Method of enhancing the photoconductive properties of a semiconductor
View Patent ↗A semiconductor material with photoconductive properties and a method of the semiconductor, wherein a base material is grown and then annealed post-growth at a temperature of 475° C. or less. It has been found that be annealing at temperatures of 475° C., or less the carrier lifetime of the material and the resistivity can be optimized so as to obtain semiconductor with useful photoconductive properties.
1. A method of enhancing the properties of a semiconductor, the method comprising annealing a base material which is produced using As ion implantation at a temperature T to form the semiconductor, the temperature T being 475° C. or less and determined by:
obtaining a first set of values indicative of resistivity of the material for a plurality of annealing temperatures;
obtaining a second set of values indicative of carrier lifetime of the material for a plurality of annealing temperatures; and
comparing the first and second set of values to determine an annealing temperature or a range of annealing temperatures where the carrier lifetime and the resistivity of the material are optimized.
2. The method of claim 1 , further comprising:
determining an optimum annealing duration for the material.
3. The method of claim 1 , wherein the properties enhanced include carrier lifetime and resistivity.
4. A method of producing a semiconductor material with photoconductive properties, the method comprising annealing the base material at a temperature of 475° C. or less so as to enhance the carrier lifetime of the material and the resistivity of the material for use as a photoconductor, the temperature being determined according to the method of claim 1 .
5. The method of claim 1 , wherein the annealing occurs at a temperature in the range of 250° C. and 450° C.
6. The method of claim 1 , wherein the base material is grown using molecular beam epitaxy.
7. The method according to claim 1 , wherein the base material is formed in a growth chamber and annealing occurs outside the growth chamber.
8. The method according to claim 1 , wherein the semiconductor is a Group III-V semiconductor with photoconductive properties.
9. The method according to claim 1 , wherein the semiconductor comprises As.
10. The method according to claim 1 , wherein the base material is GaAs.
11. The method according to claim 1 , wherein the base material is InGaAs.
12. The method according to claim 1 , wherein the annealing is performed for fifteen minutes or less.
13. A semiconductor material formed using the method of claim 1 .
14. The method of claim 2 , wherein the optimum annealing duration is determined by obtaining a third set of values indicative of arsenic concentration of the material for a plurality of annealing durations and for at least one annealing temperature; comparing the at least one third set of values with the first and second sets of values to determine an annealing duration and an annealing temperature which together optimize the carrier lifetime and the resistivity of the material.
15. The method according to claim 10 , wherein the wherein the GaAs is grown in a molecular beam epitaxy reactor at a temperature in the range of approximately 200° C. to 300° C.
16. The method of claim 11 , wherein the base material is annealed at a temperature in the range of 350° C. to 450° C.
17. The emitter of claim 16 , wherein the emitter is configured to emit terahertz radiation formed using a method according to claim 1 .
18. A photoconductive emitter comprising the semiconductor material of claim 13 .
19. A photoconductive receiver comprising the semiconductor material of claim 13 .
20. The receiver of claim 19 , wherein the receiver is configured to receive terahertz radiation.