Surface acoustic wave device

1. A surface acoustic wave device comprising a piezoelectric substrate and an IDT that is formed on said piezoelectric substrate and is made from Al or alloy including Al as a main component, an excited wave being an SH wave, wherein

said piezoelectric substrate is a rotation Y cut substrate made from a quartz flat substrate,

where a cut angle θ of said piezoelectric substrate is a rotation angle of a crystal Z-axis when piezoelectric substrate is rotated around a crystal X-axis,

a direction in which the piezoelectric substrate is rotated from a positive Z-axis side to a positive Y-axis side is a direction in which said cut angle θ is minus, and

the cut angle θ is set in a range of −64.0°<θ<−49.3°, and a propagation direction of a SAW is set to (90°±5°) to a crystal X-axis, and

when a wavelength of the SAW to be excited is represented as λ, an electrode film thickness H/λ standardized by a wavelength of said IDT is set to satisfy 0.04<H/λ<0.12.

2. The surface acoustic wave device according to claim 1 , wherein a relationship between the cut angle θ and the electrode film thickness H/λ satisfies −1.34082×10 −4 ×θ 3 −2.34969×10 −2 ×θ 2 −1.37506×θ−26.7895<H/λ<−1.02586×10 −4 ×θ 3 −1.73238×10 −2 ×θ 2 −0.977607×θ−18.3420.

3. The surface acoustic wave device according to claim 1 , wherein, when an electrode finger width of electrode fingers constituting said IDT/(electrode finger width+space between electrode fingers) is defined as a line metalization ratio mr, a relationship between the cut angle θ and a product H/λ×mr of the electrode film thickness and the line metalization ratio satisfies −8.04489×10 −5 ×θ 3 −1.40981×10 −2 ×θ 2 −0.825038×θ−16.0737<H/λ×mr<−6.15517×10 −5 ×θ 3 −1.03943×10 −2 θ 2 −0.586564×θ−11.0052.

4. A surface acoustic wave device comprising a piezoelectric substrate and an IDT that is formed on said piezoelectric substrate and is made from Al or alloy including Al as a main component, an excited wave being utilized as an SH wave, wherein

said piezoelectric substrate is a rotation Y cut substrate made from a quartz flat substrate,

where a cut angle θ of said piezoelectric substrate is a rotation angle of a crystal Z-axis when the piezoelectric substrate is rotated around a crystal X-axis,

a direction in which the piezoelectric substrate is rotated from a positive Z-axis side to a positive Y-axis side is a direction in which said cut angle δ is minus, and

the cut angle θ is set in a range of −61.4°<θ<−51.1°, and a propagation direction of a SAW is set to (90°±5°) to a crystal X-axis, and

when a wavelength of the SAW to be excited is represented as λ, an electrode film thickness H/λ standardized by a wavelength of the IDT is set to satisfy 0.05<H/λ<0.10.

5. The surface acoustic wave device according to claim 4 , wherein a relationship between the cut angle θ and the electrode film thickness H/λ satisfies −1.44605×10 −4 ×θ 3 −2.50690×10 −2 ×θ 2 −1.45086×θ−27.9464<H/λ<−9.87591×10 −5 ×θ 3 −1.70304×10 −2 ×θ 2 −0.981173×θ−18.7946.

6. The surface acoustic wave device according to claim 4 , wherein

when an electrode finger width of electrode fingers constituting said IDT/(electrode finger width+space between electrode fingers) is defined as a line metalization ratio mr, a relationship between the cut angle θ and a product K/λ×mr of the electrode film thickness and the line metalization ratio satisfies −8.67632×10 −5 ×θ 3 −1.50414×10 −2 ×θ 2 −0.870514×θ−16.7678<H/λ×mr<−5.92554×10 −5 ×θ 3 −1.02183×10 −2 ×θ 2 −0.588704×θ−11.2768.

7. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a one-port surface acoustic wave resonator where at least one IDT is disposed on said piezoelectric substrate.

8. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a two-port surface acoustic wave resonator where at least two IDTs are disposed along a propagation direction of a surface acoustic wave on said piezoelectric substrate.

9. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a lateral coupling type multi-mode filter where a plurality of surface acoustic wave resonators are disposed in proximity to each other in parallel with a propagation direction of a surface acoustic wave on said piezoelectric substrate.

10. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a vertical coupling type multi-mode filter where two-port surface acoustic wave resonators comprising a plurality of IDTs are disposed along a propagation direction of a surface acoustic wave on said piezoelectric substrate.

11. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a ladder type surface acoustic wave filter where a plurality of surface acoustic wave resonators are connected on said piezoelectric substrate in a ladder shape.

12. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a transversal SAW filter where a plurality of IDTs propagating a surface acoustic wave bidirectionally are disposed on said piezoelectric substrate at predetermined intervals.

13. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a transversal SAW filter where at least one IDT propagating a surface acoustic wave in one direction is disposed on said piezoelectric substrate.

14. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device is a surface acoustic wave sensor.

15. The surface acoustic wave device according to any one of claims 1 to 6 , wherein

said surface acoustic wave device has grating reflectors on both sides of an IDT.

16. A module device or an oscillation circuit using the surface acoustic wave device according to any one of claims 1 to 6 .