Silicon dioxide dispersion
View Patent ↗Stable, aqueous dispersion containing silicon dioxide powder having a hydroxyl group density of 2.5 to 4.7 OH/nm 2 , which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.
1. A silicon dioxide powder, produced by flame hydrolysis followed by acid treatment, and displaying a hydroxyl group density of 3 to 4.7 OH/nm 2 , wherein
the hydroxyl group density is determined by reaction of the silicon dioxide powder with lithium aluminum hydride according to the method of J. Mathias and G. Wannemacher in Journal of Colloid and Interface Science 125 (1988) 61; and
the silicon dioxide powder is a doped silicon dioxide powder.
2. The silicon dioxide powder according to claim 1 , wherein the hydroxyl group density in the silicon dioxide powder is between 3 and 4 OH/nm 2 .
3. The silicon dioxide powder according to claim 1 , wherein the BET surface area of the silicon dioxide powder is between 5 and 600 m 2 /g.
4. A process for producing the silicon dioxide powder according to claim 1 , comprising
treating a silicon dioxide powder, produced by a flame hydrolysis process and having a hydroxyl group density of less than 2.5 OH/nm 2 , at temperatures of 40 to 700° C., under acid conditions, and for reaction times of 5 minutes to 20 hours, to form a reaction mixture, and
subsequently separating the treated powder from the reaction mixture.
5. The process according to claim 4 , wherein inorganic or organic acids are used for the treatment.
6. An aqueous dispersion, comprising the silicon dioxide powder according to claim 1 , and water.
7. The aqueous dispersion according to claim 6 , wherein said dispersion, over a period of 6 months, does not thicken further and forms no sediment.
8. The aqueous dispersion according to claim 6 , wherein said dispersion has a content of silicon dioxide powder between 10 and 70 wt. %.
9. The aqueous dispersion according to claim 6 , wherein said dispersion has a pH between 3 and 12.
10. The aqueous dispersion according to claim 6 , wherein the average aggregate diameter in the dispersion is less than 200 nm.
11. The aqueous dispersion according to claim 6 , wherein said dispersion contains oxidising agents, corrosion inhibitors and/or surface-active substances.
12. A process for producing the dispersion according to claim 6 , comprising incorporating a silicon dioxide powder, having a hydroxyl group density of 3 to 4.7 OH/nm 2 , obtained from a silicon dioxide powder produced by flame hydrolysis, into an aqueous solution by means of a dispersing device.
13. A method of producing a transparent coating, comprising applying the dispersion of claim 6 to a substrate.
14. A method of producing a chemical mechanical polishing, comprising contacting the dispersion of claim 6 with one or more polishing additives.
15. A method of producing glass, comprising contacting the dispersion of claim 6 with one or more additives for glass manufacturing.
16. A method of producing a sol-gel glass article, comprising contacting the dispersion of claim 6 with one or more additives for sol-gel glass article manufacturing.
17. The silicon dioxide powder according to claim 1 , wherein the acid treatment is with an aqueous acid.
18. The silicon dioxide powder according to claim 1 , wherein the acid is an inorganic mineral acid or a water-miscible carboxylic acid.
19. The silicon dioxide powder according to claim 1 , wherein the acid is aqueous hydrochloric acid.
20. The silicon dioxide powder according to claim 1 , wherein an acid residue from the production process adhere to the silicon dioxide powder produced by flame hydrolysis.
21. A silicon dioxide powder, produced by flame hydrolysis followed by acid treatment, and displaying a hydroxyl group density of 3 to 4.7 OH/nm 2 , wherein
the hydroxyl group density is determined by reaction of the silicon dioxide powder with lithium aluminum hydride according to the method of J. Mathias and G. Wannemacher in Journal of Colloid and Interface Science 125 (1988) 61.
22. The silicon dioxide powder according to claim 21 , wherein the hydroxyl group density in the silicon dioxide powder is between 3 and 4 OH/nm 2 .
23. The silicon dioxide powder according to claim 21 , wherein the BET surface area of the silicon dioxide powder is between 5 and 600 m 2 /g.
24. The silicon dioxide powder according to claim 21 , wherein the acid treatment is with an aqueous acid.
25. The silicon dioxide powder according to claim 21 , wherein the acid is an inorganic mineral acid or a water-miscible carboxylic acid.
26. The silicon dioxide powder according to claim 21 , wherein the acid is aqueous hydrochloric acid.
27. The silicon dioxide powder according to claim 21 , wherein an acid residue from the production process adhere to the silicon dioxide powder produced by flame hydrolysis.