Methods of operating surface reactors and reactors employing such methods
View Patent ↗New methods of operating surface reactors, and such reactors, particularly spinning disk reactors, require that a first reactant is fed to a reactor surface ( 20 ) and forms a thin radially outward moving film ( 60 ) thereon in a reaction passage ( 42 ) formed between the reaction surface ( 20 ) and a parallel, closely spaced (less than 1 mm) retaining surface ( 40 ). The passage thickness is precisely controllable and the surfaces ( 20, 40 ) move relative to one another so that strong shear is applied to the material between them. A second reactant is fed to the surface ( 20 ) as a second thin film ( 65 ) that as it enters the first film ( 60 ), preferably perpendicularly, it is immediately merged therewith along a correspondingly very narrow interaction line ( 66 ) by the shear at a rate such as to break up molecular clusters in the films, so that their molecules can aggressively and completely interact by forced interdiffusion. In spinning disk ( 18 ) apparatus the first film ( 60 ) is fed along the spin axis ( 14 ), while subsequent films ( 65 , etc.) are fed at respective distances from the axis ( 14 ) such that there is adequate shear for the molecular cluster disruption. Preferably each film ( 65 , etc.) after the first ( 60 ) is fed into the reaction passage ( 42 ) through a respective thin annular nozzle producing a thin circular film ( 65 ) that simultaneously merges with the first film ( 60 ) along its entire length.
1. Methods of operating surface reactors comprising in each method the steps of:
providing a reactor body having a reactor surface;
feeding a first reactant to the reactor surface from a first entry location so that the reactant spreads out on the surface in the form of a first thin film;
feeding a second reactant to the reactor surface from a second entry location so that the reactants can interact in a reaction zone on the reaction surface; and
collecting the product of the interacting reactants at an outlet location; wherein:
the reactor body provides a retaining surface closely spaced from the reactor surface so as to form between them a reaction passage providing a reaction zone between the second entry location and the outlet location and through which the reactants fed to the reactor surface will pass while reacting with one another, the reactor and retaining surfaces being movable relative to one another to apply shear between them to reactants passing in the reaction passage;
each reactant after the first is fed to the reactor surface in the form of a respective thin film that is fed into a respective preceding thin film or combination of thin films, each thin film at its entry to the reaction passage immediately being subjected at its intersection with the preceding thin film or combination of thin films to continuous and uniform shear, the shear rate being such as to disrupt molecular clusters in the thin films and thereby permit the molecules of the thin films to aggressively react with one another to form the resultant product,
wherein one or both of the reactor surface and the retaining surface is provided with heat transfer means to heat or cool the reactants in the reaction passage.
2. A method as claimed in claim 1 , wherein the reactor surface is a surface of a disk spinning about a rotational axis;
and wherein shear in the reaction passage is transverse to the direction of the flow of reactants in the passage and is produced by relative rotation between the moving reaction surface and the retaining surface which is stationary.
3. A method as claimed in claim 1 , wherein the thickness dimension of the reaction chamber can be varied and is less than 1.00 mm (0.04 in).
4. A method as claimed in claim 1 , wherein the thickness of each of the first and second thin films is between 5 and 500 micrometers.
5. A method as claimed claim 1 , wherein the width dimension of the reaction zone in the direction of flow in the reaction passage is between 1 mm and 500 mm.
6. A method as claimed in claim 1 , wherein each thin film after the first thin film is fed to the reactor surface and into the first thin film or combination of thin films that precedes it on the reactor surface providing substantially instantaneous micromixing of the films.
7. A method as claimed in claim 1 , wherein each thin film after the first thin film is fed to that thin film or to its mixture of thin films at an entry location spaced at a radial distance from the rotation axis such as to provide the shear required to ensure disruption of molecular clusters in the reacting reactants.
8. A method as claimed in claim 1 , wherein each thin film is fed into the thin film that receives it through a respective annular nozzle producing a respective circular cross section thin film directed at the reactor surface.
9. A method as claimed in claim 1 , wherein the reactor surface and the retaining surface are polished to a mirror finish smoothness.
10. A method as claimed in claim 1 , wherein the shear in the interacting reactants is increased by introduction of a pressurized gaseous component into the reaction passage.
11. A method as claimed in claim 1 , wherein each thin film after the first thin film impinges substantially perpendicularly with the first thin film or combination of thin films that precedes it on the reactor surface to provide micromixing before shearing.
12. A surface reactor comprising:
a reactor body having a reactor surface;
means for feeding a first reactant to the reactor surface from a first entry location so that the reactant spreads out on the reactor surface in the form of a first thin film;
means for feeding a second reactant to the reactor surface from a second entry location so that the reactants can interact in a reaction zone on the reactor surface; and
means for collecting the product of the interacting reactants at an outlet location;
wherein:
the reactor body provides a retaining surface closely spaced from the reactor surface so as to form between them a reaction passage providing a reaction zone between the second entry location and the outlet location and through which the reactants fed to the reactor surface will pass while reacting with one another, the surfaces being movable relative to one another to apply shear between them to reactants passing in the reaction passage;
each reactant after the first reactant is fed to the reactor surface in the form of a respective thin film that is fed into a respective preceding thin film or combination of thin films, each thin film at its entry to the reaction passage immediately being subjected at its intersection with the preceding thin film or combination of thin films to continuous and uniform shear therein, the shear rate being such as to disrupt molecular clusters in the thin films and thereby permit the molecules of the thin films to aggressively react with one another to form the resultant product,
wherein there are provided for one or both of the reactor surface and the retaining surface heat transfer means to heat or cool the reactants in the reaction passage.
13. A surface reactor as claimed in claim 12 , wherein the reactor surface is a surface of a disk spinning about a rotational axis;
and wherein shear in the reaction passage is transverse to the direction of the flow of reactants in the passage and is produced by relative rotation between the moving reaction surface and the retaining surface which is stationary.
14. A surface reactor as claimed in claim 12 , wherein the reactor comprises means whereby the thickness dimension of the reaction passage can be varied, and the thickness dimension is less than 1.00 mm (0.04 in).
15. A surface reactor as claimed in claim 14 , wherein the thickness dimension of the reaction passage is less than 0.5 mm (0.02 in).
16. A surface reactor as claimed in claim 12 , wherein each entry location feeds the respective reactant in the form of a thin film of thickness between 5 and 500 micrometers.
17. A surface reactor as claimed in claim 12 , wherein the width dimension of the reaction zone in the direction of flow in the reaction passage is between 1 mm and 500 mm.
18. A surface reactor as claimed in claim 12 , wherein the means feeding each thin film after the first thin film to the reactor surface is fed to the reactor surface into the first thin film or combination of thin films that precedes it on the reactor surface providing substantially instantaneous micromixing of the films.
19. A surface reactor as claimed in claim 12 , wherein the entry location for each thin film after the first thin film is at a radial distance from the rotation axis such as to provide the shear required to ensure disruption of molecular clusters in the reacting reactants.
20. A surface reactor as claimed in claim 12 , wherein each thin film after the first film is fed into the film that receives it through a respective annular nozzle producing a respective circular cross section thin film directed at the reactor surface.
21. A surface reactor as claimed in claim 12 , wherein the reactor surface and the retaining surface are polished to a mirror finish smoothness.
22. A surface reactor as claimed in claim 12 , comprising means for the introduction of a pressurized gaseous component into the reaction passage to increase the shear in the reacting reactants.
23. A surface reactor as claimed in claim 12 , wherein the means feeding each thin film after the first thin film to the reactor surface impinges substantially perpendicularly with the first thin film or combination of thin films that precedes it on the reactor surface to provide micromixing before shearing.