IP Library Granted Patent US 7,030,979
Granted Patent B2
US 7,030,979 · App. 10/502,927 · Granted Apr 18, 2006

Microwave plasma source

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Quick Facts
Patent No.
US 7,030,979
App. No.
10/502,927
Granted
Apr 18, 2006
Kind
B2
Abstract

A plasma source for a spectrometer includes a plasma torch ( 10 ) located within a waveguide or resonant cavity ( 40 ) for both the electric and the magnetic field components of a microwave electromagnetic field to excite a plasma ( 54 ). This produces a plasma ( 54 ) having a generally elliptical cross section into which sample is relatively easily injected but which still provides good thermal coupling between the plasma and the sample. The invention gives significantly improved limits of detection compared to prior art microwave induced plasma systems. The torch is preferably axially aligned with the direction of the magnetic field component and may be located within a resonant iris ( 32 ) within the waveguide or cavity ( 40 ).

Claims (16)

1. A plasma source for a spectrometer including

a plasma torch having at least one passage for supply of a plasma forming gas,

means for applying a microwave electromagnetic field to the plasma torch,

said means being associated with the torch for both the electric and the magnetic field components of the applied microwave electromagnetic field to excite a plasma of the plasma forming gas.

2. A plasma source as claimed in claim 1 wherein the plasma torch has a longitudinal axis that is axially aligned with the direction of the magnetic field component.

3. A plasma source as claimed in claim 2 where in the means for applying a microwave electromagnetic field includes a waveguide.

4. A plasma source as claimed in claim 3 wherein the means for applying a microwave electromagnetic field includes a resonant iris within which the plasma torch is located, the resonant iris being located within the waveguide.

5. A plasma source as claimed in claim 4 wherein the resonant iris is located close to a magnetic field maximum or low impedance point within the waveguide.

6. A plasma source as claimed in claim 3 , wherein the waveguide is a resonant cavity.

7. A plasma source as claimed in claim 6 wherein the means for applying a microwave electromagnetic field further includes a microwave source that supplies the microwave energy directly into the resonant cavity.

8. A plasma source as claimed in claim 7 wherein the microwave source is a magnetron.

9. A plasma source as claimed in claim 3 including means for introducing and extracting a gaseous coolant into and from the waveguide or resonant cavity whereby the waveguide or resonant cavity provides a duct for the coolant.

10. A method of producing a plasma for spectrochemical analysis of a sample including relatively locating a plasma torch within a microwave electromagnetic field for both the electric and the magnetic field components of the microwave electromagnetic field to be applied to the plasma torch for both the field components simultaneously to excite a plasma in a plasma forming gas flowing through the torch.

11. A method as claimed in claim 10 , wherein the step of relatively locating includes axially aligning the torch with the direction of the magnetic field component.

12. A method as claimed in claim 11 wherein the step of relatively locating includes positioning the torch partway between the position of a magnetic field maximum and the positions of an electric field maximum.

13. A method as claimed in claim 12 wherein the plasma torch is located such that the electric and magnetic field components form a plasma of generally elliptical cross section.

Assignments (2)
CHANGE OF NAME Recorded Apr 13, 2011
From: VARIAN AUSTRALIA PTY LTD
To: AGILENT TECHNOLOGIES AUSTRALIA (M) PTY LTD
Reel/Frame 026113/0253 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 28, 2004
From: HAMMER, MICHAEL R.
To: VARIAN AUSTRALIA PTY LTD
Reel/Frame 016071/0053 →