Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
View Patent ↗Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. R F -compositions such as R F -intermediates, R F -surfactants, R F -monomers, R F -monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F -urethanes, and/or R F -foam stabilizers. The R F portion can include at least two —CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit. Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F -surfactants and/or R F -foam stabilizers are provided.
1. A surfactant composition comprising R F -Q S wherein:
R F comprises at least two —CF 3 groups and at least two hydrogens, and R F comprises at least one CH 2 group, and Q S is
2. The surfactant composition of claim 1 wherein R F comprises at least one (CF 3 ) 2 CF— group.
3. The surfactant composition of claim 1 wherein R F comprises at least three —CF 3 groups.
4. The surfactant composition of claim 1 wherein R F comprises at least two (CF 3 ) 2 CF— groups.
5. The surfactant composition of claim 1 wherein R F comprises at least four carbons and one of the four carbons comprises a —CH 2 — group.
6. The surfactant composition of claim 1 wherein R F -Q S is
7. The surfactant composition of claim 1 wherein R F -Q S is