Encapsulation structure for display devices
View Patent ↗An encapsulation structure for a display device includes a sealing structure and a stabilization layer. The sealing structure is an essentially water/oxygen impermeable film which covers environmentally sensitive parts and protrusions on the display device. The stabilization layer covers the display device, protrusions on the display and the sealing structure with a scratch resistant protective layer, resulting in a water/oxygen impermeable and scratch resistant encapsulation structure.
1. An encapsulation structure for a display device, comprising:
a dielectric sealing structure that seals protruding structures, the dielectric sealing structure being non-planar and conforming to a shape of the protruding structures; and
stabilization layer located over the dielectric sealing structure to form a substantially planar surface;
wherein the protruding structures have negative slopes that form shadow regions.
2. The encapsulation structure according to claim 1 , wherein said stabilization layer is of a polymeric material.
3. The encapsulation structure according to claim 1 , wherein said sealing structure comprises a first layer of a first dielectric material and a second layer of a second dielectric material.
4. The encapsulation structure according to claim 3 , wherein said sealing structure further comprises a third layer of a third dielectric material.
5. The encapsulation structure according to claim 4 , wherein said third dielectric material is the same as said first dielectric material.
6. The encapsulation structure according to claim 3 , wherein said first dielectric material is selected from the group comprising silicon nitride, aluminium nitride and any mixture thereof, and wherein said second dielectric material is selected from the group comprising silicon oxide, silicon oxide fluoride, titanium oxide, tantalum oxide, zirconium oxide, hafnium oxide, aluminium oxide and any mixture thereof.
7. The encapsulation structure according to claim 3 , wherein said first dielectric material is selected from the group comprising silicon oxide, silicon oxide fluoride, titanium oxide, tantalum oxide, zirconium oxide, hafnium oxide, aluminium oxide and any mixture thereof, and wherein said second dielectric material is selected from the group comprising silicon nitride, aluminium nitride and any mixture thereof.
8. The encapsulation structure according to claim 1 , wherein an essentially cavity-free interface is formed between said stabilization layer and said sealing structure.
9. The encapsulation structure according to claim 1 , wherein the thermal expansion coefficient of said stabilization layer is essentially the same as the thermal expansion coefficient of said sealing structure.
10. The encapsulation structure according to claim 1 , wherein the thickness of said stabilization layer is at least 0.1 μm.
11. The encapsulation structure according to claim 1 , wherein said encapsulation structure is transparent.
12. The encapsulation structure according to claim 1 , wherein said stabilization layer is of a non-polymeric material.
13. The encapsulation structure according to claim 12 , wherein said non-polymeric material is a cured inorganic material.
14. The encapsulation structure according to claim 1 , wherein said display device is selected from a polyLED display, an OLED display or a Liquid Crystal Display.
15. A display device comprising an encapsulation structure according to claim 1 .
16. The encapsulation structure of claim 1 , wherein the dielectric sealing structure comprises silicon oxide fluoride.
17. The encapsulation structure of claim 1 , wherein the stabilization layer comprises Indium.
18. A method for manufacturing an encapsulation structure for a display device comprising the acts of:
depositing a dielectric sealing structure that seals protruding structures, the dielectric sealing structure being non-planar and conforming to a shape of the protruding structures; and
depositing a stabilization layer over the dielectric sealing structure to form a planar surface;
wherein the protruding structures have negative slopes that form shadow regions.
19. The method according to claim 18 , wherein said depositing of the stabilization layer comprises depositing a curable composition, and curing said curable composition.
20. The method according to claim 19 , wherein said curing is thermal curing.
21. The method according to claim 18 wherein said stabilization layer is deposited by inkjet printing.
22. The method according to claim 18 wherein said display device is selected from a polyLED display, an OLED display and a LCD display.
23. A display device obtainable by the method according to claim 18 .
24. The method of claim 18 , further comprising the act of selecting materials for the dielectric sealing structure and stabilization layer such that the materials have substantially equal thermal expansion coefficients.
25. The method of claim 18 , wherein the depositing the dielectric sealing structure is performed at 80° C.