Process for producing plasma display panel and apparatus therefor
A method for depositing a high quality metal oxide film onto a substrate of a plasma display panel is provided. At a process for forming protective layer ( 8 ) of MgO film which is a metal oxide film, the film is formed in such a manner that partial pressure of oxygen gas or the like in evaporation room ( 21 ) which is a deposition room is within a certain range. Using this method, deposition is performed with an atmosphere in evaporation room ( 21 ) constant, so that physical properties of a film can be stabilized. As a result, a plasma display panel which can display high quality images can be manufactured.
1 . A process for producing a plasma display panel (PDP) including a process for forming a metal oxide film onto a substrate of the PDP, the method comprising:
forming the metal oxide film within a certain range in partial pressure of a certain gas in a deposition room.
2 . A process for producing a plasma display panel (PDP) including a process for forming a metal oxide film onto a substrate of the PDP, the method comprising:
keeping partial pressure of a certain gas in a deposition room within a certain range, and keeping a vacuum degree in the deposition room within a certain range in depositing the metal oxide film.
3 . The process for producing the PDP of claim 1 ,
wherein the certain gas in the deposition room is oxygen gas.
4 . The process for producing the PDP of claim 3 ,
wherein the partial pressure of the oxygen gas is kept within a certain range by introducing the oxygen gas while the deposition room is exhausted.
5 . The process for producing the PDP of claim 4 ,
wherein the partial pressure of the oxygen gas ranges within 1×10 −3 Pa to 5×10 −2 Pa.
6 . The process for producing the PDP of claim 1 ,
wherein the certain gas in the deposition room is at least one gas selected from the group consisting of water, hydrogen, carbon monoxide and carbon dioxide.
7 . The process for producing the PDP of claim 6 ,
wherein the partial pressure of at least one gas selected from the group consisting of water, hydrogen, carbon monoxide and carbon dioxide is kept within a certain range by introducing at least the gas selected from the group consisting of water, hydrogen, carbon monoxide and carbon dioxide while the deposition room is exhausted.
8 . The process for producing the PDP of claim 7 ,
wherein the partial pressure of the water ranges within 1×10 −4 Pa to 5×10 −3 Pa.
9 . The process for producing the PDP of claim 7 ,
wherein the partial pressure of the hydrogen gas ranges within 1×10 −3 Pa to 5×10 −2 Pa.
10 . The process for producing the PDP of claim 7 ,
wherein the partial pressure of the carbon monoxide gas ranges within 1×10 −3 Pa to 5×10 −2 Pa.
11 . The process for producing the PDP of claim 7 ,
wherein the partial pressure of the carbon dioxide gas ranges within 1×10 −4 Pa to 5×10 −3 Pa.
12 . The process for producing the PDP of claim 2 ,
wherein the vacuum degree is kept within a certain range by introducing an inert gas while the deposition room is exhausted.
13 . An apparatus of manufacturing a plasma display panel (PDP) for forming a metal oxide film onto a substrate of the PDP, the apparatus comprising:
a deposition room;
a gas-introducing means for introducing gas into the deposition room;
an exhausting means for exhausting the deposition room;
a partial-pressure-detecting means for detecting partial pressure of the gas in the deposition room; and
a controlling means for controlling an amount of introducing gas from the gas-introducing means and an amount of exhausting gas by the exhausting means based on information of the partial pressure of the gas from the partial-pressure-detecting means in such a manner that the partial pressure of the gas in the deposition room becomes within a certain range.
14 . An apparatus of manufacturing a plasma display panel (PDP) for forming a metal oxide film onto a substrate of the PDP, the apparatus comprising:
a deposition room;
a gas-introducing means for introducing gas into the deposition room;
an exhausting means for exhausting the deposition room;
a partial-pressure-detecting means for detecting partial pressure of the gas in the deposition room;
a vacuum-degree-detecting means for detecting a vacuum degree in the deposition room; and
a controlling means for controlling an amount of introducing gas from the gas-introducing means and an amount of exhausting gas by the exhausting means based on information of the partial pressure of the gas from the partial-pressure-detecting means and information of the vacuum degree from the vacuum-degree-detecting means in such a manner that the partial pressure of the gas and the vacuum degree in the deposition room become within certain ranges.
15 . The apparatus of manufacturing a PDP of claim 13 ,
wherein the partial-pressure-detecting means detects the partial pressure of oxygen gas.
16 . The apparatus of manufacturing a PDP of claim 13 ,
wherein the partial-pressure-detecting means detects the partial pressure of at least one gas selected from the group consisting of water, hydrogen, carbon monoxide and carbon dioxide.
17 . The process for producing the PDP of claim 2 ,
wherein the certain gas in the deposition room is oxygen gas.
18 . The process for producing the PDP of claim 2 ,
wherein the certain gas in the deposition room is at least one gas selected from the group consisting of water, hydrogen, carbon monoxide and carbon dioxide.
19 . The apparatus of manufacturing a PDP of claim 14 ,
wherein the partial-pressure-detecting means detects the partial pressure of oxygen gas.
20 . The apparatus of manufacturing a PDP of claim 14 ,
wherein the partial-pressure-detecting means detects the partial pressure of at least one gas selected from the group consisting of water, hydrogen, carbon monoxide and carbon dioxide.