein each of the first and second platforms comprises an extended sidewall for restricting horizontal displacement of the stress free beam.

11. The micro electromechanical system switch of claim 10 , wherein the each of the first and second platforms further comprises a beam latch for substantially preventing vertical displacement of the stress free beam.

12. A micro electromechanical system switch comprising:

a stress free beam disposed above a substrate and responsive to a relative potential for controlling a signal flow, wherein the stress free beam is displaceable in directions substantially parallel to the substrate to selectively make and break electrical contact with an output contact pad disposed on the substrate according to the relative potential; and

first and second platforms disposed on the substrate for limiting displacement of the stress free beam in directions other than substantially parallel to the substrate,

wherein each of the first and second platforms comprises a beam latch for substantially preventing vertical displacement of the stress free beam and an extended sidewall for restricting horizontal displacement of the stress free beam.

13. The micro electromechanical system switch of claim 12 , wherein the stress free beam further comprises a light reflective layer for reflecting a light signal based upon the relative potential.

14. The micro electromechanical system switch of claim 12 , wherein:

the substrate is transparent for permitting passage of a light signal; and

the stress free beam is further for reflecting the light signal based upon the relative potential.

15. The micro electromechanical system switch of claim 12 , further comprising first and second control pads disposed on the substrate for providing the relative potential.

16. The micro electromechanical system switch of claim 15 , wherein the stress free beam has different widths in the lengthwise direction for restricting displacement and for preventing contact with the first and second control pads.

17. The micro electromechanical system switch of claim 15 , further comprising another output contact pad disposed on the substrate,

wherein the stress free beam is further displaceable in the directions substantially parallel to the substrate to selectively make and break electrical contact with the output contact pad or the another output contact pad according to the relative potential.