IP Library Granted Patent US 7,622,862
Granted Patent B2
US 7,622,862 · App. 10/640,670 · Granted Nov 24, 2009

Light-emitting device with water-and/or oxygen-absorbing layer and its production

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Quick Facts
Patent No.
US 7,622,862
App. No.
10/640,670
Granted
Nov 24, 2009
Kind
B2
Abstract

A light-emitting device comprises a laminate structure having an anode substrate, an anode, at least one organic layer comprising a light-emitting layer, a cathode and a cathode substrate in this order, wherein a water- and/or oxygen-absorbing layer is located between the cathode substrate and the cathode.

Claims (10)

1. A light-emitting device comprising in order an anode substrate, an anode, at least one organic layer comprising a light-emitting layer and further comprising at least one polymer, a cathode, at least one water- and oxygen-absorbing layer having a thickness in the range 10 nm to 1 μm and consisting essentially of a reducing metal oxide, and a cathode substrate, wherein said water- and oxygen-absorbing layer is formed directly adjacent to said cathode, wherein the reducing metal oxide is an oxide in which an atom bonded to oxygen has a smaller oxidation number than its valency.

2. The light-emitting device of claim 1 , wherein the reducing metal oxide is at least one selected from the group consisting of SiO, GeO, SnO, FeO, MnO and WO.

3. The light-emitting device of claim 2 , wherein the reducing metal oxide is at least one selected from the group consisting of SiO, GeO, SnO and FeO.

4. The light-emitting device of claim 1 , wherein at least one water- and oxygen-absorbing layer has a thickness in the range 50 nm to 500 nm.

5. The light-emitting device of claim 1 , wherein at least one water- and oxygen-absorbing layer is composed of a plurality of layers.

6. The light-emitting device of claim 1 , wherein said at least one water- and oxygen-absorbing layer is formed by a vapor deposition method or a sputtering method.

7. The light-emitting device of claim 1 , wherein said at least one water- and oxygen-absorbing layer comprises a single layer of silicon oxide having a thickness of 0.1 μm.

8. The light-emitting device of claim 7 , wherein said cathode is a 0.2-μm-thick layer of aluminum deposited directly on said silicon oxide layer.

9. A light-emitting device comprising in order an anode substrate, an anode, at least one organic layer comprising a light-emitting layer and further comprising at least one polymer, a cathode, at least one water- and oxygen-absorbing layer consisting of a reducing metal oxide and having a thickness in the range 10 nm to 1 μm, and a cathode substrate, wherein said water- and oxygen-absorbing layer is formed directly adjacent to said cathode, wherein the reducing metal oxide is an oxide in which an atom bonded to oxygen has a smaller oxidation number than its valency.

10. A light-emitting device comprising in order an anode substrate, an anode, at least one organic layer comprising a light-emitting layer and further comprising at least one polymer, a cathode, at least one water- and oxygen-absorbing layer comprising a reducing metal oxide and having a thickness in the range 10 nm to 1 μm, and a cathode substrate, wherein said water- and oxygen-absorbing layer is formed directly adjacent to said cathode, wherein the reducing metal oxide is an oxide in which an atom bonded to oxygen has a smaller oxidation number than its valency.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2012
From: FUJIFILM CORPORATION
To: UDC IRELAND LIMITED
Reel/Frame 028889/0636 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 26, 2007
From: FUJIFILM HOLDINGS CORPORATION
To: FUJIFILM CORPORATION
Reel/Frame 018934/0001 →
CHANGE OF NAME Recorded Feb 15, 2007
From: FUJI PHOTO FILM CO., LTD.
To: FUJIFILM HOLDINGS CORPORATION
Reel/Frame 018898/0872 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 14, 2003
From: MISHIMA, MASAYUKI
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 014401/0527 →