Removal of aldehyde impurity by reactive polystyrene resini
View Patent ↗A purification method in the preparation of a substituted 8-arylquinoline, wherein the aryl group at the 8-position contains a substituent substituted-alkenyl group, utilizes a polystyrene-based sulfonylhydrazine reactive resin to remove an aldehyde impurity.
1. A method of forming a clean solution of a compound represented by Formula (I):
said clean solution being substantially free of an aldehyde represented by Formula (II):
wherein
S 1 , S 2 , and S 3 are independently H, —OH, halogen, —C 1 -C 6 alkyl, —NO 2 , —CN, or —C 1 -C 6 alkoxy, wherein the alkyl and alkoxy groups are optionally substituted with 1-5 substituents; wherein each substituent is independently a halogen or OH;
R 1 is a H, OH, halogen, carbonyl, or —C 1 -C 6 alkyl, -cycloC 3 -C 6 alkyl, —C 1 -C 6 alkenyl, —C 1 -C 6 alkoxy, aryl, heteroaryl, —CN,-heterocycloC 3 -C 6 alkyl, -amino, —C 1 -C 6 alkylamino, —(C 1 -C 6 alkyl)(C 1 -C 6 alkyl)amino, —C 1 -C 6 alkyl(oxy)C 1 -C 6 alkyl, —C(O)NH(aryl), —C(O)NH(heteroaryl), —SO n NH(aryl), —SO n NH(heteroaryl), —SO n NH(C 1 -C 6 alkyl), —C(O)N(C 0 -C 6 alkyl)(C 0 -C 6 alkyl), —NH—SO n —(C 1 -C 6 alkyl), —SO n —(C 1 -C 6 alkyl), —(C 1 -C 6 alkyl)—O—C(CN)-dialkylamino, or —(C 1 -C 6 alkyl)—SO n —(C 1 -C 6 alkyl) group, wherein any of the groups is optionally substituted with 1-5 substituents; wherein each substituent is independently a halogen, —OH, —CN, —C 1 -C 6 alkyl, -cycloC 3 -C 6 alkyl, —C(O)(heterocycloC 3 -C 6 alkyl), —C(O)—O—(C 0 -C 6 alkyl), —C(O)-aryloxy, —C 1 -C 6 alkoxy, —(C 0 -C 6 alkyl)(C 0 -C 6 alkyl)amino, cycloalkyloxy, acyl, acyloxy, -cycloC 3 -C 6 alkyl, heterocycloC 3 -C 6 alkyl, aryl, heteroaryl, carbonyl, carbamoyl, or —SO n —(C 1 -C 6 alkyl);
R 2 and R 3 independently is an aryl, heteroaryl, H, halogen, —CN, —C 1 -C 6 alkyl, heterocycloC 3-6 alkyl, —C 1 -C 6 alkoxy, carbonyl, carbamoyl, —C(O)OH, —(C 1 -C 6 alkyl)—SO n —(C 1 -C 6 alkyl), —C(O)N(C 0 -C 6 alkyl)(C 0 -C 6 alkyl), or —C 1 -C 6 alkylacylamino group, wherein any of the groups is optionally substituted with 1-5 substituents, wherein each substituent is independently an aryl, heteroaryl, halogen, —NO 2 , —C(O)OH, carbonyl, —CN, —C 1 -C 6 alkyl, —SO n —(C 1 -C 6 alkyl), —SO n —(aryl), aryloxy, -heteroaryloxy, C 1 -C 6 alkoxy, N-oxide, —C(O)-heterocycloC 3 -C 6 alkyl, —NH-cycloC 3 -C 6 alkyl, amino, —OH, or —(C 0 -C 6 alkyl)(C 0 -C 6 alkyl)amino, —C(O)—N(C 0 -C 6 alkyl)(C 0 -C 6 alkyl) substituent group, wherein each substituent group independently is optionally substituted with —OH, C 1 -C 6 alkoxy, —C 1 -C 6 alkyl, -cycloC 3 -C 6 alkyl, aryloxy, —C(O)OH, —C(O)O(C 1 -C 6 alkyl), halogen, —NO 2 , —CN, —SO n —(C 1 -C 6 alkyl), or —C(O)—N(C 0 -C 6 alkyl)(C 0 -C 6 alkyl);
one of R 2 and R 3 must be an aryl or heteroaryl, optionally substituted; and
n is independently 0, 1, or 2;
said method comprising:
a step of contacting an untreated solution of the compound represented by Formula (I) with a reactive resin effective to substantially remove the aldehyde represented by Formula (II) from said untreated solution to form the clean solution.
2. The method of claim 1 , wherein said solutions are in dimethylformamide.
3. The method of claim 1 , wherein said reactive resin is a solid material bearing a pendant hydrazine moety.
4. The method of claim 3 wherein said reactive resin is a polystyrene-based sulfonylhydrazine.
5. The method of claim 1 , further comprising a step of:
adding an antisolvent to said clean solution to yield a crystalline compound represented by Formula (I) substantially free of the aldehyde impurity represented by Formula (II).
6. A method of forming a clean solution of a compound represented by Formula (Ia):
substantially free of an aldehyde represented by Formula (IIa):
said method comprising the step of contacting an untreated solution of the compound represented by Formula (Ia) with a polystyrene-based sulfonylhydrazine reactive resin effective to substantially remove the aldehyde represented by Formula (IIa) from said untreated solution to form said clean solution.
7. The method of claim 6 , further comprising a step of:
adding an antisolvent to said clean solution to yield a crystalline compound represented by Formula (Ia) substantially free of the aldehyde impurity represented by Formula (IIa).