IP Library Granted Patent US 7,427,341
Granted Patent B2
US 7,427,341 · App. 10/642,352 · Granted Sep 23, 2008

System for synthesis of electrode array

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Quick Facts
Patent No.
US 7,427,341
App. No.
10/642,352
Granted
Sep 23, 2008
Kind
B2
Abstract

Systems and methods for preparing electrocatalysts are disclosed. The system includes a high temperature synthesis device for preparing an array of electrocatalysts as electrolytic surfaces of working electrodes. At least a portion of the electrolytic surfaces are defined by different materials. The device includes a plurality of openings for receiving the array of working electrodes and a mask having a plurality of openings configured for exposing at least a portion of each of the working electrodes for forming the electrolytic surfaces thereon.

Claims (33)

1. A system for preparing electrochemical materials, the system comprising a high temperature synthesis device for preparing an array of electrochemical materials as electrolytic surfaces of working electrodes, at least a portion of the electrolytic surfaces being defined by different materials, the device comprising:

a holder block having a plurality of openings for receiving the array of working electrodes; and

a mask having a plurality of openings configured for exposing only a portion of an end surface of each of the working electrodes for forming the electrolytic surfaces on said exposed portions of the end surfaces of the working electrodes, wherein the mask comprises a plate attached to a front surface of the holder block.

2. The system of claim 1 wherein the device is configured for processing of the electrolytic surfaces at a temperature of at least 300° C.

3. The system of claim 1 wherein the device is configured for processing of the electrolytic surfaces at a temperature of at least 1000° C.

4. The system of claim 1 wherein the system is configured for detachment of the working electrodes from the device after formation of the electrolytic surfaces on the working electrodes for subsequent testing.

5. The system of claim 1 wherein the device is configured for receiving an array of sixteen working electrodes.

6. The system of claim 1 wherein the device is configured for receiving an array of rotating disk electrodes.

7. The system of claim 6 wherein each of the rotating disk electrodes comprises an electrically insulating body and an electrically conductive insert supported by the body.

8. The system of claim 7 wherein the mask is configured to cover each of the bodies and said plurality of openings in the mask are configured to expose an end surface of each of the inserts.

9. The system of claim 1 wherein the holder block is generally cylindrical in shape.

10. The system of claim 1 wherein the holder block is formed from stainless steel.

11. The system of claim 1 wherein the holder block is formed from a polymer material.

12. The system of claim 1 wherein the device further comprises a back plate for retaining the working electrodes within the device.

13. The system of claim 12 wherein the back plate comprises a plurality of openings for providing access to the working electrodes.

14. The system of claim 1 further comprising an electrochemical cell comprising a cavity for containing a liquidus electrolyte and sized for receiving at least a portion of the array of working electrodes installed in the device.

15. The system of claim 14 further comprising an electrical connection created at each of the working electrodes for connection to an electrical source.

16. The system of claim 1 wherein said plurality of openings in the mask are tapered.

17. The system of claim 16 wherein an angle of each of the tapered openings is between 90 degrees and 120 degrees.

18. The system of claim 16 wherein an angle of each of the tapered openings is greater than 120 degrees.

19. The system of claim 16 wherein an angle of each of the tapered openings is less than 90 degrees.

20. The system of claim 1 wherein the mask is formed from stainless steel.

21. The system of claim 1 wherein the mask is formed for a ceramic material.

22. The system of claim 1 wherein the mask is formed from silicon.

23. The system of claim 22 wherein said plurality of openings in the mask are tapered and an angle of each of the tapered openings is about 70.529 degrees.

24. The system of claim 22 wherein said plurality of openings in the mask are tapered and each of the tapered openings is generally rectangular in shape.

25. The system of claim 1 wherein the mask is formed from Teflon.

26. The system of claim 1 wherein the electrochemical materials are electrocatalysts.

27. A system for preparing electrochemical material, the system comprising a high temperature synthesis device for preparing an array of electrolytic surfaces of working electrodes each comprising a body and an insert supported by the body, the electrolytic surfaces being formed by electroplating, the device comprising a holder block having a plurality of openings formed therein for receiving the array of working electrodes positioned such that a portion of the insert is exposed for forming the electrolytic surface thereon without exposing an end surface of the body located adjacent to said exposed portion of the insert, wherein an end portion of the holder block comprises an array of openings each having a diameter smaller than said plurality of openings in the holder block to expose a portion of the insert without exposing said end surface of the body.

28. The system of claim 27 wherein the device comprises a high-temperature material allowing for preparation or processing of the electrolytic surface at a temperature of at least 300° C.

29. The system of claim 27 wherein the system is configured for detachment of the working electrode from the device after formation of the electrolytic surfaces on the working electrodes for subsequent testing.

30. The system of claim 27 wherein the holder block is configured for receiving an array of rotating disk electrodes.

31. The system of claim 27 wherein said end portion of the holder block comprises a mask and wherein said plurality of openings extend longitudinally from one end of the holder block to the mask.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2010
From: SYMYX SOLUTIONS, INC.
To: FREESLATE, INC.
Reel/Frame 024057/0911 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2009
From: SYMYX TECHNOLOGIES, INC.
To: SYMYX SOLUTIONS, INC.
Reel/Frame 022939/0564 →
SECURITY AGREEMENT Recorded Oct 9, 2008
From: EVERCOM SYSTEMS, INC.
To: WELLS FARGO FOOTHILL, LLC
Reel/Frame 021651/0094 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2004
From: WANG, YOUQI; DEVENNEY, MARTIN; HE, TING
To: SYMYX TECHNOLOGIES, INC.; HONDA R & D AMERICAS, INC.
Reel/Frame 015624/0521 →