Manufacturing method for thin-film transistor

1. A method for manufacturing an organic thin-film transistor comprising steps of;

forming a gate electrode and a gate insulating layer on a substrate surface,

forming a film containing an inorganic compound on the gate insulating layer by a CVD (chemical vapor deposition) method employing a reactive gas, the film having a surface with a contact angle against pure water of not less than 50°, and

forming an organic semiconductor layer on the film,

wherein the reactive gas comprises

 wherein M is Si, Ti, Ge, Zr, or Sn; R 1 -R 6 is each a hydrogen atom or a monovalent group, and at least one group among groups represented by R 1 -R 6 is an organic group with fluorine atom, and j is an integer of 0 to 150.

2. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the aforesaid CVD method is a plasma CVD method.

3. The method for manufacturing the organic thin-film transistor of claim 2 ,

wherein the aforesaid plasma CVD method is an atmospheric pressure plasma method in which discharge-plasma is generated by applying a high frequency voltage between electrodes facing each other at atmospheric pressure or approximately atmospheric pressure.

4. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the aforesaid gate insulating layer is formed by generating discharge-plasma after a high frequency voltage is applied between electrodes facing each other at atmospheric pressure or approximately atmospheric pressure, and by placing the substrate, on which the gate electrode is formed, in reactive gas excited by the plasma.

5. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the aforesaid film is formed after the gate insulating layer is placed in the generated discharge-plasma, supplying a discharge gas, by applying a high frequency voltage between electrodes facing each other at atmospheric pressure or approximately atmospheric pressure.

6. The method for manufacturing the organic thin-film transistor of claim 5 ,

wherein the aforesaid discharge gas contains oxygen.

7. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the raw material of the reactive gas for forming a film contains a silicon or fluorine-containing organic compound.

8. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the raw material of the reactive gas for forming a film contains a silane compound having at least one alkyl group, or a titanium compound having at least one alkyl group.

9. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein a process for forming an organic semiconductor layer comprises a process for volatilizing a solvent in a solution after supplying the semiconducting material solution.

10. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the semiconductor layer contains a π conjugate polymer or a π conjugate oligomer.

11. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the substrate is flexible resin sheet.

12. The method for manufacturing the organic thin-film transistor of claim 11 ,

wherein the substrate is long length film.

13. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the substrate has a subbing layer containing a compound selected from inorganic oxides or inorganic nitrides, or a subbing layer containing a polymer.

14. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the method further comprises a step of forming a subbing layer by atmospheric pressure plasma method before forming the gate electrode and a gate insulating layer.

15. The method for manufacturing the organic thin-film transistor of claim 1 ,

wherein the film comprises an organometallic compound.

16. The method for manufacturing the organic thin-film transistor of claim 1 , wherein the reactive gas comprises an organosilicon compound or an organometallic compound.

17. The method for manufacturing the organic thin-film transistor of claim 16 , wherein the reactive gas comprises an organosilicon compound.

18. The method for manufacturing the organic thin-film transistor of claim 16 ,

wherein the reactive gas comprises the organometallic compound and the organometallic compound contains Ti, Ge, Zn, or Sn.

19. The method of claim 1 , wherein j is an integer of 0 to 50.

20. The method of claim 1 , wherein j is an integer of 0 to 20.

21. The method of claim 1 , wherein at least one group among groups represented by R 1 -R 6 is an alkyl, alkenyl or aryl group having a fluorine atom.

22. A method f or manufacturing an organic thin-film transistor comprising steps of;

forming a gate electrode and a gate insulating layer on a substrate surface,

forming a film on the gate insulating layer by a CVD (chemical vapor deposition) method employing a reactive gas comprising a compound represented by the formula of

 wherein N is Si, Ti, Ge, Zr, or Sn; R 1 -R 6 is each a hydrogen atom or a monovalence group, and at least one group among groups represented by R 1 -R 6 is an organic group with fluorine atom, and j is an integer of 0 to 150,

and a discharge gas,

the film having a surface with a contact angle against pure water of not less than 50°, and

forming an organic semiconductor layer on the film.

23. The method for manufacturing the organic thin-film transistor of claim 22 , wherein

the discharge gas is excited and

the excited gas is brought into contact with the reactive gas to form the film.