Compositions, Halogenated Compositions, Chemical Production, and Telomerization Processes
Compositions are provided that can include R F (R T ) n Q, formula I (I), formula II (II), and/or R Cl (R T ) n H. The R F group can have four fluorine atoms, the R T group can include a C-2 group having a pendant —CF 3 group, n can be at least 1, the R 1 group can include a carbon atom, the R Cl group can be —CCI 3 , and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.
1 . A composition comprising R F (R T ) n Q, wherein:
the R F group comprises at least four fluorine atoms;
the R T group comprises at least one C-2 group having at least one pendant —CF 3 group;
n is at least 1; and
the Q group comprises a halogen.
2 . The composition of claim 1 wherein the R F group comprises at least one —CF 3 group.
3 . The composition of claim 1 wherein the R F group comprises at least two —CF 3 groups.
4 . The composition of claim 3 wherein the R F group comprises —CF(CF 3 ) 2 .
5 . The composition of claim 1 wherein the R F group comprises —C 6 F 13 .
6 . The composition of claim 1 wherein the R T group comprises
7 . The composition of claim 1 wherein n is at least 2 and the composition comprises
8 . The composition of claim 1 wherein n is at least 2 and the composition comprises
9 . The composition of claim 1 wherein the Q group comprises at least one of F, Cl, Br, and I.
10 . A composition comprising one or both of
and
wherein:
the R F group comprises at least four fluorine atoms;
the R 1 group comprises at least one carbon atom;
n is at least 1; and
the Q group comprises one or more atoms of the periodic table of elements.
11 . The composition of claim 10 wherein the R F group comprises at least two —CF 3 groups.
12 . The composition of claim 10 wherein the R 1 group consists of —CH 2 —.
13 . The composition of claim 10 wherein n is equal to 1 and the composition comprises
14 . The composition of claim 10 wherein the Q group comprises at least one halogen.
15 . A composition comprising:
R Cl (R T ) n H, wherein:
the R Cl group comprises at least —CCl 3 ;
the R T group comprises at least one C-2 group having at least one pendant —CF 3 group; and
n is at least 1.
16 . The composition of claim 15 wherein n is at least 2 and the composition comprises
17 . The composition of claim 15 wherein n is at least 2 and the composition comprises
18 . A telomerization process comprising exposing at least one CF 3 -comprising taxogen to a fluorine-comprising telogen to produce a telomer, wherein the fluorine-comprising telogen comprises at least four fluorine atoms.
19 . The process of claim 18 wherein the CF 3 -comprising taxogen is trifluoropropene.
20 . The process of claim 18 wherein the fluorine-comprising telogen is (CF 3 ) 2 CFl.
21 . The process of claim 18 wherein the exposing the CF 3 -comprising taxogen to the fluorine-comprising telogen is in the presence of an initiator.
22 . The process of claim 21 wherein the initiator comprises a peroxide.
23 . The process of claim 22 wherein the peroxide comprises di-tert-butyl peroxide.
24 . The process of claim 22 wherein the exposing occurs within a reactor and the initiator and telogen are provided to the reactor, a mole ratio of the initiator to the telogen being between about 0.001 and about 0.05.
25 . The process of claim 24 wherein the mole ratio of the initiator to the telogen is between about 0.01 and about 0.03.
26 . The process of claim 19 wherein the exposing occurs within a reactor, a temperature within the reactor during the exposing being from about 130° C. to about 150° C.
27 . The process of claim 18 wherein:
the CF 3 -comprising taxogen is trifluoropropene; and
the telomer comprises
wherein:
the R F group comprises at least four fluorine atoms;
n is at least 1; and
the Q group comprises one or more atoms of the periodic table of elements.
28 . The process of claim 18 wherein:
the CF 3 -comprising taxogen is trifluoropropene;
the fluorine-comprising telogen is (CF 3 ) 2 CFl; and
a mole ratio of the taxogen to the telogen is from about 2:1 to about 4:1.