IP Library Granted Patent US 7,376,305
Granted Patent B2
US 7,376,305 · App. 10/496,488 · Granted May 20, 2008

Echelle gratings with low Polarization Dependent Loss (PDL) using metal coating on the reflecting facets only

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Quick Facts
Patent No.
US 7,376,305
App. No.
10/496,488
Granted
May 20, 2008
Kind
B2
Abstract

An Echelle grating has alternate first ( 1 a ) and second ( 1 b ) sets of facets ( 1 ). The first set of facets ( 1 a ) is operative to reflect incident light ( 4 ) for diffraction and the second set of facets ( 1 b ) extends between adjacent facets of the first set ( 1 a ). Only the first set of facets ( 1 a ) is metallized to enhance reflection. The second set of facets ( 1 b ) is left unmetallized. This configuration reduces polarization dependent loss (PDL).

Claims (12)

1. An Echelle grating integrated with a slab waveguide comprising alternate first and second sets of facets etched on to an exposed end surface of said slab waveguide defining angled recesses filled with air at the end of said slab waveguide,

wherein said first set of facets are operative to reflect incident light for diffraction;

wherein said facets of said second set of facets extend between adjacent facets of said first set, and

wherein only said first set of facets is metalized to enhance reflection, and said second set of facets is unmetallized.

2. An Echelle grating as claimed in claim 1 , wherein said first set of facets is metalized with an aluminum layer.

3. A method of making an echelle or echelette grating, comprising the steps of:

a) forming a plurality of facets on a slab waveguide defining angled recesses filled with air at the end of said slab waveguide; and

b) selectively depositing a metal layer only on alternate facets that are operative to reflect incident light for diffraction.

4. A method as claimed in claim 3 , wherein step b) includes depositing said metal layer on all said facets, and then selectively removing metal from alternate facets between said facets operative to reflect incident light for diffraction.

5. A method as claimed in claim 4 , wherein said metal layer is removed from alternate facets by selective etching.

6. A method as claimed in claim 3 , wherein step b) includes depositing said metal layer on alternate facets by directional deposition.

7. A method as claimed in claim 3 , wherein said metal comprises aluminum.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2007
From: ENABLENCE HOLDINGS LLC
To: ENABLENCE INC.
Reel/Frame 019215/0815 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2007
From: RYAN, JOHN J., III
To: ENABLENACE HOLDINGS LLC
Reel/Frame 019222/0146 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 26, 2007
From: TW ROCK INC.
To: RYAN, JOHN J., III
Reel/Frame 019064/0396 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2006
From: DELAGE, ANDRE; LAMONTAGNE, BORIS; DOSSOU, KOKOU; JANZ, SIEGFRIED; ERICKSON, LYNDEN; XU, DAN-XIA; SYLVAIN, CHARBONNEAU
To: LNL OPTENIA, INC.
Reel/Frame 018262/0520 →