Gas-barrier material
View Patent ↗A gas-barrier laminate comprising a base film, a thin film formed on the base film and comprising a metal compound selected from the group consisting of oxides, carbides and nitrides of metals, and mixtures thereof, and a plastic film formed on the metal compound thin film in which a film obtained by forming the metal compound thin film on the base film is subjected to a heat treatment, and having an oxygen permeability of not more than 2 cc/m 2 /day/atm, wherein when the laminate is subjected to hydrothermal treatment at 120° C. for 30 min, a change in oxygen permeability of the laminate between before and after the hydrothermal treatment is not more than 5.
1. A gas-barrier film comprising:
a base film,
an anchor coat layer which is a cured film comprising a mixture containing an oxazoline group-containing resin and at least one resin selected from the group consisting of acrylic-based resins, urethane-based resins and polyester-based resins and,
a thin film formed on the anchor coat layer which has a thickness of 3 to 20 nm and comprises a metal compound selected from the group consisting of oxides, carbides and nitrides of metals, and mixtures thereof,
which gas-barrier film has an oxygen permeability of not more than 3 cc/m 2 /day/atm and has such a property that when a laminate comprising the gas-barrier film and an unstretched polypropylene film having a thickness of 50 μm which is laminated on the metal compound thin film of the gas-barrier film is subjected to a hydrothermal treatment at 120° C. for 30 mm, a change in oxygen permeability of the laminate between before and after the hydrothermal treatment (after/before) is not more than 5.
2. A gas-barrier film according to claim 1 , wherein the base film comprises polyester or polyamide.
3. A gas-barrier film according to claim 1 , wherein the metal compound thin film is a deposited film comprising silicon oxide.
4. A gas-barrier film according to claim 1 , wherein the film having a layer structure successively comprising the base film, the anchor coat layer and the metal compound thin film exhibits a critical load of not less than 2.0 μN when being subjected to nano-scratch measurement on a surface of the metal compound thin film.
5. A gas-barrier film according to claim 1 , wherein the change in oxygen permeability of the gas-barrier film between before and after the hydrothermal treatment (after/before) is not more than 4.