Repair and restoration of damaged dielectric materials and films
View Patent ↗Methods of repairing voids in a material are described herein that include: a) providing a material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c) chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. Methods of carbon restoration in a material are also described that include: a) providing a carbon-deficient material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c)chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. In addition, methods are described herein for reducing the condensation of a film and/or a carbon-deficient film that include: a) providing a film having a plurality of reactive silanol groups; b) placing the film into a plasma chamber; c) introducing a plurality of reactive organic moieties-containing silanes into the chamber; and d) allowing the silanes to react with at least some of the reactive silanol groups. Dielectric materials and low-k dielectric materials are described herein that comprise: a) an inorganic material having a plurality of silicon atoms; and b) a plurality of organic moiety-containing silane compounds, wherein the silane compounds are coupled to the inorganic material through at least some of the silicon atoms.
1. A method of modifying the surface of a material, consisting essentially of:
providing a material having a plurality of silanol groups;
providing at least one surface modification agent, which surface modification agent consists essentially of a monomer and which monomer comprises at least one organic moiety-containing silane compound;
reacting the organic moiety-containing silane compound with at least some of the plurality of silanol groups;
depositing a metal conductor onto the material; and
subjecting the material to stress and thermal energy, and annealing the metal.
2. The method of claim 1 , wherein the surface modification agent monomer restores hydrophobicity to the material.
3. The method of claim 1 , wherein the material comprises an inorganic material.
4. The method of claim 3 , wherein the inorganic material comprises a silicon-based inorganic material.
5. The method of claim 1 , wherein the organic moiety-containing silane compound comprises a compound having the formula:
(R 1 ) x Si(R 2 ) 4-x
where R 1 is alkyl having 1 to 3 carbon atoms, vinyl or aryl; R 2 is hydrogen, chlorine, acetoxy, methoxy, ethoxy or other acetoxy groups; and x is 1, 2 or 3.
6. A method of carbon restoration in a carbon-depletion damaged material, comprising:
providing a carbon-depletion damaged material having a plurality of silanol groups;
providing at least one surface modification agent, which surface modification agent consists essentially of a monomer and which monomer comprises at least one organic moiety-containing silane compound;
reacting the organic moiety-containing silane compound with at least some of the plurality of silanol groups;
depositing a metal conductor onto the material; and
subjecting the material to stress and thermal energy, and annealing the metal.
7. The method of claim 6 , wherein the surface modification agent monomer restores hydrophobicity to the material.
8. The method of claim 6 , wherein the carbon-depletion damaged material comprises an inorganic material.
9. The method of claim 8 , wherein the inorganic material comprises a silicon-based inorganic material.
10. The method of claim 6 , wherein the organic moiety-containing silane compound comprises a compound having the formula:
(R 1 ) x Si(R 2 ) 4-x
where R 1 is alkyl having 1 to 3 carbon atoms, vinyl or aryl; R 2 is hydrogen, chlorine, acetoxy, methoxy, ethoxy or other acetoxy groups; and x is 1, 2 or 3.
11. A method of modifying the surface of a film, comprising:
providing a film having a plurality of silanol groups;
placing the film into a plasma chamber;
introducing at least one surface modification agent into the chamber in the form of a plasma, which surface modification agent consists essentially of a monomer and which monomer comprises at least one organic moiety-containing silane compound, wherein said organic moiety-containing silane compound reacts with at least some of the silanol groups;
depositing a metal conductor onto the film; and
subjecting the film to stress and thermal energy, and annealing the metal.
12. The method of claim 11 , wherein the surface modification agent monomer restores hydrophobicity to the film.
13. The method of claim 11 , wherein the film comprises an inorganic material.
14. The method of claim 13 , wherein the inorganic material comprises a silicon-based inorganic material.
15. The method of claim 11 , wherein the organic moiety-containing silane compound comprises a compound having the formula:
(R 1 ) x Si(R 2 ) 4-x
where R 1 is alkyl having 1 to 3 carbon atoms, vinyl or aryl; R 2 is hydrogen, chlorine, acetoxy, methoxy, ethoxy or other acetoxy groups; and x is 1, 2 or 3.
16. A method of modifying the surface of a carbon-depletion damaged film, comprising:
providing a carbon-depletion damaged film having a plurality of silanol groups;
placing the film into a plasma chamber;
introducing at least one surface modification agent into the chamber, which surface modification agent consists essentially of a monomer and which monomer comprises at least one organic moiety containing silane compound;
reacting the organic moiety-containing silane compound with at least some of the silanol groups;
depositing a metal conductor onto the material; and
subjecting the film to stress and thermal energy, and annealing the metal.
17. The method of claim 16 , wherein the surface modification agent monomer restores hydrophobicity to the film.
18. The method of claim 16 , wherein the film comprises an inorganic material.
19. The method of claim 18 , wherein the inorganic material comprises a silicon-based inorganic material.
20. The method of claim 16 , wherein the organic moiety-containing silane compound comprises a compound having the formula:
(R 1 ) x Si(R 2 ) 4-x
where R 1 is alkyl having 1 to 3 carbon atoms, vinyl or aryl; R 2 is hydrogen, chlorine, acetoxy, methoxy, ethoxy or other acetoxy groups; and x is 1, 2 or 3.
21. The method of claim 1 wherein the method prevents stress-induced voiding.
22. The method of claim 1 wherein the surface modification agent consists of a monomer which monomer consists essentially of an organic moiety-containing silane compound.
23. The method of claim 1 , wherein the organic moiety-containing silane compound comprises an alkylacetoxysilane, an arylacetoxysilane and combinations thereof.
24. The method of claim 1 , wherein the organic moiety-containing silane compound comprises tris(dimethylamino)methylsilane, tris(dimethylamino)phenylsilane, tris(dimethylamino)silane, methyltris(methylethylkeoxime)silane, methyltriacetoxysilane, dimethyldiacetoxysilane, phenyltriacetoxysilane, methyltrimethoxysilane, diphenyldiacetoxysilane and combinations thereof.
25. A material produced by the process of claim 1 .
26. A material produced by the process of claim 6 .