Surface emitting semiconductor laser

1. A surface emitting semiconductor laser comprising:

a substrate;

a first mirror formed over the substrate, the first mirror including semiconductor layers of first conductivity type;

a second mirror formed over the substrate, the second mirror including semiconductor layers of a second conductivity type;

an active region disposed between the first and second mirrors;

a current confining layer disposed between the first and second mirrors;

a compound semiconductor layer formed over the second mirror;

an electrode formed on the compound semiconductor layer; and

a protective film that covers the compound semiconductor layer and partially covers the electrode,

wherein the electrode formed by a lift-off process utilizes an opening-pattern which is formed by plasma ashing, and surface roughness of the compound semiconductor layer after formation of the electrode is not more than 5 nm.

2. The surface emitting semiconductor laser as claimed in claim 1 , wherein the compound semiconductor layer includes a GaAs layer of the second conductivity type, and the second mirror underlying the GaAs layer includes an AlGaAs layer.

3. The surface emitting semiconductor laser as claimed in claim 1 , wherein the electrode is formed in a ring-shaped pattern on the compound semiconductor layer and wherein an inner diameter of the ring-shaped pattern defines an emission window for laser light.

4. The surface emitting semiconductor laser as claimed in claim 3 , wherein the protective film covers the emission window.

5. The surface emitting semiconductor laser as claimed in claim 1 , wherein the electrode is defined through the steps of:

forming a first organic layer on the compound semiconductor layer;

forming a second layer on the first organic layer, the second layer being resistant to plasma ashing;

forming a pattern including a first aperture in the second layer;

forming a second aperture in the first organic layer by plasma ashing of the first organic layer using a mask pattern including the first aperture to expose the compound semiconductor layer in the second aperture; and

depositing a conductive layer over a region including the compound semiconductor layer exposed in the second aperture and the second layer;

wherein forming the pattern in the second layer includes a lift-off process, and surface roughness of the compound semiconductor layer after formation of the electrode is not more than 5 nm.

6. The surface emitting semiconductor laser as claimed in claim 1 , further comprising an insulation film, wherein the compound semiconductor layer is totally covered with the electrode, the protective film and the insulation film.