IP Library Granted Patent US 7,455,758
Granted Patent B2
US 7,455,758 · App. 10/536,674 · Granted Nov 25, 2008

Fluidic microsystem comprising field-forming passivation layers provided on microelectrodes

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Quick Facts
Patent No.
US 7,455,758
App. No.
10/536,674
Granted
Nov 25, 2008
Kind
B2
Abstract

Described is a fluidic microsystem ( 100 ) including at least one channel ( 10 ) through which a particle suspension can flow; and first and second electrode devices ( 40, 60 ) which are arranged on first and second channel walls ( 21, 31 ) for generating electrical alternating-voltage fields in the channel ( 10 ); wherein the first electrode device ( 40 ) for field shaping in the channel includes at least one first structure element ( 41, 51 ); and the second electrode device ( 60 ) includes an area-like electrode layer ( 61 ) with a closed second electrode surface which includes a second passivation layer ( 70 ); wherein the effective electrode surface of the first structure element ( 41, 51 ), of which element ( 41, 51 ) there is at least one, is smaller than the second electrode surface; and the second passivation layer ( 70 ) is a closed layer which completely covers the second electrode layer ( 61 ).

Claims (26)

1. A fluidic microsystem comprising:

at least one channel through which a particle suspension can flow; and

first and second electrode devices which are arranged on first and second channel walls for generating electrical alternating-voltage fields in the channel; wherein

the first electrode device is adapted for field shaping in the at least one channel and comprises at least one first structure element; and

the second electrode device comprises an area-like second electrode layer with a closed second electrode surface comprising a second passivation layer, wherein

an effective electrode surface of the at least one first structure element is smaller than the closed second electrode surface; and

the second passivation layer is a closed layer completely covering the second electrode layer, and the second passivation layer comprises at least one second structure element for field shaping in the at least one channel, said at least one second structure element being formed by second layer structures in the second passivation layer.

2. The micro system according to claim 1 , wherein the at least one first structure element comprises at least one structured partial electrode.

3. The micro system according to claim 2 , wherein the first electrode device, by way of partial electrodes, comprises individually controllable electrode strips.

4. The micro system according to claim 1 , wherein at least one of the first layer structures and the second layer structures comprise regions of changed thickness in the first passivation layer and the second passivation layer.

5. The microsystem according to claim 4 , wherein the regions are inhomogeneous with at least one of a thickness gradient and a material gradient.

6. The microsystem according to claim 1 , wherein at least one of the first layer structures and the second layer structures comprise regions containing at least one material differing from a material of a remaining and surrounding portion of the first passivation layer or the second passivation layer.

7. The microsystem according to claim 6 , wherein the regions are inhomogeneous with at least one of a thickness gradient and a material gradient.

8. The microsystem according to claim 1 , wherein at least one of the first passivation layer and the second passivation layer is at least partly formed by a layer material whose dielectric characteristics are reversibly or irreversibly changeable.

9. The microsystem according to claim 1 , wherein a third electrode device is provided for generating electrical direct-voltage fields or direct-voltage pulses in the at least one channel or in a transverse channel branching off from the at least one channel.

10. The microsystem according to claim 1 , wherein an external electrode device is provided for generating electrical direct-voltage fields or direct-voltage pulses in the at least one channel or in a transverse channel branching off from the at least one channel.

11. A method for field shaping in a channel of a fluidic microsystem according to claim 1 , wherein a geometric shape of electrical fields in the channel is determined by a geometric shape of layer structures in passivation layers in which there is a modified field transconductance.

12. A fluidic microsystem comprising:

at least one channel through which a particle suspension can flow; and

first and second electrode devices which are arranged on first and second channel walls for generating electrical alternating-voltage fields in the channel; wherein

the first electrode device is adapted for field shaping in the at least one channel and comprises at least one first structure element; and

the second electrode device comprises an area-like second electrode layer with a closed second electrode surface comprising a second passivation layer, wherein

an effective electrode surface of the at least one first structure element is smaller than the closed second electrode surface;

the second passivation layer is a closed layer completely covering the second electrode layer; and

the first electrode device comprises an area-like electrode layer with a closed first electrode surface which comprises a closed first passivation layer, wherein the closed first passivation layer comprises first layer structures which form the at least one first structure element.

13. The micro system according to claim 12 , wherein at least one of the first passivation layer and the second passivation layer comprise(s) several layers.

Assignments (5)
CHANGE OF NAME Recorded Mar 19, 2024
From: PERKINELMER CELLULAR TECHNOLOGIES GERMANY GMBH
To: REVVITY CELLULAR TECHNOLOGIES GMBH
Reel/Frame 066826/0865 →
CHANGE OF NAME Recorded Aug 19, 2008
From: EVOTEC TECHNOLOGIES GMBH
To: PERKINELMER CELLULAR TECHNOLOGIES GERMANY GMBH
Reel/Frame 021398/0678 →
CHANGE OF NAME Recorded Feb 7, 2007
From: EVOTEC OAI AG
To: EVOTEC AG
Reel/Frame 018865/0201 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2007
From: EVOTEC AG
To: EVOTEC TECHNOLOGIES GMBH
Reel/Frame 018865/0209 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 30, 2005
From: MULLER, TORSTEN; SCHNELLE, THOMAS
To: EVOTEC OAI AG
Reel/Frame 016614/0555 →