IP Library Granted Patent US 7,487,649
Granted Patent B2
US 7,487,649 · App. 10/499,327 · Granted Feb 10, 2009

Method for manufacturing glass substrate for image display

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Quick Facts
Patent No.
US 7,487,649
App. No.
10/499,327
Granted
Feb 10, 2009
Kind
B2
Abstract

The present invention provides a manufacturing method of a glass substrate for an image display device having high picture quality. The reducing force in a float furnace is controlled to be decreased so that Sn++ content on a surface of the glass substrate forming an Ag electrode is a predetermined value or less. When the resultant Sn ++ content on the surface of the glass substrate forming the Ag electrode exceeds the predetermined value, the surface is partially removed to decrease the Sn ++ content to the predetermined value or less to suppress the occurrence of yellowing of the glass substrate.

Claims (10)

1. A manufacturing method of a glass substrate for an image display device, comprising:

forming the glass substrate by a float method in a float furnace, an atmosphere in the float furnace including hydrogen and nitrogen;

measuring a reflectance of the glass substrate at a wavelength of 220 nm by a reflectance measuring device; and

if the measured reflectance exceeds 5%, controlling a hydrogen concentration in the float furnace to be 2 vol. % or less, so as to weaken a reducing force in the float furnace and thereby control an Sn ++ content in the glass substrate.

2. A manufacturing method of a glass substrate for an image display device, comprising:

forming the glass substrate by a float method in a float furnace, an atmosphere in the float furnace including hydrogen and nitrogen;

measuring a reflectance of the glass substrate at a wavelength of 220 nm by a reflectance measuring device;

controlling the reflectance to be 5% or less by controlling a hydrogen concentration in the float furnace to be 2 vol. % or less, so as to decrease a reducing force in the float furnace;

after said controlling of the reflectance, further measuring the reflectance of the glass substrate at the wavelength of 220 nm by the reflectance measuring device; and

if the further-measured reflectance of the glass substrate at a wavelength of 220 nm exceeds 5%, removing a portion of a surface of the glass substrate on which an Ag electrode is to be formed.

Assignments (2)
CHANGE OF NAME Recorded Oct 27, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021738/0878 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 17, 2004
From: ADACHI, DAISUKE; TSUJI, HIROYASU; SUMIDA, KEISUKE
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 016417/0661 →