IP Library Patent Application 10587323
Patent Application
App. No. 10/587,323

Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers

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Quick Facts
Patent No.
US None
App. No.
10/587,323
Abstract

Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. R F -compositions such as R F -intermediates, R F -surfactants, R F monomers, R F -monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F -urethanes, and/or R F -foam stabilizers. The R F portion can include at least two CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit. Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F surfactants and/or R F -foam stabilizers are provided.

Claims (63)

1 . A composition comprising an R F -monomer, wherein R F comprises at least three —CF 3 groups and at least two hydrogens.

2 . The composition of claim 1 wherein R F comprises at least one —CH 2 — group.

3 . The composition of claim 1 wherein R F comprises at least one cyclic group.

4 . The composition of claim 1 wherein R F comprises at least one aromatic group.

5 - 6 . (canceled)

7 . The composition of claim 1 wherein R F comprises at least two (CF 3 ) 2 CF— groups.

8 . The composition of claim 1 wherein R F comprises at least four carbons and one of the four carbons comprises a —CH 2 — group.

9 . The composition of claim 1 wherein the R F -monomer comprises R F -Q M , wherein the Q M portion comprises a group configured to react with another monomer to form at least a portion of an oligomer.

10 . The composition of claim 9 wherein the Q M portion comprises an olefin.

11 . The composition of claim 10 wherein the

12 . The composition of claim 9 wherein the Q M portion comprises an acrylate.

13 . The composition of claim 12 wherein the R F -Q M is

wherein R is H or CH 3 .

14 - 15 . (canceled)

16 . The composition of claim 9 wherein the R F -Q M is

17 . The composition of claim 9 wherein the R F -Q M is

18 - 19 . (canceled)

20 . The composition of claim 9 wherein the R F -Q M is

21 . The composition of claim 9 wherein the R F -Q M is

22 . The composition of claim 9 wherein the R F -Q M is

23 . The composition of claim 9 wherein the R F -Q M is

24 - 25 . (canceled)

26 . The composition of claim 9 wherein the R F -Q M is

27 . The composition of claim 9 wherein the R F -Q M is

28 - 29 . (canceled)

30 . A composition comprising a R F -monomer unit, wherein R F comprises a pendant group of the monomer unit, the pendant group comprising at least two —CF 3 groups and at least two hydrogens.

31 . The composition of claim 30 wherein the R F -monomer unit comprises R F -Q MU , Q MU comprising a remainder of the monomer unit.

32 . The composition of claim 30 wherein the pendant group comprises at least one

—CH 2 — group.

33 . The composition of claim 30 wherein the pendant group comprises at least one cyclic group.

34 . The composition of claim 30 wherein the pendant group comprises at least one aromatic group.

35 . The composition of claim 30 wherein the pendant group comprises at least one (CF 3 ) 2 CF— group.

36 . The composition of claim 30 wherein the pendant group comprises at least three —CF 3 groups.

37 . The composition of claim 30 wherein the pendant group comprises at least two (CF 3 ) 2 CF— groups.

38 . The composition of claim 30 wherein the pendant group comprises at least four carbons and one of the four carbons comprises a —CH 2 — group.

39 . The composition of claim 30 wherein the composition comprises an acrylic and the R F -Q MU is a monomer unit of the acrylic.

40 . The composition of claim 30 wherein the composition comprises a resin and the R F -Q MU is a monomer unit of the resin.

41 . The composition of claim 40 wherein the resin comprises a polyurethane resin.

42 . The composition of claim 30 wherein the composition comprises a polymer and the R F -Q MU is a monomer unit of the polymer.

43 . The composition of claim 42 wherein the polymer comprises a copolymer.

44 . The composition of claim 42 wherein the polymer comprises a block polymer.

45 . A composition comprising a R F -composition, R F comprising at least two —CF 3 groups and the composition comprises one or more of a metal complex, a phosphate ester, a glycol, and a urethane.

46 . The composition of claim 45 wherein the R F -composition comprises R F -Q MC , Q MC comprising a remainder of a metal complex.

47 . The composition of claim 46 wherein R F comprises at least one —CH 2 — group.

48 . The composition of claim 46 wherein R F comprises at least one cyclic group.

49 . The composition of claim 46 wherein the cyclic group comprises an aromatic group.

50 . The composition of claim 46 wherein R F comprises at least one (CF 3 ) 2 CF— group.

51 . The composition of claim 46 wherein R F comprises at least three —CF 3 groups.

52 . The composition of claim 46 wherein R F comprises at least two (CF 3 ) 2 CF— groups.

53 . The composition of claim 46 wherein R F comprises at least four carbons and one of the four carbons comprises a —CH 2 — group.

54 . The composition of claim 46 wherein R F -Q MC , is

55 . The composition of claim 45 wherein Q C comprises a metal complex, the metal complex comprising a metal and a ligand, the ligand comprising R F -Q g , wherein:

R F comprises at least two —CF 3 groups and at least two hydrogens; and

Q g is coordinated with the metal of the complex.

56 - 63 . (canceled)

64 . The composition of claim 45 wherein the R F -composition comprises R F -Q PE , Q PE comprising a remainder of a phosphate ester.

65 . The composition of claim 64 wherein R F -Q PE

66 - 73 . (canceled)

74 . The composition of claim 45 wherein the R F -composition comprises R F -Q H , Q H comprising a remainder of a glycol.

75 . The composition of claim 74 wherein R F -Q H is

76 - 82 . (canceled)

83 . The composition of claim 45 wherein the R F -composition comprises R F -Q U , Q U comprising a remainder of a urethane.

84 . The composition of claim 83 wherein R F -Q U

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2008
From: GREAT LAKES CHEMICAL CORPORATION (CHEMTURA)
To: E. I. DU PONT DE NEMOURS AND COMPANY
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