Organic electroluminescent device
View Patent ↗Disclosed is an organic electroluminescent (EL) device for enhancing the luminous efficiency. A first electrode is formed on a substrate. A CVD insulating film of low dielectric constant having an opening exposing the first electrode is formed on the first electrode and the substrate. An organic EL layer and a second electrode are sequentially stacked on the opening. A wall surrounding a region of the organic EL layer is formed of the CVD insulating film of low dielectric constant, the surface treatment of the pixel electrode can be performed using O2 plasma enhance luminance properties.
1. An organic electroluminescent device comprising:
a substrate;
a thin film transistor formed on the substrate;
a first electrode electrically coupled to the thin film transistor and having a surface treated by oxygen plasma;
a chemical vapor deposition insulating film formed on the first electrode and the substrate, the chemical vapor deposition film having an opening portion extending to the first electrode;
an organic electroluminescent layer formed in the opening portion; and
a second electrode formed on the organic electroluminescent layer.
2. The device as claimed in claim 1 , wherein the chemical vapor deposition insulating film comprises SiOC.
3. The device as claimed in claim 1 , wherein the chemical vapor deposition insulating film has a dielectric constant less than about 3.5.
4. The device as claimed in claim 1 , wherein the chemical vapor deposition insulating film is formed to have a thickness more than about 1 μm between the first electrode and the organic electroluminescent layer.
5. The device as claimed in claim 1 , wherein the opening portion of the chemical vapor deposition insulating film has a tapered shape, and the second electrode has a stripe shape and crosses the first electrode.
6. The device as claimed in claim 5 , wherein the chemical vapor deposition insulating film is comprised of SiOC.
7. The device as claimed in claim 5 , wherein the chemical vapor deposition insulating film has a dielectric constant less than about 3.5.
8. The device as claimed in claim 5 , wherein the chemical vapor deposition insulating film has a thickness more than about 1 μm between the first electrode and the organic electroluminescent layer.