Method and device for mass spectroscopy
The present invention relates to mass spectrometer target slides ( 1 ) which are provided with pits ( 9 a - 9 n ) on the sample receiving surface ( 5 ). The sample receiving surface ( 5 ) and the rims ( 11 a - 11 n ) of the pit ( 9 a - 9 n ) are coated with a hydrophobic layer 17 . The at least one pit ( 9 a - 9 n ) has a width or diameter Ø 1 which is less than the width of a drop applied to the pit ( 9 a - 9 n ).
1 . A method of preparing a target slide for mass spectroscopy analysis comprising the steps of: making at least one pit ( 9 a - 9 n ) which is less than 1 mm wide and having a wall ( 13 a - 13 n ) and a pit bottom ( 15 a - 15 n ) in a sample receiving surface ( 5 ) of a substrate ( 3 ) of the target slide ( 1 ), wherein there is a rim ( 11 a - 11 n ) between said sample receiving surface and said wall ( 13 a - 13 n ); and, making said sample receiving surface ( 5 ) and the rim ( 11 a - 11 n ) of said at least one pit ( 9 a - 9 n ) more hydrophobic than the substrate ( 3 ) of said target slide.
2 . The method of claim 1 wherein said rim ( 11 a - 11 n ) is coated with a layer of hydrophobic material ( 17 ).
3 . The method of claim 1 , further comprising the step of making the pit bottom(s) ( 15 a - 15 n ) of said at least one pit ( 9 a - 9 n ) more hydrophobic than the substrate ( 3 ) of said target slide.
4 . A target slide for use in a mass spectrometer comprising a substrate ( 3 ) having a sample receiving surface ( 5 ) including at least one pit ( 9 a - 9 n ) which is less than 1 mm wide and having a wall ( 13 a - 13 n ) and a pit bottom ( 15 a - 15 n ) in said sample receiving surface ( 5 ), wherein there is a rim ( 11 a - 11 n ) between said sample receiving surface and said wall ( 13 a - 13 n ), wherein said sample receiving surface ( 5 ) and the rim ( 11 a - 11 n ) of said at least one pit ( 9 a - 9 n ) are more hydrophobic than the substrate ( 3 ).
5 . The target slide of claim 4 , wherein said at least one pit is more than 0.05 mm wide.
6 . The target slide of claim 4 , wherein said at least one pit ( 9 a - 9 n ) is less than 100 μm deep.
7 . The target slide of claim 4 , wherein said at least one pit ( 9 a - 9 n ) is more than 5 μm deep.
8 . The target slide of claim 4 , comprising a substrate ( 3 ) of conducting material coated with a layer ( 17 ) of hydrophobic material.
9 . The target slide of claim 8 , wherein said layer ( 17 ) of hydrophobic material is less than 0.1 mm thick.
10 . The target slide of claim 4 , wherein said pit bottom ( 15 a - 15 n ) is more hydrophobic than the substrate ( 3 ).