Method of preparing dimethylcetene and, subsequently, polydimethylcetene from isobutyric anhydride
View Patent ↗The present invention relates to a process for the preparation of dimethylketene (DMK) and then of polydimethylketene (PDMK) by polymerization of DMK. More specifically, the DMK is obtained by pyrolysis by isobutyric anhydride (IBAN), the latter decomposing under the effect of heat (pyrolysis) to give isobutyric acid (IBA) and DMK. One mole of pyrolyzed IBAN gives one mole of IBA and one mole of DMK.
1. A process for the preparation of dimethylketene (DMK) by pyrolysis of isobutyric anhydride (IBAN), in which:
a) a mixture comprising 1 to 50% by volume of IBAN and 99 to 50% of inert gas is preheated at atmospheric pressure between 300 and 340° C.,
b) this mixture is then brought to a temperature of between 400 and 550° C. for a contact time of between 0.05 and 10 s, in order to obtain a mixture of DMK, of inert gas, of isobutyric acid (IBA) and of unreacted IBAN,
c) the mixture resulting from b) is cooled in a condensation stage, in order to separate the gas mixture comprising the DMK from the condensed IBA and/or condensed IBAN.
2. The process as claimed in claim 1 , in which the inert gas is chosen from nitrogen and helium.
3. The process as claimed in claim 1 , in which the proportions of IBAN and of inert gas are from 5 to 50% by volume of IBAN and 95 to 50% of inert gas.
4. The process as claimed in claim 1 , in which the proportions of IBAN and of inert gas are from 8 to 21% by volume of IBAN and 92 to 79% of inert gas.
5. The process as claimed in claim 1 , in which the contact time is between 0.15 and 0.25 seconds.
6. The process as claimed in claim 1 , in which the gas mixture comprising DMK and resulting from stage c) is brought into contact with a washing solution in order to reduce, the traces of IBA and/or of IBAN included in said gas mixture and to obtain the DMK with a purity sufficient to polymerize it.
7. The process as claimed in claim 6 , characterized in that the gas mixture comprising the DMK resulting from stage c) is washed in a washing column equipped with a demister.
8. The process as claimed in claim 7 , characterized in that the demister is situated either at the column top or at the column bottom.
9. The process as claimed in claim 7 , characterized in that the gas mixture enters at the bottom of the washing column, whereas the washing solvent enters at the column top.
10. The process as claimed claim 6 , in which the washing solution is IBAN or a saturated or unsaturated, aliphatic or alicyclic, substituted or unsubstituted hydrocarbon.
11. The process as claimed in claim 1 , in which:
d) the gas mixture comprising the DMK is absorbed in a solvent of saturated or unsaturated, aliphatic or alicyclic and substituted or unsubstituted hydrocarbon type, and
e) polymerization is then carried out, in said solvent comprising the DMK, to give PDMK in the presence of a cationic initiating system comprising an initiator (I), a coinitiator (K) and a complexing agent (CoK), and
f) at the end of the polymerization, the unreacted DMK is removed and the PDMK is separated from the solvent and from the residues of the cationic initiating system.
12. The process as claimed in claim 11 , in which the complexing agent (CoK) is an agent which releases the polymerization active center from its counteranion generated by the reaction between the coinitiator (K) and the initiator (I).
13. The process as claimed in claim 12 , characterized in that the complexing agent (CoK) is a molecule having at least one double bond depleted in electrons by an electron-withdrawing group.
14. The process as claimed in claim 13 , in which the complexing agent (CoK) is selected from the group: o-chloranil (3,4,5,6,-tetrachloro-1,2-benzoquinone), p-chloranil (2,3,5,6-tetrachloro-1,4-benzoquinone), nitrobenzene, trinitrobenzene, difluoronitrobenzene, tetracyanoethylene, pentafluorobenzene, hexafluorobenzene and octafluorotoluene.
15. The process as claimed in claim 11 , in which the coinitiator (K) comprises an element (M) belonging to Groups IB, IIB and A, IIIB and IIIA, IVB and IVA, VB and VA, and VIIIB of the Periodic Table of the Elements.
16. The process as claimed in claim 15 , characterized in that the element (M) is taken from the group consisting of the chemical elements B, Ti, Sn, Al, Hf, Zn, Be, Sb, Ga, In, Zr, V, As and Bi.
17. The process as claimed in claim 15 , in which the coinitiator (K) is a Lewis acid of general formula R n MX 3-n where M is an element belonging to Group IIIA, coinitiator (K) is of general formula MX 4 where M is an element belonging to Groups VA, IVA and IVB and coinitiator (K) is of general formula MX 5 where M is an element belonging to Group VB, with:
R a monovalent radical taken from the group consisting of the hydrocarbon groups of 1 to 12 carbon atoms of alkyl, aryl, arylalkyl, alkylaryl or cycloalkyl type and alkoxys;
X a halogen atom taken from the group consisting of F, Cl, Br and I;
n an integer from 0 to 3.
18. The process as claimed in claim 15 , in which the coinitiator (K) is taken from the group consisting of TiCl 4 , ZrCl 4 , SnCl 4 , VCl 4 , SbF 5 , AlCl 3 , AlBr 3 , BF 3 , BCl 3 , FeCl 3 , EtAlCl 2 , Et 1.5 AlCl 1.5 , Et 2 AlCl, AlMe 3 and AlEt 3 .
19. The process as claimed in claim 11 , in which the initiator (I) is selected from the group consisting of monofunctional molecules (I1), difunctional molecules (I2), molecules substituted by one or more halogen atoms (I3)Brönsted acids (I4).
20. The process as claimed in claim 7 , characterized in that the demister is situated at the column top.