Electrodeposition of biaxial textured films

1 . A method of forming a gold layer having biaxial texturing on a substrate, the method comprising electrodepositing gold onto a surface of the substrate at a current density of less than about 5.0 mA/cm 2 for at least about 1 minute.

2 . The method of claim 1 including electrodepositing the gold at a current density of between about 0.10 and 3.5 mA/cm 2 for between about 1 and 60 minutes.

3 . The method of claim 1 including electrodepositing the gold at a current density of between about 0.13 and 0.30 mA/cm 2 for between about 30 and 60 minutes.

4 . The method of claim 1 including electrodepositing the gold at a current density of about 0.13 mA/cm 2 for between about 45 and 60 minutes.

5 . The method of claim 1 including annealing the gold layer to increase the biaxial texturing in the gold layer.

6 . The method of claim 5 including annealing the gold layer in forming gas at between about 500 and 600° C. for between about 12 and 60 hours to increase the biaxial texturing in the gold layer.

7 . The method of claim 5 including annealing the gold layer at about 550° C. for about 48 hours to increase the biaxial texturing in the gold layer.

8 . The method of claim 1 comprising biaxially texturing the metal substrate prior to electrodepositing the gold.

9 . The method of claim 8 including rolling the metal substrate to biaxially texture the metal substrate.

10 . The method of claim 8 including epitaxially depositing the gold layer on the biaxially textured substrate.

11 . The method of claim 1 comprising repeating the electrodepositing step to increase the thickness of the gold layer.

12 . A method of making a superconducting article comprising:

electrodepositing a layer of gold having biaxial texturing onto a surface of a substrate; and

depositing a superconducting layer onto the gold layer such that biaxial texturing of the gold layer is maintained in the superconducting layer.

13 . The method of claim 12 including depositing the superconducting material by pulsed-laser deposition.

14 . The method of claim 12 further comprising annealing the gold layer in forming gas to increase biaxial texturing.

15 . A method of depositing a gold layer having biaxial texturing onto a substrate comprising electrodepositing gold at a current density of between about 0.10 and 3.5 mA/cm 2 for between about 1 and 60 minutes.

16 . A biaxially textured, superconducting article for use in electronic devices comprising:

a substrate; and

a gold layer having biaxial texturing deposited on the substrate.

17 . The article of claim 16 wherein the substrate consists essentially of nickel, tungsten, chromium, titanium, palladium or copper.

18 . The article of claim 16 wherein the substrate consists essentially of nickel.

19 . The article of claim 16 wherein the substrate has biaxial texturing.

20 . The article of claim 19 wherein the gold layer is epitaxially deposited onto the biaxially textured substrate.

21 . The article of claim 16 wherein the gold layer has partial biaxial texturing.

22 . The article of claim 16 wherein the gold layer has complete biaxial texturing.

23 . The article of claim 16 wherein the gold layer has a thickness between about 0.01 and 5 microns.

24 . A superconducting article comprising:

a metal substrate having a surface;

a gold layer having biaxial texturing deposited on the surface of the metal substrate; and

a superconducting material having biaxial texturing deposited onto the gold layer.

25 . The article of claim 24 wherein the biaxial texturing is maintained in the superconducting material.

26 . The article of claim 24 wherein the superconducting material is a high temperature superconducting material.

27 . The article of claim 24 wherein the superconducting material is YBCO, BSCCO, TBCCO, PBSCCO, TSBCCO, TPSBCO, HBCCO, or HBCO.

28 . The article of claim 24 wherein the superconducting material includes YBCO.