Method and system for providing beam polarization
View Patent ↗A radiation polarizer, controller, and a method of radiation polarization and beam control, are disclosed. The radiation polarizer includes a substrate, at least one anti-reflection coating layer communicatively coupled to the substrate, at least two nanostructures communicatively coupled to the at least one anti-reflection coating layer, and at least two groove layers, wherein each one of the at least two groove layers is interstitial to a respective one of the at least two nanostructures. The method may include the steps of communicatively coupling at least one anti-reflection coating layer to a substrate, communicatively coupling at least two nanostructures to at least one of the at least one anti-reflection coating layer, providing interstitially to a respective one of the at least two nanostructures at least two groove layers, coupling the at least two groove layers and the at least two nanostructures to provide a pass wavelength in the range of about 250 nm to less than about a microwave wavelength, and allowing for examining of radiation having a wavelength in a range of about 250 nm to less than about a microwave wavelength, and having an electric field orthogonal to the at least two groove layers, by allowing for a passing of the radiation through said coupling of the at least two groove layers and the at least two nanostructures.
1. A radiation polarizer for maximizing a transmission of a first polarization state while minimizing a reflection of the first polarization state, and for minimizing a transmission for an orthogonal second polarization state while maximizing a reflection of the second polarization state, said polarizer comprising:
a substrate;
at least one anti-reflection coating layer communicatively coupled to said substrate; and
at least two nanostructures communicatively coupled to said at least one anti-reflection coating layer thereby forming a layer of nanostructures;
said at least two nanostructures each including a metallic and dielectric combination, said metallic and dielectric of said combination being located adjacent each other, said metallic having a short surface and a long surface, said dielectric extending only partially along said long surface of said metallic;
wherein said nanostructure layer polarises the radiation, and wherein the radiation has a wavelength in a range of about 250 nm to less than 30 microns.
2. The radiation polarizer of claim 1 , further comprising at least one protective layer formed atop said at least one substrate, said at least one anti-reflective coating, and said layer of nanostructures.
3. The radiation polarizer of claim 1 , further comprising at least one protective layer formed beneath said at least one substrate, said at least one anti-reflective coating, and said layer of nanostructures.
4. The radiation polarizer of claim 1 , wherein each of said nanostructures of said layer of nanostructures includes a dielectric having a lower conductivity than said metallic of said nanostructures.
5. The radiation polarizer of claim 1 , wherein the dielectric is partially composed of a non-air dielectric.
6. The radiation polarizer of claim 1 , wherein each of the nanostructures comprises at least one selected from the group consisting of a plurality of gratings, a plurality of pillars, and a plurality of rising shapes.
7. The radiation polarizer of claim 6 , wherein each of said nanostructures may be substantially parallel to each other of said nanostructures.
8. The radiation polarizer of claim 1 , further comprising at least one etch stop layer that separates at least one of said at least two nanostructures from said substrate.
9. The radiation polarizer of claim 1 , wherein a first of said nanostructures is separated from a second of said nanostructures by at least one selected from the group consisting of air, vacuum and dielectric material.
10. The radiation polarizer of claim 1 , wherein each metallic of each nanostructure comprises a height in a range of about 50 nm to about 250 nm.
11. The radiation polarizer of claim 1 , wherein each metallic of each nanostructure comprises a width of about 30 nm.
12. The radiation polarizer of claim 1 , wherein said nanostructures comprise a transmissivity of greater than about 97%, and an extinction ratio of greater than about 40 dB.
13. The radiation polarizer of claim 1 , wherein said nanostructures comprise 180° of effective polarization separation in a space of less than about 0.2 mm.
14. The radiation polarizer of claim 1 , wherein said nanostructures comprise an acceptance angle of up to about +/−20°.
15. The radiation polarizer of claim 1 , wherein each nanostructure of said layer of nanostructures comprises at least one selected from the group consisting of a rectangle, a trapezoid, a semicircle, an oval, a convex hull, a stepped set, and a pillar.
16. The radiation polarizer of claim 1 , further comprising a multilayer anti-reflective coating communicatively coupled to at least one of said at least two nanostructures.
17. A method for providing at least one of radiation polarizer and beam control, comprising:
communicatively coupling at least one anti-reflection coating layer to a substrate;
communicatively coupling at least two nanostructures to at least one of the at least one anti-reflection coating layer thereby forming a nanostructure layer, said at least two nanostructures each including a metallic and dielectric combination, said metallic and dielectric of said combination being located adjacent each other, said metallic having a short surface and a long surface, said dielectric extending only partially along said long surface of said metallic;
coupling the at least two nanostructures of said nanostructure layer to provide a pass wavelength in the range of about 250 nm to 30 microns; and
allowing for an examining of radiation having a wavelength in a range of about 250 nm to less than about a microwave wavelength, by allowing for a passing of the radiation through said nanostructure layer and by allowing for a reflecting of the radiation from said coupling of said nanostructure layer.
18. The method of claim 17 , further comprising providing at least one protective layer atop the at least one anti-reflective coating, and the nanostructure layer.
19. The method of claim 17 , further comprising providing at least one protective layer beneath the at least one anti-reflective coating, and the nanostructure layer.
20. The method of claim 17 , further comprising orienting each of the nanostructures substantially parallel to each other of the nanostructures.
21. The method of claim 17 , further comprising separating at least one of the at least two nanostructures from the substrate by at least one etch stop layer.
22. The method of claim 17 , further comprising separating a first of the nanostructures from a second of said nanostructures by at least one selected from the group consisting of at least one spacer air, vacuum, and a dielectric material.
23. The method of claim 17 , further comprising composing said metallic of each nanostructure of the layer of nanostructures to a height in a range of about 50 nm to about 250 nm.
24. The method of claim 17 , further comprising composing said metallic of each nanostructure of the layer of nanostructures to a width in a range of about 30 nm.
25. The method of claim 17 , further comprising composing the nanostructures to an acceptance angle of up to about +/−20°.
26. A radiation controller, comprising:
means for communicatively coupling at least one anti-reflection coating layer to a substrate;
means for communicatively coupling at least two nanostructures to at least one of the at least one anti-reflection coating layer thereby forming a nanostructure layer, wherein at least one of the at least two nanostructures is comprised of a combination of a metallic element and a dielectric element, each metallic element having a height in a range of about 50 nm to about 250 nm, and a width in a range of about 30 nm, wherein said metallic and dielectric of said combination being located adjacent each other, said metallic having a short surface and a long surface, said dielectric extending only partially along said long surface of said metallic;
means to provide a pass wavelength in the range of about 250 nm to less than about a microwave wavelength;
means for providing substantially between said substrate and said nanostructure layer a plurality of dielectrics, said plurality of dielectrics having a refractive index greater than one; and,
means for allowing for examination of radiation having a wavelength in a range of about 250 nm to 30 microns.
27. The controller of claim 26 , further comprising means for orienting each of the nanostructures parallel to each other of the nanostructures.
28. The controller of claim 26 , further comprising means for separating at least one of the at least two nanostructures from the substrate by at least one etch stop layer.
29. The controller of claim 26 , further comprising means for separating a first of the nanostructures from a second of said nanostructures by at least one selected from the group consisting of air, vacuum and a dielectric material.
30. A monolithic optical device, comprising:
optical radiation;
an optical radiation processor, comprising:
a substrate;
at least one anti-reflection coating layer communicatively coupled to said substrate;
at least two nanostructures communicatively coupled to said at least one anti-reflection coating layer forming a nanostructure layer, wherein at least one of said at least two nanostructures comprises a combination of a metallic and a dielectric, each metallic having a width in the range of about 30 nm, wherein said metallic and dielectric being located adjacent each other, said metallic having a short surface and a long surface, said dielectric extending only partially along said long surface of said metallic; and
wherein said nanostructure layer polarizes the radiation, wherein the radiation has a wavelength in a range of about 250 nm to 30 microns.