Method for measuring gap between mask and substrate of display panel
View Patent ↗A method of measuring a gap between a mask and a substrate by providing a mask and a substrate facing each other. The mask includes an array of patterns, and a at least one window disposed between two of the patterns. Each of the patterns corresponds to a display device. The method also includes projecting an incident laser beam onto the substrate through the window of the mask and determining a gap between the mask and the substrate in a middle region of the substrate in response to first and second reflected beams. The first reflected beam is generated by the reflection of the incident laser beam by the mask, and the second reflected beam is generated by the reflection of the incident laser beam by the substrate. Determining the gap between the mask and the substrate in the middle region allows for the correction of any undesirable deflection of the mask.
1. A method comprising:
providing a mask which includes:
an array of patterns, each of which corresponds to a display device,
a window disposed between neighboring two of said patterns,
placing a substrate to face said mask;
projecting an incident laser beam onto said substrate through said window of said mask; and
determining a gap between said mask and said substrate in a middle region of said substrate in response to first and second reflected beams, said first reflected beam being generated by said incident laser beam reflected by said mask, and said second reflected beam being generated by said incident laser beam being reflected by said substrate.
2. The method according to claim 1 , further comprising:
determining a deflection of said mask based on said determined gap in said middle region.
3. The method according to claim 1 , wherein said mask further includes other windows disposed around said array of said patterns, and
wherein said method further comprises:
projecting other incident laser beams onto said substrate through said other windows;
determining gaps between said mask and said substrate near corners of said substrate in response to third and fourth laser beams, said third laser beams being generated by said other incident laser beams being reflected by said mask, and said fourth laser beams being generated by said other incident laser beams being reflected by said substrate, and
determining a deflection of said mask based on said determined gap in said middle region and said gaps near said corners.
4. The method according to claim 1 , wherein said patterns are arranged in a row.
5. The method according to claim 1 , wherein said patterns are arranged in rows and columns.
6. The method according to claim 1 , wherein said substrate is covered with a photo resist, a portion of a main surface of said substrate being exposed, and
said second reflected laser beam is generated by said incident laser beam being reflected by said exposed portion.
7. An proximity exposure method comprising:
providing a mask which includes:
an array of patterns, each of which respectively corresponds to a display device,
a window disposed between neighboring two of said patterns,
placing a substrate on a substrate stage opposed to said mask;
projecting an incident laser beam onto said substrate through said window of said mask; and
determining a gap between said mask and said substrate in a middle region of said substrate in response to first and second reflected beams, said first reflected beam being generated by said incident laser beam reflected by said mask, and said second reflected beam being generated by said incident laser beam being reflected by said substrate; and
removing a deflection of said mask in response to said determined gap in said middle region.
8. The method according to claim 7 , further comprising:
projecting other incident laser beams onto said substrate through said other windows;
determining gaps between said mask and said substrate near corners of said substrate in response to third and fourth laser beams, said third laser beams being generated by said other incident laser beams being reflected by said mask, and said fourth laser beams being generated by said other incident laser beams being reflected by said substrate, and
determining said deflection of said mask based on said determined gap in said middle region and said gaps near said corners.
9. The method according to claim 7 , wherein said removing includes:
securing said mask and a glass plate to form a sealed space between said mask and said glass plate; and
inflating or evacuating said sealed space in response to said determined deflection.
10. The method according to claim 7 , wherein said determining said gap in said middle region is executed every time said substrate is exchanged.
11. The method according to claim 7 , wherein said determining said gap in said middle region is executed every time said mask is exchanged.