IP Library Granted Patent US 7,145,155
Granted Patent B2
US 7,145,155 · App. 10/523,668 · Granted Dec 5, 2006

Process for electron sterilization of a container

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Quick Facts
Patent No.
US 7,145,155
App. No.
10/523,668
Granted
Dec 5, 2006
Kind
B2
Abstract

Minimum electron energy is used for the sterilization of preformed containers in order to minimize the machinery size, cost and radiation shielding required for in-line use. The electron energy required is reduced by the use of one-sided (unilateral) irradiation wherein the dose delivered by the primary radiation to thicker portions of the containers is supplemented by the dose delivered by scattered electrons.

Claims (10)

1. That method of irradiating, in a gaseous medium, a hollow open-mouthed container having an axis and having walls of varying thickness, which method comprises

directing primary electrons laterally against said container as a sheet extending along said axis and more than the length of said axis,

said primary electrons having energy insufficient to penetrate through the entire container (i.e. two walls) at the thicker portions of said walls but sufficient to penetrate the entire container (i.e. two walls) at the thinner portions of said walls,

the dose delivered to said thicker portions by said primary electrons being supplemented by secondary electrons produced by scattering of said primary electrons by said gaseous medium and said container.

2. Method of using reduced electron energy for the sterilization of preformed open-mouthed containers, comprising the following steps:

producing an electron sheet in an electron-scattering gaseous region with a cross-sectional length L and width W,

conveying an open-mouthed container having an axis with a length less than L transversely through said sheet in such a manner that the extremities of said sheet by-pass said container while the region between said extremities passes through said container,

said axis being parallel to said sheet as said container passes through said sheet,

the energy of said electrons being sufficient to provide the required minimum dose to all surfaces of said container while remaining below that required for full penetration of the thicker regions of the container.

3. Method in accordance with claim 2 , wherein the maximum treatment level delivered by said electrons remains below the threshold dose at which said electrons cause damage to said container.

Assignments (3)
CHANGE OF NAME Recorded Mar 20, 2013
From: ELECTRON PROCESSING SYSTEMS, LLC
To: ELECTRON PROCESSING SYSTEMS, L.L.C.
Reel/Frame 030049/0525 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 14, 2008
From: ELECTRON PROCESSING SYSTEMS, INC.
To: ELECTRON PROCESSING SYSTEMS, LLC
Reel/Frame 021679/0966 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 29, 2005
From: NABLO, SAMUEL V.; CLEGHORN, DENIS A.; WOOD, JR., JAMES C.
To: ELECTRON PROCESSING SYSTEMS, INC.
Reel/Frame 016505/0238 →