IP Library › Granted Patent US 7,091,164
Granted Patent B2
US 7,091,164 · App. 10/617,510 · Granted Aug 15, 2006

Slurry for chemical mechanical polishing silicon dioxide

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Quick Facts
Patent No.
US 7,091,164
App. No.
10/617,510
Granted
Aug 15, 2006
Kind
B2
Abstract

A new slurry for shallow trench isolation (STI) processing in the chemical mechanical planarization (CMP) in microelectronic industry comprising an aqueous medium having an abrasive; and a compound which has a carboxylic group and an electrophilic functional group. The combination of ceria and/or titania with amino acids to obtain polishing selectivity's greater than 5:1. CMP is used for removing the excess oxide and planarizing the substrate and the trench. The silicon nitride acts as a stop layer, preventing the polishing of underlying silicon substrate.

Claims (15)

1. A slurry for use in removing silicon dioxide in preference to silicon nitride by chemical mechanical polishing in the shallow trench isolation process, the slurry comprising:

an aqueous medium having abrasive particles dispersed therein and

proline;

wherein the slurry has a pH within the range of from about 6 to about 11 and provides a silicon dioxide to silicon nitride removal rate selectivity of greater than 5:1.

2. The slurry according to claim 1 wherein the abrasive particles are selected from the group consisting of ceria and titania.

3. A slurry for use in removing silicon dioxide in preference to silicon nitride by chemical mechanical polishing in the shallow trench isolation process, the slurry comprising:

an aqueous medium having abrasive particles dispersed therein; and

glycine;

wherein the slurry has a pH within the range of from about 6 to about 11 and provides a silicon dioxide to silicon nitride removal rate selectivity of greater than 5:1.

4. The slurry according to claim 3 wherein the abrasive particles are selected from the group consisting of ceria and titania.

5. A slurry for use in removing silicon dioxide in preference to silicon nitride by chemical mechanical polishing in the shallow trench isolation process, the slurry comprising:

an aqueous medium having abrasive particles dispersed therein; and

alanine;

wherein the slurry has a pH within the range of from about 6 to about 11 and provides a silicon dioxide to silicon nitride removal rate selectivity of greater than 5:1.

6. The slurry according to claim 5 wherein the abrasive particles are selected from the group consisting of ceria and titania.

Assignments (17)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT R/F 041736/0178 Recorded Apr 21, 2022
From: PNC BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: FERRO CORPORATION
Reel/Frame 059747/0129 →
RELEASE OF SECURITY INTEREST Recorded Jan 24, 2020
From: BARCLAYS BANK PLC
To: EASTMAN KODAK COMPANY; FAR EAST DEVELOPMENT LTD.; FPC INC.; KODAK (NEAR EAST) INC.; KODAK AMERICAS LTD.; KODAK REALTY INC.; LASER PACIFIC MEDIA CORPORATION; QUALEX INC.; KODAK PHILIPPINES LTD.; NPEC INC.
Reel/Frame 052773/0001 →
RELEASE OF SECURITY INTEREST Recorded Jul 30, 2019
From: JP MORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: EASTMAN KODAK COMPANY; FAR EAST DEVELOPMENT LTD.; PFC, INC.; KODAK (NEAR EAST), INC.; KODAK AMERICAS, LTD.; KODAK IMAGING NETWORK, INC.; KODAK PORTUGUESA LIMITED; KODAK REALTY, INC.; LASER PACIFIC MEDIA CORPORATION; PAKON, INC.; QUALEX, INC.; KODAK PHILIPPINES, LTD.; NPEC, INC.; CREO MANUFACTURING AMERICA LLC; KODAK AVIATION LEASING LLC
Reel/Frame 049901/0001 →
RELEASE OF SECURITY INTEREST Recorded Jul 22, 2019
From: JP MORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: QUALEX, INC.; EASTMAN KODAK COMPANY; FAR EAST DEVELOPMENT LTD.; FPC, INC.; KODAK (NEAR EAST), INC.; KODAK AMERICAS, LTD.; KODAK IMAGING NETWORK, INC.; KODAK PORTUGUESA LIMITED; KODAK REALTY, INC.; LASER PACIFIC MEDIA CORPORATION; PAKON, INC.; KODAK PHILIPPINES, LTD.; NPEC, INC.; CREO MANUFACTURING AMERICA LLC; KODAK AVIATION LEASING LLC
Reel/Frame 050239/0001 →
SECURITY INTEREST Recorded Feb 16, 2017
From: FERRO CORPORATION
To: PNC BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 041736/0178 →
RELEASE OF SECURITY INTEREST Recorded Feb 15, 2017
From: PNC BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: FERRO CORPORATION
Reel/Frame 041718/0307 →
PATENT SECURITY AGREEMENT Recorded Aug 12, 2014
From: FERRO CORPORATION
To: PNC BANK, NATIONAL ASSOCIATION
Reel/Frame 033522/0966 →
RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL (RELEASES RF 022494/0945) Recorded Aug 12, 2014
From: PNC BANK, NATIONAL ASSOCIATION (AS SUCCESSOR-BY-MERGER TO NATIONAL CITY BANK)
To: FERRO CORPORATION
Reel/Frame 033522/0684 →
RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL (RELEASES RF 024906/0728) Recorded Aug 12, 2014
From: PNC BANK, NATIONAL ASSOCIATION (AS SUCCESSOR-BY-MERGER TO NATIONAL CITY BANK)
To: FERRO CORPORATION
Reel/Frame 033522/0875 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT (FIRST LIEN) Recorded Sep 5, 2013
From: EASTMAN KODAK COMPANY; FAR EAST DEVELOPMENT LTD.; FPC INC.; KODAK (NEAR EAST), INC.; KODAK IMAGING NETWORK, INC.; KODAK PORTUGUESA LIMITED; KODAK REALTY, INC.; LASER-PACIFIC MEDIA CORPORATION; PAKON, INC.; QUALEX INC.; KODAK PHILIPPINES, LTD.; NPEC INC.; CREO MANUFACTURING AMERICA LLC; KODAK AVIATION LEASING LLC; KODAK AMERICAS, LTD.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE
Reel/Frame 031158/0001 →
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Sep 5, 2013
From: CITICORP NORTH AMERICA, INC., AS SENIOR DIP AGENT; WILMINGTON TRUST, NATIONAL ASSOCIATION, AS JUNIOR DIP AGENT
To: EASTMAN KODAK COMPANY; PAKON, INC.
Reel/Frame 031157/0451 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT (SECOND LIEN) Recorded Sep 5, 2013
From: EASTMAN KODAK COMPANY; FAR EAST DEVELOPMENT LTD.; FPC INC.; KODAK (NEAR EAST), INC.; KODAK AMERICAS, LTD.; KODAK IMAGING NETWORK, INC.; KODAK PORTUGUESA LIMITED; KODAK REALTY, INC.; LASER-PACIFIC MEDIA CORPORATION; PAKON, INC.; QUALEX INC.; KODAK PHILIPPINES, LTD.; NPEC INC.; CREO MANUFACTURING AMERICA LLC; KODAK AVIATION LEASING LLC
To: BARCLAYS BANK PLC, AS ADMINISTRATIVE AGENT
Reel/Frame 031159/0001 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT (ABL) Recorded Sep 5, 2013
From: EASTMAN KODAK COMPANY; FAR EAST DEVELOPMENT LTD.; FPC INC.; KODAK (NEAR EAST), INC.; KODAK AMERICAS, LTD.; KODAK IMAGING NETWORK, INC.; KODAK PORTUGUESA LIMITED; KODAK REALTY, INC.; LASER-PACIFIC MEDIA CORPORATION; PAKON, INC.; QUALEX INC.; KODAK PHILIPPINES, LTD.; NPEC INC.; CREO MANUFACTURING AMERICA LLC; KODAK AVIATION LEASING LLC
To: BANK OF AMERICA N.A., AS AGENT
Reel/Frame 031162/0117 →
PATENT SECURITY AGREEMENT Recorded Apr 1, 2013
From: EASTMAN KODAK COMPANY; PAKON, INC.
To: WILMINGTON TRUST, NATIONAL ASSOCIATION, AS AGENT
Reel/Frame 030122/0235 →
SECURITY INTEREST Recorded Feb 21, 2012
From: EASTMAN KODAK COMPANY; PAKON, INC.
To: CITICORP NORTH AMERICA, INC., AS AGENT
Reel/Frame 028201/0420 →
AMENDED AND RESTATED PATENT SECURITY AGREEMENT Recorded Aug 30, 2010
From: FERRO CORPORATION
To: PNC BANK NATIONAL ASSOCIATION (AS SUCCESSOR-BY-MERGER TO NATIONAL CITY BANK)
Reel/Frame 024906/0728 →
AFTER-ACQUIRED INTELLECTUAL PROPERTY SECURITY AGREEMENT (FIRST SUPPLEMENTAL FILING) Recorded Apr 2, 2009
From: FERRO CORPORATION
To: NATIONAL CITY BANK, AS COLLATERAL AGENT
Reel/Frame 022494/0945 →