IP Library Granted Patent US 7,459,991
Granted Patent B2
US 7,459,991 · App. 10/542,970 · Granted Dec 2, 2008

SAW component having an improved temperature coefficient

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Quick Facts
Patent No.
US 7,459,991
App. No.
10/542,970
Granted
Dec 2, 2008
Kind
B2
Abstract

An apparatus including a piezoelectric substrate having at least one transducer electrode structure. The structure having a metallization formed by one or more metals with a mean specific density that is at least 50% higher than that of aluminum. The structure having a compensation layer that is applied fully or partially over the metallization. The compensation layer is of a material having a temperature dependence of elastic constants that counteracts the temperature coefficient of frequency of the substrate. The compensation layer has a thickness that is less than 15% of an acoustic wavelength of a wave capable of propagation in the structure.

Claims (26)

1. An apparatus comprising:

a piezoelectric substrate comprising at least one transducer electrode structure comprising:

a metallization formed by one or more metals, the one or more metals having a mean specific density that is at least 50% higher than that of aluminum;

a compensation layer applied fully or partially over the metallization, the compensation layer being of a material having a temperature dependence of elastic constants that substantially counteracts a temperature coefficient of frequency of the substrate, the compensation layer having a thickness that is less than 15% of an acoustic wavelength of a wave capable of propagation in the structure; and

a passivation layer that is thinner than the compensation layer, the passivation layer being beneath the compensation layer.

2. The apparatus of claim 1 , wherein the elastic constants of the metallization have less temperature dependency than elastic constants of aluminum.

3. The apparatus of claim 1 , wherein the metallization comprises one or more of the following: copper, molybdenum, tungsten, gold, silver and platinum.

4. The apparatus of claim 1 , wherein the compensation layer comprises SiO 2 .

5. The apparatus of claim 1 , wherein the metallization comprises copper or a copper alloy and has a thickness of 6 to 14% h/λ, where h is the thickness of the compensation layer and λ is the acoustic wavelength of a wave capable of propagation in the structure.

6. The apparatus of claim 1 , wherein the compensation layer has a thickness of 4 to 10% h/λ, where h is the thickness of the compensation layer and λ is the acoustic wavelength of a wave capable of propagation in the structure.

7. The apparatus of claim 1 , wherein the substrate comprises lithium tantalate with a rotated cut.

8. The apparatus of claim 1 , wherein the substrate comprises lithium tantalate with a rotated cut and an angle of intersection of between 30 and 480°.

9. The apparatus of claim 1 , wherein the substrate comprises lithium niobate.

10. The apparatus of claim 1 , wherein the substrate comprises quartz.

11. The apparatus of claim 1 , further comprising an adhesive layer beneath the metallization.

12. The apparatus of claim 11 , wherein the adhesive layer comprises one or more of the following: aluminum, molybdenum, titanium, tungsten, chromium, and nickel.

13. The apparatus of claim 11 , wherein the adhesive layer has a thickness of 1 to 7 nm.

14. The apparatus of claim 1 , wherein the compensation layer comprises SiO 2 with a refractive index of between 1.43 and 1.49.

15. The apparatus of claim 1 , wherein the temperature coefficient of frequency is less than 20 ppm/k.

16. The apparatus of claim 1 , wherein the apparatus comprises a multiport filter.

17. The apparatus of claim 1 , wherein the apparatus comprises a reactance filter.

18. The apparatus of claim 1 , wherein the apparatus comprises a dual mode surface acoustic wave filter.

19. The apparatus of claim 1 , wherein the apparatus comprises a single phase uni-directional transducer filter.

20. The apparatus of claim 1 , wherein the apparatus comprises a duplexer.

21. The apparatus of claim 1 , wherein the apparatus comprises a diplexer.

22. The apparatus of claim 1 , wherein the apparatus comprises a 2-in-1 filter.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 2, 2017
From: EPCOS AG
To: SNAPTRACK, INC.
Reel/Frame 041608/0145 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ORIGINALLY RECORDED ASSIGNMENT PREVIOUSLY RECORDED ON REEL 001666 FRAME 0789. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF ASSIGNORS INTEREST. Recorded Aug 8, 2016
From: RUILE, WERNER; ROESLER, ULRIKE; WOLFF, ULRICH; LEIDL, ANTON; SCHOLL, GERD; HAUSER, MARKUS; KNAUER, ULRICH
To: EPCOS AG
Reel/Frame 039629/0834 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2005
From: RUILE, WERNER; ROESLER, ULRIKE; WOLFF, ULRICH; LEIDL, ANTON; SCHOLL, GERD; HAUSER, MARKUS; KNAUER, ULRICH
To: EPCOS AG
Reel/Frame 016663/0789 →