IP Library › Granted Patent US 7,458,320

Granted Patent B2

US 7,458,320 · App. 10/530,992 · Granted Dec 2, 2008

Polymer for heat-sensitive lithographic printing plate precursor

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Quick Facts

Patent No.: US 7,458,320
App. No.: 10/530,992
Granted: Dec 2, 2008
Kind: B2

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Abstract

A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenyl group of the phenolic monomeric unit is replaced by a group comprising a N-imide group and wherein the substitution of the polymer increases the chemical resistance of the coating of the printing plate precursor.

Claims (77)

1. A polymer comprising a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenolic monomeric unit is replaced by a N-imide group Q having the structure

wherein L is a linking group, wherein k is 0 or 1, wherein L is covalently bound to the O atom of the polymer when k is 1, or wherein the N atom of the N-imide group is covalently bound to the O atom of the polymer when k is 0, wherein X or Y are independently selected from O or S, and wherein T 1 and T 2 represent a terminal group.

2. A polymer according to claim 1 wherein the terminal groups T 1 and T 2 are independently selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein T 1 and T 2 together with the N-imide group represent the necessary atoms to form a cyclic structure, or wherein T 1 and T 2 represent the following structures -L 1 -R 1 and -L 2 -R 2 , wherein L 1 and L 2 represent independently a linking group, wherein R 1 and R 2 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —CN, or —NO 2 , or therein two groups selected from each L 1 , L 2 , R 1 and R 2 together represent the necessary atoms to form a cyclic structure.

3. A polymer according to claim 1 wherein the N-imide group Q has the following formula

wherein G 1 and G 2 are independently selected from O, S, NR 3 or CR 4 R 5 , with the limitation that G 1 is not O or S when G 2 is O and that G 1 is not O or S when G 2 is NR 3 , wherein R 4 and R 5 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 3 -R 6 , wherein L 3 is a linking group, wherein R 3 and R 6 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein two groups selected from each R 3 , R 4 , R 5 , R 6 and L 3 together represent the necessary atoms to form a cyclic structure.

4. A polymer according to claim 1 wherein the N-imide group Q has the following formula

wherein G 3 to G 5 are independently selected from O, S, NR 7 or CR 8 R 9 , with the limitation that at least one group, selected from G 3 to G 5 , is CR 8 R 9 and that two neighboring groups, selected from G 3 to G 5 are not represented by O and S, by O and NR 7 , by S and NR 7 or by O and O, or wherein G 4 is a linking group, wherein R 8 and R 9 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 4 -L 10 , wherein L 4 is a linking group, wherein R 7 and R 10 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein two groups selected from each R 7 , R 8 , R 9 , R 10 and L 4 together represent the necessary atoms to form a cyclic structure.

5. A polymer according to claim 1 wherein the N-imide group Q has the following formula

wherein G 6 is a group selected from O, S, NR 11 or CR 12 R 13 , wherein m is o or 1, wherein R 12 to R 15 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 5 -R 16 , wherein L 5 is a linking group, wherein R 11 and R 16 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein two groups selected from each R 11 , R 12 , R 13 , R 14 , R 15 , R 16 and L 5 together represent the necessary atoms to form a cyclic structure.

6. A polymer according to claim 1 wherein the N-imide group Q has the following formula

wherein E 1 and E 2 are independently selected from O, S, NR 17 or

CR 18 R 19 , wherein p and q are independently 0 or 1, wherein R 18 to R 21 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 6 -R 22 , wherein L 6 is a linking group, wherein R 17 and R 22 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

7. A polymer according to claim 1 wherein the N-imide group Q has one of the following formula:

wherein each R 23 to R 26 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —SO 2 —NH—R 27 , —NH—SO 2 —R 30 , —CO—NR 27 —R 28 , —NR 27 —CO—R 30 , —NR 27 —CO—NR 28 —R 29 , —NR 27 —CS—NR 28 —R 29 , —NR 27 —CO—O—R 28 , —O—CO—NR 27 —R 28 , —O—CO—R 30 , —CO—O—R 27 , —CO—R 27 , —SO 3 —R 27 , —O—SO 2 —R 30 , —SO 2 —R 27 , —SO—R 30 , —P(═O)(—O—R 27 )(—O—R 28 ), —O—P(═O)(—O—R 27 )(—O—R 28 ), —NR 27 —R 28 , —O—R 27 , —S—R 27 , —CN, —NO 2 , —N(—CO—R 27 )(—CO—R 28 ), —N-phthalimidyl, -M-N-phthalimidyl, or -M-R 27 , wherein M represents a divalent linking group containing 1 to 8 carbon atoms, wherein R 27 to R 29 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein R 30 is selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein a and d are independently 0, 1, 2, 3 or 4, wherein b and c are independently 0, 1, 2 or 3, wherein E 3 is selected from O, S, NR 31 or CR 32 R 33 , wherein R 32 and R 33 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or -L 7 -R 34 , wherein L 7 is a linking group, wherein R 31 and R 34 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

8. A polymer according to claim 1 wherein the N-imide group Q has one of the following formula:

wherein R 35 to R 44 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —SO 2 —NH—R 45 , —NH—SO 2 —R 48 , —CO—NR 45 —R 46 , —NR 45 —CO—R 48 , —NR 45 —CO—NR 46 —R 47 , —NR 45 —CS—NR 46 —R 47 , —NR 45 —CO—O—R 46 , —O—CO—NR 45 —R 46 , —O—CO—R 48 , —CO—O—R 45 , —CO—R 45 , —SO 3 —R 45 , —O—SO 2 —R 48 , —SO 2 —R 45 , —SO—R 48 , —P(═O)(O—R 45 )(—O—R 46 ), —O—P(═O)(—O—R 45 )(—O—R 46 ), —NR 45 —R 46 , —O—R 45 , —S—R 45 , —CN, —N(—CO—R 45 )(—CO—R 46 ), —N-phthalimidyl, -M-N-phthalimidyl, or -M-R 45 , wherein M represents a divalent linking group containing 1 to 8 carbon atoms, wherein R 45 to R 47 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, and wherein R 48 is selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

9. A polymer according to claim 1 wherein the N-imide group Q has one of the following formula:

wherein R 49 to R 56 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, and wherein R 57 and R 58 are independently selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

10. A polymer according to claim 1 wherein the N-imide group Q has one of the following formula:

11. A polymer according to claim 1 , wherein said polymer comprising a phenolic monomeric unit is a novolac, resol or polyvinylphenol.

12. A heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface and an oleophilic coating provided on the hydrophilic surface, said coating comprising an infrared light absorbing agent and a polymer comprising a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenolic monomeric unit is replaced by a N-imide group Q having the structure

13. A lithographic printing plate precursor according to claim 12 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

14. A lithographic printing plate precursor according to claim 13 , wherein said dissolution inhibitor is selected from the group consisting of

an organic compound which comprises at least one aromatic group and a hydrogen bonding site,

a polymer or surfactant comprising siloxane or perfluoroalkyl units, and mixtures thereof.

15. A lithographic printing plate precursor according to claim 12 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

16. A polymer according to claim 2 wherein the N-imide group Q has the following formula

17. A polymer according to claim 2 wherein the N-imide group Q has the following formula

wherein G 3 to G 5 are independently selected from O, S, NR 7 or CR 8 R 9 , with the limitation that at least one group, selected from G 3 to G 5 , is CR 8 R 9 and that two neighbouring groups, selected from G 3 to G 5 are not represented by O and S, by O and NR 7 , by S and NR 7 or by O and O, or wherein G 4 is a linking group, wherein R 8 and R 9 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 4 -L 10 , wherein L 4 is a linking group, wherein R 7 and R 10 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein two groups selected from each R 7 , R 8 , R 9 , R 10 and L 4 together represent the necessary atoms to form a cyclic structure.

18. A polymer according to claim 2 wherein the N-imide group Q has the following formula

19. A polymer according to claim 2 wherein the N-imide group Q has the following formula

wherein E 1 and E 2 are independently selected from O, S, NR 17 or CR 18 R 19 , wherein p and q are independently 0 or 1, wherein R 18 to R 21 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 6 -R 22 , wherein L 6 is a linking group, wherein R 17 and R 22 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

20. A polymer according to claim 2 wherein the N-imide group Q has one of the following formula:

wherein each R 23 to R 26 are independently selected from hydrogen, an optionally substituted alkyl alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —SO 2 —NH—R 27 , —NH—SO 2 —R 30 , —CO—NR 27 —R 28 , —NR 27 —CO—R 30 , —NR 27 —CO—NR 28 —R 29 , —NR 27 —CS—NR 28 —R 29 , —NR 27 —CO—O—R 28 , —O—CO—NR 27 R 28 , —O—CO—R 30 , —CO—O—R 27 , —CO—R 27 , —SO 3 —R 27 , —O—SO 2 —R 30 , —SO 2 —R 27 , —SO—R 30 , —P(═O)(—O—R 27 )(—O—R 28 ), —O—P(═O)(—O—R 27 )(—O—R 28 ), —NR 27 —R 28 , —O—R 27 , —S—R 27 , —CN, —NO 2 , —N(—CO—R 27 )(—CO—R 28 ), —N-phthalimidyl, -M-N-phthalimidyl, or -M-R 27 , wherein M represents a divalent linking group containing 1 to 8 carbon atoms, wherein R 27 to R 29 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein R 30 is selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein a and d are independently 0, 1, 2, 3 or 4, wherein b and c are independently 0, 1, 2 or 3, wherein E 3 is selected from O, S, NR 31 or CR 32 R 33 , wherein R 32 and R 33 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or -L 7 -R 34 , wherein L 7 is a linking group, wherein R 31 and R 34 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

21. A polymer according to claim 2 wherein the N-imide group Q has one of the following formula:

wherein R 35 to R 44 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —SO 2 —NH—R 45 , —NH—SO 2 —R 48 , —CO—NR 45 —R 46 , —NR 45 —CO—R 48 , —NR 45 —CO—NR 46 —R 47 , —NR 45 —CS—NR 46 —R 47 , —NR 45 —CO—O—R 46 , —O—CO—NR 45 —R 46 , —O—CO—R 48 , —CO—O—R 45 , —CO—R 45 , —SO 3 —R 45 , —O—SO 2 —R 48 , —SO 2 —R 45 , —SO—R 48 , —P(═O)(O—R 45 )(—O—R 46 ), —O—P(═O)(—O—R 45 )(—O—R 46 ), —NR 45 —R 46 , —O—R 45 , —S—R 45 , —CN, —N(—CO—R 45 )(—CO—R 46 ), —N-phthalimidyl, -M-N-phthalimidyl, or -M-R 45 , wherein M represents a divalent linking group containing 1 to 8 carbon atoms, wherein R 45 to R 47 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein R 48 is selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

22. A polymer according to claim 2 wherein the N-imide group Q has one of the following formula:

23. A polymer according to claim 2 wherein the N-imide group Q has one of the following formula:

24. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the terminal groups T 1 and T 2 are independently selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein T 1 and T 2 together with the N-imide group represent the necessary atoms to form a cyclic structure, or wherein T 1 and T 2 represent the following structures -L 1 -R 1 and -L 2 -R 2 , wherein L 1 and L 2 represent independently a linking group, wherein R 1 and R 2 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —CN, or —NO 2 , or therein two groups selected from each L 1 , L 2 , R 1 and R 2 together represent the necessary atoms to form a cyclic structure.

25. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has the following formula

wherein G 3 to Gs are independently selected from O, S, NR 7 or CR 8 R 9 , with the limitation that at least one group, selected from G 3 to G 5 , is CR 8 R 9 and that two neighboring groups, selected from G 3 to G 5 , are not represented by O and S, by O and NR 7 , by S and NR 7 or by O and O, or wherein G 4 is a linking group, wherein R 8 and R 9 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 4 -L 10 , wherein L 4 is a linking group, wherein R 7 and R 10 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein two groups selected from each R 7 , R 8 , R 9 , R 10 and L 4 together represent the necessary atoms to form a cyclic structure.

26. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has the following formula

wherein G 3 to G 5 are independently selected from O, S, NR 7 or CR 8 R 9 , with the limitation that at least one group, selected from G 3 to G 5 , is CR 8 R 9 and that two neighboring groups, selected from G 3 to G 5 , are not represented by O and S, by O and NR 7 , by S and NR 7 or by O and O, or wherein G 4 is a linking group, wherein R 8 and R 9 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or -L 4 -L 10 , wherein L 4 is a linking group, wherein R 7 and R 10 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or wherein two groups selected from each R 7 , R 8 , R 9 , R 10 and L 4 together represent the necessary atoms to form a cyclic structure.

27. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has the following formula

28. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has the following formula

29. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has one of the following formula:

wherein each R 23 to R 26 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —SO 2 —NH—R 27 , —NH—SO 2 —R 30 , —CO—NR 27 —R 28 , —NR 27 —CO—R 30 , —NR 27 —CO—NR 28 —R 29 , —NR 27 —CS—NR 28 —R 29 , —NR 27 —CO—O—R 28 , —O—CO—NR 27 —R 28 , —O—CO—R 30 , —CO—O—R 27 , —CO—R 27 , —SO 3 —R 27 , —O—SO 2 —R 30 , —SO 2 —R 27 , —SO—R 30 , —P(═O)(—O—R 27 )(—O—R 28 ), —O—P(═O)(—O—R 27 )(—O—R 28 ), —NR 27 —R 28 , O—R 27 , —S—R 27 , —CN, —NO 2 , —N(—CO—R 27 )(—CO—R 28 ), —N-phthalimidyl, -M-N-phthalimidyl, or -M-R 27 , wherein M represents a divalent linking group containing 1 to 8 carbon atoms, wherein R 27 to R 29 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein R 30 is selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein a and d are independently 0, 1, 2, 3 or 4, wherein b and c are independently 0, 1, 2 or 3, wherein E 3 is selected from O, S, NR 31 or CR 32 R 33 , wherein R 32 and R 33 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, or -L 7 -R 34 , wherein L 7 is a linking group, wherein R 31 and R 34 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

30. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has one of the following formula:

wherein R 35 to R 44 are independently selected from hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, halogen, —SO 2 —NH—R 45 , —NH—SO 2 —R 48 , —CO—NR 45 —R 46 , —NR 45 —CO—R 48 , —NR 45 —CO—NR 46 —R 47 , —NR 45 —CS—NR 46 —R 47 , —NR 45 —CO—O—R 46 , —O—CO—NR 45 —R 46, —O—CO—R 48 , —CO—O—R 45 , —CO—R 45 , —SO 3 —R 45 , —O—SO 2 —R 48 , —SO 2 —R 45 , —SO—R 48 , —P(═O)(O—R 45 )(—O—R 46 ), —O—P(═O)(—O—R 45 )(—O—R 46 ), —NR 45 —R 46 , —O—R 45 , —S—R 45 —CN, —N(—CO—R 45 )(—CO—R 46 ), —N-phthalimidyl, -M-N-phthalimidyl, or -M-R 45 , wherein M represents a divalent linking group containing 1 to 8 carbon atoms, wherein R 45 to R 47 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group, wherein R 48 is selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

31. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has one of the following formula:

wherein R 49 to R 56 are independently selected from hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group,

and wherein R 57 and R 58 are independently selected from an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group.

32. A heat-sensitive lithographic printing plate precursor according to claim 12 , wherein the N-imide group Q has one of the following formula:

33. A heat-sensitive lithographic printing plate precursor according to claim 24 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

34. A heat-sensitive lithographic printing plate precursor according to claim 25 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

35. A heat-sensitive lithographic printing plate precursor according to claim 26 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

36. A heat-sensitive lithographic printing plate precursor according to claim 27 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

37. A heat-sensitive lithographic printing plate precursor according to claim 28 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

38. A heat-sensitive lithographic printing plate precursor according to claim 29 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

39. A heat-sensitive lithographic printing plate precursor according to claim 30 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

40. A heat-sensitive lithographic printing plate precursor according to claim 31 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

41. A heat-sensitive lithographic printing plate precursor according to claim 32 , wherein said coating further comprises a dissolution inhibitor and wherein said precursor is a positive working lithographic printing plate precursor.

42. A heat-sensitive lithographic printing plate precursor according to claim 24 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

43. A heat-sensitive lithographic printing plate precursor according to claim 25 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

44. A heat-sensitive lithographic printing plate precursor according to claim 26 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

45. A heat-sensitive lithographic printing plate precursor according to claim 27 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

46. A heat-sensitive lithographic printing plate precursor according to claim 28 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

47. A heat-sensitive lithographic printing plate precursor according to claim 29 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

48. A heat-sensitive lithographic printing plate precursor according to claim 30 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

49. A heat-sensitive lithographic printing plate precursor according to claim 31 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

50. A heat-sensitive lithographic printing plate precursor according to claim 32 , wherein said coating further comprises a latent Brönsted acid and an acid-crosslinkable compound and wherein said precursor is a negative working lithographic printing plate precursor.

Assignments (1)

CHANGE OF NAME Recorded Jan 3, 2018

From: AGFA GRAPHICS NV

To: AGFA NV

Reel/Frame 045742/0598 →