Exhaust gas treatment
View Patent ↗A method for scrubbing a halogen-containing gas, comprises contacting the halogen-containing gas with water at a temperature of at least 30° C., the gas optionally subsequently being subjected to a further treatment step comprising contacting it with water at a temperature of less than 30° C. and/or a gas dilution step. An apparatus for carrying out the method comprises a hot wash chamber ( 6 ) and optionally a cold wash chamber ( 7 ) and/or a gas dilution device ( 13 ).
1. A method of scrubbing a halogen-containing gas stream, comprising:
contacting the gas stream with water at a temperature of at least 40° C. for facilitating chemical reaction between the gas stream and the water at a temperature of at least 40° C.; and
a further treatment step comprising contacting the gas stream with water at a temperature of less than 30° C. for dissolving the gas steam in the water of less than 30° C.
2. A method according to claim 1 , in which the water is in the liquid phase.
3. A method according to claim 1 , in which the gas stream is contacted with water vapor.
4. A method according to claim 1 , in which the gas stream is contacted with water at a temperature of from 35° C. to 80° C.
5. A method according to claim 1 , comprising diluting the gas stream with a diluent gas.
6. A method according to claim 5 in which the gas stream is contacted with the diluent gas in a cyclone device.
7. A method of claim 1 , comprising subsequently treating the gas stream in a cyclone device in which it is diluted with a diluent gas stream and withdrawing separately from the cyclone device solid particulate material and a treated gas stream.
8. A method according to claim 7 , in which the diluent gas is air.
9. A method according to claim 7 , in which the halogen-containing gas stream is an exhaust gas from semiconductor manufacture.
10. A method according to claim 7 , in which in the water-contacting step the gas stream is arranged to be in generally counterflow relationship with the water.
11. A method according to claim 10 , in which in the water-contacting step the gas stream is caused to flow in a generally upward direction and the water is caused to flow in a generally downward direction.
12. A method according to claim 7 , in which the halogen-containing gas stream is a fluorine-containing gas stream.
13. A method according to claim 5 in which the diluent gas is air.
14. A method according to claim 1 , in which the halogen-containing gas stream is an exhaust gas from semiconductor manufacture.
15. A method according to claim 1 , in which in the water-contacting step the gas stream is arranged to be in generally counterflow relationship with the water.
16. A method according to claim 1 , in which the halogen-containing gas stream is a fluorine-containing gas stream.