Gas discharge panel substrate assembly having protective layer in contact with discharge space, and AC type gas discharge panel having the assembly
View Patent ↗The present invention provides that a gas discharge panel substrate assembly comprising: electrodes formed on a substrate, a dielectric layer covering the electrodes, and a protective layer covering the dielectric layer and in contact with a discharge space, wherein the protective layer includes MgO and at least one compound selected from the group consisting of an Al compound, a Ti compound, a Y compound, a Zn compound, a Zr compound, a Ta compound and SiC.
1. A gas discharge panel substrate assembly comprising:
electrodes formed on a substrate,
a dielectric layer covering the electrodes, and
a protective layer covering the dielectric layer and in contact with a discharge space, wherein
the protective layer includes MgO and at least one compound selected from the group consisting of an Al compound, a Y compound, a Ti compound, a Zn compound, a Zr compound, a Ta compound and SiC, and has an ultraviolet shielding function, and
the dielectric layer is a SiO 2 film, having bonds of hydrogen with silicon as a residual in the film, of a thickness in a range of 5 to 15 μm.
2. A gas discharge panel substrate assembly of claim 1 , wherein the protective layer comprises a layer which shields the dielectric layer of the SiO 2 film from light having a wavelength of 200 nm or less generated by a discharge in the discharge space.
3. A gas discharge panel substrate assembly of claim 1 , wherein said at least one compound is a compound having a bandgap of 6.2 eV.
4. A gas discharge panel substrate assembly of claim 1 , wherein the dielectric layer contains a hydrocarbon bond therein.
5. A gas discharge panel substrate assembly comprising:
electrodes formed on a substrate,
a dielectric layer formed on the substrate so as to cover the electrodes and made of a SiO 2 film, having bonds of hydrogen with silicon as a residual in the film, of a thickness in a range of 5 to 15 μm,
an ultraviolet shielding layer formed on the dielectric layer and made of a compound having an ultraviolet shielding function to shield the dielectric layer from ultraviolet light generated by a discharge in a discharge space of the assembly, the compound being selected from the group consisting of an Al compound, a Y compound, a Ti compound, a Zn compound, a Zr compound, a Ta compound and SiC, and
a protective layer formed on the ultraviolet shielding layer and made of MgO.
6. A gas discharge panel substrate assembly of claim 5 , wherein the ultraviolet shielding layer shields the dielectric layer from ultraviolet light having a wavelength of 200 nm or less.
7. A gas discharge panel substrate assembly of claim 5 , wherein the dielectric layer contains a hydrocarbon bond therein.
8. An AC type gas discharge panel comprising:
a front substrate having display electrodes;
a dielectric layer covering the display electrodes, the dielectric layer having a thickness in a range of 5 to 15 μm, and being a SiO 2 film having bonds of hydrogen with silicon as a residual therein;
a back substrate having a phosphor;
a discharge space between the front substrate and the back substrate and having a discharge gas sealed therein; and
an ultraviolet shielding layer formed on the SiO 2 film and containing a compound which shields the SiO 2 film from ultraviolet light generated by a discharge in the discharge space and is selected from the group consisting of an Al compound, a Y compound, a Ti compound, a Zn compound, a Zr compound, a Ta compound and SiC.
9. An AC type gas discharge panel comprising:
a front substrate having display electrodes;
a dielectric layer covering the display electrodes, having a thickness in a range of 5 to 15 μm, and being a SiO 2 film having bonds of hydrogen with silicon as a residual therein;
a back substrate having a phosphor;
a discharge space between the front substrate and the back substrate and having a discharge gas sealed therein;
a protective layer covering a surface of the dielectric layer facing the discharge space and made of MgO; and
an ultraviolet shielding layer formed between the SiO 2 film and the protective layer,
wherein the ultraviolet shielding layer shields the dielectric layer from ultraviolet light generated by a discharge in the discharge space and contains a compound selected from the group consisting of an Al compound, a Y compound, a Zn compound, a Zr compound, a Ta compound and SiC.
10. A gas discharge panel substrate assembly comprising:
electrodes formed on a glass substrate;
a dielectric layer made of a sheet frit glass formed on the substrate by baking, being a SiO 2 film containing bonds of hydrogen with silicon as a residual therein, and having a thickness in a range of5to 15 μm;
an intermediate layer formed on the dielectric layer and shielding the dielectric layer from vacuum ultraviolet light generated by a discharge in a discharge space of the assembly, the intermediate layer being made of at least one compound selected from the group consisting of an Al compound, a Y compound, a Ti compound, a Zn compound, a Zr compound, a Ta compound and SiC; and
a protective layer covering the intermediate layer and made of MgO.
11. A gas discharge panel substrate assembly of claim 10 , wherein the intermediate layer is a ZrO 2 layer.