Interferometric stage metrology system
View Patent ↗Interferometric apparatus and methods by which the local surface characteristics of photolithographic mirrors or the like may be interferometrically measured in-situ to provide correction signals for enhanced distance and angular measurement accuracy. Surface characterizations along one or multiple datum lines in one or more directions may be made by measuring the angular changes in beams reflected off the surfaces during scanning operations to determine local slope and then integrating the slope to arrive at surface topology. The mirrors may be mounted either on the photolithographic stages or off the photolithographic stages on a reference frame.
1. Apparatus comprising:
an interferometery system including an interferometer configured to direct at least one beam to contact a mirror and measure a relative position of the mirror as it moves with respect to the interferometer, the one beam having a diameter d,
wherein the interferometry system stores information about a topography of the mirror along a region where the beam contacts the mirror and uses the topography information to correct the position measurement, and
wherein the topography information has a spatial resolution on the order of the beam diameter d.
2. The apparatus of claim 1 , wherein the interferometry system corrects the position measurement by using the topography information to compensate for errors in optical path length and in beam directions related to deformations in the mirror.
3. The apparatus of claim 1 , wherein the interferometer is a dynamic interferometer.
4. The apparatus of claim 1 , further comprising a movable stage, wherein the mirror is mechanically coupled to one side of the stage.
5. The apparatus of claim 4 , wherein the interferometry system further includes a second interferometer configured to direct at least one beam to a second mirror coupled to another side of the stage.
6. The apparatus of claim 1 , further comprising a movable stage, wherein the interferometer is mechanically coupled to the stage.
7. The apparatus of claim 6 , wherein the interferometry system further includes a second interferometer mechanically coupled to the stage, and wherein the second interferometer is configured to direct at least one beam to a second mirror having an orientation different from that of the first mirror.
8. A method comprising:
directing a beam to reflect from a mirror at each of a plurality of positions along a datum line on the mirror;
for each position, measuring a direction of the reflected beam;
for each position, independently determining an orientation of the mirror relative to a source for the beam; and
calculating a topography for the mirror along the datum line based on the direction of the reflected beam and the mirror orientation at each of the plurality of positions.
9. The method of claim 8 , further comprising:
mechanically coupling the mirror to a movable stage.
10. The method of claim 9 , wherein the mirror is mechanically coupled to the stage prior to directing the beam to reflect from the mirror.
11. The method of claim 8 , further comprising:
mechanically coupling the source for the beam to a movable stage.
12. The method of claim 11 , wherein the source for the beam is mechanically coupled to the stage prior to directing the beam to reflect from the mirror.
13. The method of claim 8 , wherein the source for the beam comprises a single-beam interferometer.
14. The method of claim 13 , wherein the single-beam interferometer is a dynamic interferometer.
15. The method of claim 8 , wherein independently determining the relative orientation of the mirror comprises interferometrically determining the relative orientation of the mirror.
16. The method of claim 15 , wherein the mirror is attached to one side of an object, and interferometrically determining the relative orientation of the mirror comprises using an interferometer to direct at least one other beam to contact a second mirror attached to another side of the object.
17. The method of claim 16 , wherein the at least one other beam contacts the second mirror at substantially the same location as the first-mentioned beam reflects from each of the plurality of positions along the datum line on the first-mentioned mirror.
18. The method of claim 8 , wherein the measuring of the direction of the reflected beam comprises interferometrically measuring the direction of the reflected beam.