LED and fabrication method thereof
A light emitting diode is provided. The diode includes: a substrate; a first nitride gallium layer disposed above the substrate; a first electrode provided at one portion of and above the first nitride gallium layer; an active layer provided above the first nitride gallium layer, for emitting light; a second nitride gallium layer provided above the active layer; and transparent electrodes spaced apart from one another above the second nitride gallium layer.
1. An LED, comprising:
a first gallium nitride layer;
a first electrode at one portion of and above the first gallium nitride layer;
an active layer above the first gallium nitride layer;
a second gallium nitride layer above the active layer;
a plurality of transparent electrodes on the second gallium nitride layer, wherein one of the plurality of transparent electrodes is electrically connected to, and is physically isolated from, another of the plurality of transparent electrodes;
a second electrode above the second gallium nitride layer; and
a plurality of connection units directly in contact with the second gallium nitride layer, each connection unit electrically connecting a respective one of the plurality of transparent electrodes with the second electrode.
2. The LED according to claim 1 , wherein the plurality of transparent electrodes comprise at least three patterns.
3. The LED according to claim 1 , wherein the plurality of connection units directly connect the second electrode with a respective one of the plurality of transparent electrodes.
4. The LED according to claim 1 , wherein the plurality of transparent electrodes, the second electrode and the plurality of connection units are formed directly on the second gallium nitride layer.
5. The LED according to claim 1 , wherein the plurality of transparent electrodes are co-planar.
6. The LED according to claim 1 , wherein the plurality of connection units are formed of metal films.
7. The LED according to claim 1 , wherein the plurality of transparent electrodes are disposed directly above corresponding physically separated locations of a surface of the second gallium nitride layer.