Liquid crystal display having a drain electrode with a plurality of protrusions and a fabrication method thereof
View Patent ↗A method of fabricating a liquid crystal display device includes the steps of forming a gate electrode on a transparent substrate; forming a gate insulating film, an active layer and an ohmic contact layer on the transparent substrate to cover the gate electrode; forming a source electrode and a drain electrode on the ohmic contact layer and patterning the drain electrode to form an L-shaped portion and a plurality of protrusions; forming a protective layer on the source and drain electrodes such that side surfaces of the protective layer, the drain electrode, the ohmic contact layer and the active layer are exposed; and forming a pixel electrode on the protective layer to electrically contact the side surface of the drain electrode.
1. A method of fabricating a liquid crystal display device, comprising the steps of:
forming a gate electrode on a transparent substrate;
forming a gate insulating film, an active layer and an ohmic contact layer on the transparent substrate to cover the gate electrode;
forming a source electrode and a drain electrode on the ohmic contact layer and patterning the drain electrode to form an L-shaped portion and a plurality of protrusions;
forming a protective layer on the source and drain electrodes such that side surfaces of the protective layer, the drain electrode, the ohmic contact layer and the active layer are exposed; and
forming a pixel electrode on the protective layer to electrically contact the side surface of the drain electrode.
2. The method of fabricating a liquid crystal display device according to claim 1 , wherein the source electrode is U-shaped.
3. The method of fabricating a liquid crystal display device according to claim 1 , wherein the source electrode surrounds a portion of the drain electrode at three sides.
4. The method of fabricating a liquid crystal display device according to claim 1 , wherein the plurality of protrusions overlap the pixel electrode.
5. The method of fabricating a liquid crystal display device according to claim 1 , wherein the pixel electrode is disposed on the gate insulating film.
6. The method of fabricating a liquid crystal display device according to claim 1 , wherein the pixel electrode electrically contacts side surfaces of the ohmic contact layer and the active layer.
7. The method of fabricating a liquid crystal display device according to claim 6 , wherein the electrical contacts of the pixel electrode with the side surfaces of the drain electrode, ohmic contact layer, and active layer are along a plane.
8. The method of fabricating a liquid crystal display device according to claim 1 , wherein the ohmic contact layer includes one of amorphous silicon and polycrystalline silicon.
9. The method of fabricating a liquid crystal display device according to claim 1 , wherein the pixel electrode includes one of indium-tin-oxide (ITO), tin-oxide (TO), indium-zinc-oxide (ITO), and indium-tin-zinc-oxide (ITZO).
10. The method of fabricating a liquid crystal display device according to claim 1 , wherein the protective layer covers side surfaces of the source electrode and the drain electrode.