IP Library Granted Patent US 7,500,894
Granted Patent B2
US 7,500,894 · App. 10/516,080 · Granted Mar 10, 2009

Method for manufacturing plasma display panels with consistent panel substrate characteristics

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Quick Facts
Patent No.
US 7,500,894
App. No.
10/516,080
Granted
Mar 10, 2009
Kind
B2
Abstract

A method for manufacturing plasma display panels (PDP) is disclosed. The method appropriately controls conditions in an evaporating room during the process of forming film on a substrate of the PDP, thereby obtaining quality film. The method includes a deposition step where film is formed on front substrate ( 3 ) held by substrate holder ( 30 ), which is repeatedly used in the deposition step. Substrate holder ( 30 ) attached with the film due to repeated use co-exist in evaporating room ( 21 ) with another substrate holder ( 30 ), from which the film attached is removed, so that the conditions such as a degree of vacuum changes only a little.

Claims (7)

1. A method for manufacturing plasma display panels (PDPs) comprising:

forming a film of MgO on a substrate in an evaporating room, the substrate being held by one of a plurality of substrate holders, the substrate holders comprising a plurality of elements, and

repeatedly using the substrate holders, such that when the MgO film is formed on a substrate, at least one substrate holder in the evaporating room is coated with MgO film during forming the MgO film on a substrate, and at least one holder in the evaporating room comprises elements not coated with said MgO film.

2. A method for manufacturing plasma display panels (PDPs) in a manufacturing cycle comprising:

forming a film on a substrate in an evaporating room, the substrate being held by one of a plurality of substrate holders, and

repeatedly using the substrate holders for forming film on a substrate, the repeated use comprising a manufacturing cycle,

wherein each time film is formed on a substrate in the manufacturing cycle, other than the first time the film is formed on a substrate, at least one substrate holder in the evaporating room is coated with the film during forming film on a substrate, and at least one holder in the evaporating room is not coated with said film.

Assignments (2)
CHANGE OF NAME Recorded Oct 27, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021738/0878 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 10, 2005
From: SHINOZAKI, JUN; TAKASE, MICHIHIKO; FURUKAWA, HIROYUKI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 016319/0949 →