Anti-reflective coating for photolithography and methods of preparation thereof
View Patent ↗Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
1. An absorbing composition formed from the constituents consisting of:
tetraethoxysilane (TEOS);
methyltriethoxysilane (MTEOS);
at least one incorporatable absorbing compound, wherein the incorporatable absorbing compound comprises two or more benzene rings;
at least one material modification agent comprising γ-aminopropyltriethoxysilane (APTEOS);
at least one catalyst comprising an acid; and
at least one solvent.
2. An absorbing composition formed from the constituents consisting of:
tetraethoxysilane (TEOS);
methyltriethoxysilane (MTEOS);
at least one incorporatable absorbing compound;
γ-aminopropyltriethoxysilane (APTEOS);
at least one catalyst comprising nitric acid, hydrochloric acid, lactic acid, acetic acid, oxalic acid, succinic acid or maleic acid; and
at least one solvent.
3. The composition of claim 2 , wherein the incorporatable absorbing compound strongly absorbs light over at least an approximately 0.5 nm wide wavelength range at wavelengths less than 375 nm.
4. The composition of claim 2 , wherein the incorporatable absorbing compound strongly absorbs light over at least an approximately 10 nm wide wavelength range at wavelengths less than 375 nm.
5. The composition of claim 3 , wherein the range comprises wavelengths less than about 260 nm.
6. The composition of claim 1 , wherein the two or more benzene rings are fused.
7. The composition of claim 2 , wherein the incorporatable absorbing compound comprises anthraflavic acid, 9-anthracene carboxylic acid, 9-anthracene methanol, alizarin, quinizarin, primuline, 2-hydroxy-4(3-triethoxysilylpropoxy)-diphenylketone, rosolic acid, triethoxysilylpropyl-1,8-naphthalimide, 9-anthracene carboxy-alkyl triethoxysilane, phenyltriethoxysilane, 10-phenanthrene carboxy-methyl triethoxysilane, 4-phenylazophenol, 4-ethoxyphenylazobenzene-4-carboxy-methyl triethoxysilane, 4-methoxyphenylazobenzene-4-carboxy-methyl triethoxysilane or mixtures thereof.
8. A coating solution comprising the composition of claim 2 and an additional solvent or a solvent mixture.
9. The coating solution of claim 8 , wherein the solution is between about 0.5% and about 20% by weight incorporatable absorbing compound.
10. The composition of claim 2 , wherein the incorporatable absorbing compound is an organic-based compound.
11. An absorbing composition formed from the constituents consisting of:
tetraethoxysilane (TEOS);
methyltriethoxysilane (MTEOS);
at least one incorporatable absorbing compound;
at least one material modification agent comprising γ-aminopropyltriethoxysilane (APTEOS);
at least one catalyst comprising an acid, wherein the catalyst comprises nitric acid; and
at least one solvent.
12. The absorbing composition of claim 2 , wherein the at least one absorbing compound is a silicon-based compound.
13. The absorbing composition of claim 2 , wherein the at least one absorbing compound is a naphthalene-based, phenanthrene-based, anthracene-based, or phenyl-based compound.
14. The absorbing composition of claim 2 , wherein the solvent comprises isopropylalcohol, propanol, butanol, ethanol, acetone, toluene, cyclohexanone, butyrolactone, methylethylketone, methylisobutylketone, N-methylpyrrolidone, polyethyleneglycolmethylether, mesitylene, anisole, 2-heptanone, propylene glycol methyl ether acetate, at least one ether, ethyl lactate, water or a combination thereof.
15. The absorbing composition of claim 2 , wherein the solvent comprises propylene glycol methyl ether acetate (PGMEA).
16. The composition of claim 11 , wherein the incorporatable absorbing compound strongly absorbs light over at least an approximately 0.5 nm wide wavelength range at wavelengths less than 375 nm.
17. The composition of claim 11 , wherein the incorporatable absorbing compound strongly absorbs light over at least an approximately 10 nm wide wavelength range at wavelengths less than 375 nm.
18. The composition of claim 11 , wherein the incorporatable absorbing compound comprises anthraflavic acid, 9-anthracene carboxylic acid, 9-anthracene methanol, alizarin, quinizarin, primuline, 2-hydroxy-4(3-triethoxysilylpropoxy)-diphenylketone, rosolic acid, triethoxysilylpropyl-1,8-naphthalimide, 9-anthracene carboxy-alkyl triethoxysilane, phenyltriethoxysilane, 10-phenanthrene carboxy-methyl triethoxysilane, 4-phenylazophenol, 4-ethoxyphenylazobenzene-4-carboxy-methyl triethoxysilane, 4-methoxyphenylazobenzene-4-carboxy-methyl triethoxysilane or mixtures thereof.
19. The composition of claim 11 , wherein the at least one absorbing compound is a silicon-based compound.
20. The composition of claim 11 , wherein the at least one absorbing compound is a naphthalene-based, phenanthrene-based, anthracene-based, or phenyl based compound.