Methods and apparatus for fabricating solar cells
In one embodiment, a solar cell is fabricated using an ink pattern as a mask for a processing step. The ink pattern may comprise an ink that is substantially devoid of particles that may scratch a surface on which the ink pattern is formed. The ink pattern may be formed by screen printing. In one embodiment, the ink pattern is formed on an oxide layer and comprises an ink that is substantially free of silicon dioxide particles. The ink pattern may be employed as an etching or deposition mask, for example.
1 . A method of fabricating a solar cell, the method comprising:
forming an ink pattern on a first layer, the ink pattern comprising an ink that is substantially devoid of particles that can scratch a surface of the first layer; and
etching the first layer using the ink pattern as a mask.
2 . The method of claim 1 wherein the ink is substantially devoid of silicon dioxide.
3 . The method of claim 2 wherein the first layer comprises an oxide layer.
4 . The method of claim 1 wherein the ink pattern is formed by screen printing.
5 . The method of claim 1 wherein the etching of the first layer exposes a silicon material.
6 . The method of claim 1 wherein the solar cell is a backside-contact solar cell.
7 . The method of claim 1 further comprising:
removing the ink pattern off the first layer; and
performing an etch of a silicon material.
8 . The method of claim 7 wherein the first layer comprises an oxide layer and the ink is substantially devoid of silicon dioxide.
9 . A method of fabricating a solar cell, the method comprising:
forming an oxide layer over a silicon material;
screen printing an ink pattern over the oxide layer, the ink pattern comprising an ink that is substantially free of particles that can scratch a surface of the oxide layer; and
etching portions of the oxide layer not covered by the ink pattern.
10 . The method of claim 9 wherein the ink is substantially free of silicon dioxide particles.
11 . The method of claim 9 wherein the oxide layer comprises thermally grown oxide.
12 . The method of claim 9 further comprising:
removing the ink pattern; and
etching portions of a silicon layer exposed by the etching of the oxide layer.
13 . The method of claim 9 wherein the solar cell is a backside-contact solar cell.
14 . A method of manufacturing a solar cell, the method comprising:
printing an ink pattern over a first layer, the ink pattern comprising an ink that is substantially devoid of particles that can scratch a surface of the first layer; and
etching portions of the first layer not covered by the ink pattern.
15 . The method of claim 14 wherein the ink is substantially devoid of silicon dioxide particles.
16 . The method of claim 14 wherein the first layer comprises an oxide layer.
17 . The method of claim 14 further comprising:
stripping off the ink pattern; and
etching a silicon material.
18 . The method of claim 14 wherein the printing of the ink pattern is by screen printing.
19 . The method of claim 14 wherein the first layer comprises an oxide layer and the etching of the first layer exposes a silicon material.
20 . The method of claim 14 wherein the solar cell is a backside-contact solar cell.
21 . A method of forming a protective coating over a solar cell material, the method comprising:
forming an ink pattern on a layer of a solar cell, the ink pattern comprising an ink that is substantially devoid of particles that can scratch a surface of the layer; and
performing a processing step on the solar cell using the ink pattern as a mask.
22 . The method of claim 21 wherein the processing step comprises etching of a material of the solar cell.
23 . The method of claim 21 wherein the processing step comprises deposition of a material on the solar cell.
24 . The method of claim 21 wherein the layer comprises an oxide layer.
25 . The method of claim 21 wherein the ink pattern is formed by screen printing.