Enhanced photodetector
View Patent ↗The present invention includes a photodiode having a first p-type semiconductor layer and an n-type semiconductor layer coupled by a second p-type semiconductor layer. The second p-type semiconductor layer has graded doping along the path of the carriers. In particular, the doping is concentration graded from a high value near the anode to a lower p concentration towards the cathode. By grading the doping in this way, an increase in absorption is achieved, improving the responsivity of the device. Although this doping increases the capacitance relative to an intrinsic semiconductor of the same thickness, the pseudo electric field that is created by the graded doping gives the electrons a very high velocity which more than compensates for this increased capacitance.
1. A photodiode comprising:
a semi-insulating substrate layer;
a first p-type semiconductor layer;
an n-type semiconductor layer; and
a second p-type semiconductor layer disposed between the first p-type semiconductor layer and the n-type semiconductor layer, the second p-type semiconductor being directly adjacent to the n-type semiconductor, the second p-type semiconductor layer having a graded doping concentration along the path of the carriers, the graded doping concentration defines defining a first concentration adjacent to the first p-type semiconductor layer and a second concentration adjacent to the n-type semiconductor layer, the first concentration being greater than the second concentration.
2. The photodiode of claim 1 further comprising an anode layer for collecting holes.
3. The photodiode of claim 1 further comprising a cathode layer for collecting electrons.
4. The photodiode of claim 1 wherein the first p-type semiconductor layer is InAlAs.
5. The photodiode of claim 1 wherein the n-type semiconductor layer is InAlAs.
6. The photodiode of claim 1 wherein the second p-type semiconductor layer is InGaAs.
7. A photodiode comprising:
a first p-type semiconductor layer;
an n-type semiconductor layer; and
a second p-type semiconductor layer disposed between the first p-type semiconductor layer and the n-type semiconductor layer such that the second p-type semiconductor is directly adjacent to the n-type semiconductor, the second p-type semiconductor layer having a graded doping concentration,
the graded doping concentration defining a first concentration adjacent to the first p-type semiconductor layer and a second concentration adjacent to the n-type semiconductor layer, the first concentration being greater than the second concentration, and
the first concentration being located at a position x o and defining a concentration P o , and the graded doping concentration being governed by the following equation:
p
=
p
o
ⅇ
-
x
D
over the depth D of the second p-type semiconductor layer for all x and D greater than zero.
8. The photodiode of claim 7 wherein the depth, D, for the first concentration is between 800 and 1000 angstroms in length.
9. A method of fabricating a photodiode comprising:
providing a substrate layer;
depositing an n-type semiconductor layer on the substrate;
depositing a second p-type semiconductor layer having a p-type dopant on the n-type semiconductor layer;
grading the p-type dopant of the second p-type semiconductor layer from a first concentration to a second concentration, the first concentration being greater than the second concentration; and
depositing a first p-type semiconductor layer on the second p-type semiconductor layer, the second p-type semiconductor layer being between the first p-type semiconductor layer and the n-type semiconductor layer such that the second concentration is directly adjacent to the n-type semiconductor layer.
10. The method of claim 9 further comprising the step of affixing an anode to collect holes.
11. The method of claim 9 further comprising the step of affixing a cathode to collect electrons.
12. The method of claim 9 wherein the first p-type semiconductor layer is InAlAs.
13. The method of claim 9 wherein the n-type semiconductor layer is InAlAs.
14. The method of claim 9 wherein the second p-type semiconductor layer is InGaAs.
15. A method of fabricating a photodiode comprising:
providing a substrate layer;
depositing an n-type semiconductor layer on the substrate;
depositing a second p-type semiconductor layer having a p-type dopant on the n-type semiconductor layer;
grading the p-type dopant of the second p-type semiconductor layer from a first concentration to a second concentration, wherein the first concentration is greater than the second concentration; and
depositing a first p-type semiconductor layer on the second p-type semiconductor layer, wherein the second p-type semiconductor layer is between the first p-type semiconductor layer and the n-type semiconductor layer such that the second concentration is directly adjacent to the n-type semiconductor layer, and
wherein the first concentration is located at a position x o and defines a concentration P o , and further wherein the graded doping concentration is governed by the following equation:
p
=
p
o
ⅇ
-
x
D
over the depth D of the second p-type semiconductor layer for all x and D greater than zero.
16. A photodiode having a first p-type semiconductor layer and an n-type semiconductor layer comprising:
a second p-type semiconductor layer disposed between the first p-type semiconductor layer and the n-type semiconductor layer such that the second p-type semiconductor is directly adjacent to the n-type semiconductor, the second p-type semiconductor layer having a graded doping concentration, wherein the graded doping concentration is governed by the following equation:
p
=
p
o
ⅇ
-
x
D
over the depth D of the second p-type semiconductor layer for all x and D greater than zero.
17. The photodiode of claim 16 wherein the second p-type semiconductor layer is a type III–V semiconductor.
18. The photodiode of claim 16 wherein the second p-type semiconductor layer is InGaAs.