Method for treating antireflection coatings on an optical substrate, the thus obtained optical substrate and device for carrying gout said method
View Patent ↗Method for treating antireflection coatings on an optical substrate ( 17 ) involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterized in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer ( 21 d ) by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.
1. A method for applying an antireflection treatment to an optical substrate, comprising:
depositing by physical vapor-phase deposition (PVD) in a vacuum a low index layer having a low refractive index and including a fluorinated polymer,
wherein said depositing step consists in depositing a hybrid silica (SiO 2 ) or magnesium fluoride (MgF 2 )/fluorinated polymer layer as said low index layer by a simultaneous co-evaporation, in a vacuum, of the silica or magnesium fluoride and the fluorinated polymer, the fluorinated polymer being a homopolymer of tetrafluoroethylene.
2. The method according to claim 1 , wherein the silica or magnesium fluoride and the fluorinated polymer are co-evaporated so that the silica or magnesium fluoride and the fluorinated polymer are present in constant proportions throughout a thickness of the low index layer.
3. The method according to claim 2 , wherein a quantity of the fluorinated polymer in the low index layer is kept less than or equal to approximately 30% by volume, and a remaining quantity in the low index layer consists of the silica or magnesium fluoride.
4. The method according to claim 2 , further comprising successive steps of:
continuously measuring, as measurements, one of i) a refractive index of the low index layer as the low index layer is formed and ii) respective rates of deposition of the silica or magnesium fluoride and the fluorinated polymer;
determining from said measurements respective quantities of deposited silica or magnesium fluoride and deposited fluorinated polymer; and
regulating deposition parameters of the silica or magnesium fluoride and/or the fluorinated polymer in order to deposit the silica or magnesium fluoride and the fluorinated polymer in selected proportions throughout the thickness of the low index layer.
5. The method according to claim 1 , wherein, when co-evaporating the silica or magnesium fluoride and the fluorinated polymer, proportions of the silica or magnesium fluoride and the fluorinated polymer are allowed to vary in a controlled manner over a whole of or a portion of the thickness of the low index layer.
6. The method according to claim 5 , wherein a quantity of fluorinated polymer in the low index layer is from zero to approximately 80% by volume in a direction from the substrate toward a surface of the low index layer, and a remaining quantity in the low index layer consists of the silica or magnesium fluoride.
7. The method according to claim 1 , wherein the silica or magnesium fluoride and fluorinated polymer are evaporated by means of the Joule effect or by means of an electron gun.
8. The method according to claim 1 , wherein the silica or magnesium fluoride is evaporated by means of an electron gun and the fluorinated polymer is evaporated by means of the Joule effect.
9. The method according to claim 1 , wherein the substrate is an organic material substrate.
10. The method according to claim 1 , wherein the low index layer is an outside layer of an antireflection multilayer film deposited on the optical substrate.
11. The method according to claim 10 , wherein the antireflection multilayer film is fabricated by successive steps of physical vapor-phase deposition (PVD) in a vacuum of three layers of the type ZrO 2 /SiO 2 /ZrO 2 , and then said deposition of the low index layer as the outside layer.
12. The method according to claim 11 , wherein each successive step of physical vapor-phase deposition is effected at a pressure less than or equal to approximately 10 −2 Pa.
13. A method for applying an antireflection treatment to an optical substrate, comprising:
depositing by physical vapor-phase deposition (PVD) in a vacuum a low index layer having a low refractive index and including a fluorinated polymer,
wherein said depositing step consists in depositing a hybrid silica (SiO 2 )/fluorinated polymer layer as said low index layer by a simultaneous co-evaporation, in a vacuum, of the silica and the fluorinated polymer, the fluorinated polymer being a homopolymer of tetrafluoroethylene.
14. A method for applying an antireflection treatment to an optical substrate, comprising:
depositing by physical vapor-phase deposition (PVD) in a vacuum a low index layer having a low refractive index and including a fluorinated polymer,
wherein said depositing step consists in depositing a hybrid magnesium fluoride (MgF 2 )/fluorinated polymer layer as said low index layer by a simultaneous co-evaporation, in a vacuum, of the magnesium fluoride and the fluorinated polymer, the fluorinated polymer being a homopolymer of tetrafluoroethylene.