Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. RF compositions such as R F -intermediates, R F -surfactants, R F -monomers, R F- monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F urethanes, and/or R F -foam stabilizers. The R F portion can include at least two —CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F -surfactants and/or R F -foam stabilizers are provided.
1 . An Aqueous Film Forming Foam formulation comprising R F -Q s , wherein:
R F has a greater affinity for a first part of a system having at least two parts than Q s ;
Q s has a greater affinity for a second part of the system than R F ; and
R F comprises at least two —CF 3 groups and at least two hydrogens.
2 . The formulation of claim 1 wherein R F is hydrophobic relative to Q s .
3 . The formulation of claim 1 wherein Q s is hydrophilic relative to R F .
4 . The formulation of claim 1 wherein R F is hydrophobic and Q s is hydrophilic.
5 . The formulation of claim 1 wherein R F comprises at least one —CH 2 — group.
6 . The formulation of claim 1 wherein R F comprises at least one cyclic group.
7 . The formulation of claim 6 wherein the cyclic group comprises an aromatic group.
8 . The formulation of claim 1 wherein R F comprises at least one (CF 3 ) 2 CF— group.
9 . The formulation of claim 1 wherein R F comprises at least three —CF 3 groups.
10 . The formulation of claim 1 wherein R F comprises at least two (CF 3 ) 2 CF— groups.
11 . The formulation of claim 1 wherein R F comprises at least four carbons and one of the four carbons comprises a —CH 2 — group.
12 . The formulation of claim 1 wherein R F -Q s is
13 . The formulation of claim 1 wherein R F -Q s is
14 . The formulation of claim 1 wherein R F -Q s is
15 . The formulation of claim 1 wherein R F -Q s is
16 . The formulation of claim 1 wherein R F -Q s is
17 . The formulation of claim 1 wherein R F -Q s is
18 . The formulation of claim 1 wherein R F -Q s is
19 . The formulation of claim 1 wherein R F -Q s is
20 . The formulation of claim 1 wherein R F -Q s is
21 . The formulation of claim 1 wherein R F -Q s is
22 . The formulation of claim 1 wherein R F -Q s is
23 . The formulation of claim 1 wherein R F -Q s is
24 . The formulation of claim 1 wherein R F -Q s is
25 . The formulation of claim 1 wherein R F -Q s is
26 . The formulation of claim 1 wherein R F -Q s is
27 . The formulation of claim 1 wherein R F -Q s is
28 . The formulation of claim 1 wherein R F -Q s is
29 . The formulation of claim 1 wherein R F -Q s is
30 . The formulation of claim 1 wherein R F -Q s is
31 . The formulation of claim 1 wherein R F -Q s is
32 . The formulation of claim 1 wherein R F -Q s is
33 . The formulation of claim 1 wherein R F -Q s is
34 . The formulation of claim 1 wherein R F -Q s is
35 - 70 . (canceled)
71 . A foam stabilizer comprising R F -Q FS , wherein R F is hydrophobic relative to Q FS , R F comprising at least two —CF 3 groups and at least two hydrogens.
72 . The stabilizer of claim 71 wherein R F comprises at least one —CH 2 — group.
73 . The stabilizer of claim 71 wherein R F comprises at least one cyclic group.
74 . The stabilizer of claim 73 wherein the cyclic group comprises an aromatic group.
75 . The stabilizer of claim 71 wherein R F comprises at least one (CF 3 ) 2 CF— group.
76 . The stabilizer of claim 71 wherein R F comprises at least three —CF 3 groups.
77 . The stabilizer of claim 71 wherein R F comprises at least two (CF 3 ) 2 CF— groups.
78 . The stabilizer of claim 71 wherein R F comprises at least four carbons and one of the four carbons comprises a —CH 2 — group.
79 . The stabilizer of claim 71 wherein R F -Q FS is
80 . The stabilizer of claim 71 wherein R F -Q FS is
81 . The stabilizer of claim 71 wherein R F -Q FS is
82 . The stabilizer of claim 71 wherein R F -Q FS is
83 . The stabilizer of claim 71 wherein R F -Q FS is
84 . The stabilizer of claim 71 wherein R F -Q FS is
85 . The stabilizer of claim 71 wherein R F -Q FS is
86 . The stabilizer of claim 71 wherein R F -Q FS is
87 . The stabilizer of claim 71 wherein R F -Q FS is
88 . The stabilizer of claim 71 wherein R F -Q FS is
89 . The stabilizer of claim 71 wherein R F -Q FS is
90 . The stabilizer of claim 71 wherein R F -Q FS is
91 . The stabilizer of claim 71 wherein R F -Q FS is
92 . The stabilizer of claim 71 wherein R F -Q FS is
93 . The stabilizer of claim 71 wherein R F -Q FS is
94 . The stabilizer of claim 71 wherein R F -Q FS is
95 . The stabilizer of claim 71 wherein R F -Q FS is
96 . The stabilizer of claim 71 wherein R F -Q FS is
wherein X comprises a halogen.