IP Library Granted Patent US 7,781,668
Granted Patent B2
US 7,781,668 · App. 10/588,708 · Granted Aug 24, 2010

Substrate for thin-film solar cell, method for producing the same, and thin-film solar cell employing it

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Quick Facts
Patent No.
US 7,781,668
App. No.
10/588,708
Granted
Aug 24, 2010
Kind
B2
Abstract

An inexpensive substrate for thin film solar cells having improved performance of a thin film solar cell, and a manufacturing method thereof are provided by increasing light trapping effect due to effective increase in unevenness of a substrate for thin film solar cells. Furthermore, a thin film solar cell having improved performance using the substrate is provided. A substrate for thin film solar cells of the present invention has a transparent insulating substrate and a transparent electrode layer deposited thereon including at least zinc oxide (ZnO), the transparent insulating substrate has a fine surface unevenness having a root-mean-square deviation of the surface (RMS) 5 to 50 nm in an interface by a side of the transparent electrode layer, a projected area thereof consists of a curved surface, and furthermore a haze ratio or a ratio of a diffuse transmittance to a total transmittance as an index of unevenness of a substrate may be set at not less than 20% measured using a C light source. And thereby light trapping effect may effectively occur to improve performance of the thin film solar cell.

Claims (12)

1. A substrate for thin film solar cells consisting of a transparent insulating substrate, and a transparent electrode layer including at least zinc oxide deposited on the transparent insulating substrate,

wherein the transparent insulating substrate has a fine surface unevenness having a root-mean-square deviation of the surface of 5 to 50 nm in an interface by a side of the transparent electrode layer, and

a projected area consists of a curved surface,

wherein the transparent insulating substrate consists of stacked layer of a transparent base material having a smooth surface, and a transparent foundation layer, and the transparent foundation layer comprises transparent micro-particles having an average particle diameter of not less than 10 nm and not more than 95 nm, and a transparent binder.

2. The substrate for thin film solar cells according to claim 1 , wherein the transparent electrode layer has a film thickness of not less than 1 micrometer.

3. The substrate for thin film solar cells according to claim 1 , wherein a haze ratio measured as a ratio of a diffuse transmittance to a total transmittance using a C light source is not less than 20%.

4. A thin film solar cell comprising the substrate for thin film solar cells according to claim 1 .

5. An integrated type thin film solar cell, comprising the substrate for thin film solar cells according to claim 1 , and at least one crystalline photoelectric conversion unit layer and a back face electrode layer deposited on the transparent electrode layer, wherein the layers are further isolated by a plurality of isolation grooves so as to form a plurality of photoelectric conversion cells, and the plurality of photoelectric conversion cells are mutually electrically connected in series via a plurality of connection grooves.

6. A method for manufacturing a substrate for thin film solar cells according to claim 1 , wherein the transparent electrode layer including at least zinc oxide are deposited at temperatures of the transparent insulating substrate of not less than 150 degrees C.

7. The substrate for thin film solar cells according to claim 1 , wherein the transparent foundation layer comprises transparent micro-particles having an average particle diameter of not more than 90 nm.

8. The substrate for thin film solar cells according to claim 1 , wherein the transparent foundation layer comprises transparent micro-particles having an average particle diameter of not more than 80 nm.

9. The substrate for thin film solar cells according to claim 1 , wherein the transparent foundation layer comprises transparent micro-particles having an average particle diameter of not more than 70 nm.

Assignments (1)
CHANGE OF ADDRESS Recorded Jan 15, 2014
From: KANEKA CORPORATION
To: KANEKA CORPORATION
Reel/Frame 032019/0901 →