Semiconductor device
View Patent ↗A MOS semiconductor device includes n − -type surface regions, which are extended portions of an n − -type drift layer 12 extended to the surface of the semiconductor chip. Each n − -type surface region 14 is shaped with a stripe surrounded by a p-type well region. The surface area ratio between n − -type surface regions 14 and p-type well region 13 including an n + -type region 15 is from 0.01 to 0.2. The MOS semiconductor device further includes, in the breakdown withstanding region thereof, a plurality of guard rings, the number of which is equal to or more than the number n calculated from the following equation n=(Breakdown voltage Vbr (V))/100, and the spacing between the adjacent guard rings is set at 1 μm or less.
1. A semiconductor device comprising:
a semiconductor chip;
a layer with low electrical resistance of a first conductivity type or a second conductivity type in the bottom portion of the semiconductor chip;
a breakdown-voltage sustaining layer above the layer with low electrical resistance, the breakdown-voltage sustaining layer comprising at least one or more semiconductor regions of the first conductivity type;
a well region of the second conductivity type in the surface portion of the breakdown-voltage sustaining layer;
guard rings of the second conductivity type in the surface portion of the semiconductor chip, the guard rings surroundings the well region; and
wherein the spacing between the well region and the first guard ring nearest to the well region being 1 μm or less.
2. The semiconductor device according to claim 1 , wherein the spacing between the well region and the first guard ring is 0.5 μm or less.
3. The semiconductor device according to claim 2 , wherein the first guard ring is in contact with the well region.
4. The semiconductor device according to claim 1 , wherein the spacing between the first guard ring and the second guard ring second nearest to the well region is 1.5 μm or less.
5. The semiconductor device according to claim 4 , wherein the spacing between the first guard ring and the second guard is 1 μm or less.
6. The semiconductor device according to claim 5 , wherein the spacing between the first guard ring and the second guard ring is 0.5 μm or less.
7. The semiconductor device according to claim 4 , wherein the spacing between the second guard ring and the third guard ring third nearest to the well region is 2.0 μm or less.
8. The semiconductor device according to claim 7 , wherein the spacing between the second guard ring and the third guard ring is 1.0 μm or less.
9. The semiconductor device according to claim 7 , wherein the spacing between the third guard ring and the fourth guard ring fourth nearest to the well region is 2.5 μm or less.
10. The semiconductor device according to claim 9 , wherein the spacing between the third guard ring and the fourth guard ring is 2.0 μm or less.
11. The semiconductor device according to claim 1 , wherein the difference I 2 −I 1 between the spacing I 2 between the first guard ring nearest to the well region and the second guard ring second nearest to the well region and the spacing I 1 between the well region and the first guard ring is 1 μm or less.
12. The semiconductor device according to claim 11 , wherein the difference I 2 −I 1 is from 0.2 to 0.8 μm.
13. The semiconductor device according to claim 11 , wherein the difference I 3 −I 2 between the spacing I 3 between the second guard ring and the third guard ring third nearest to the well region and the spacing I 2 between the first guard ring and the second guard ring is 1 μm or less.
14. The semiconductor device according to claim 13 , wherein the difference I 3 −I 2 is from 0.2 to 0.8 μm.
15. The semiconductor device according to claim 13 , wherein the difference I 4 −I 3 between the spacing I 4 between the third guard ring and the fourth guard ring fourth nearest to the well region and the spacing I 3 between the second guard ring and the third guard ring is 1 μm or less.
16. The semiconductor device according to claim 15 , wherein the difference I 4 −I 3 is from 0.2 to 0.8 μm.
17. The semiconductor device according to claim 1 , wherein the number of the guard rings is five or more, and the width of the first guard ring nearest to the well region is wider than the width of the fifth guard ring fifth nearest to the well region.
18. The semiconductor device according to claim 17 , wherein the number of the guard rings is six or more, and the width of the second guard ring second nearest to the well region is wider than the width of the sixth guard ring sixth nearest to the well region.
19. The semiconductor device according to claim 18 , wherein the number of the guard rings is seven or more, and the width of the third guard ring third nearest to the well region is wider than the width of the seventh guard ring seventh nearest to the well region.
20. The semiconductor device according to claim 1 , further comprising an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the well region and the first guard ring nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
21. The semiconductor device according to claim 20 , further comprising an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the first guard ring and the second guard ring second nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
22. The semiconductor device according to claim 21 , wherein the number n of the guard rings is three or more and the semiconductor device further comprises an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the second guard ring and the third guard ring third nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
23. The semiconductor device according to claim 22 , wherein the number n of the guard rings is four or more and the semiconductor device further comprises an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the third guard ring and the fourth guard ring fourth nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
24. The semiconductor device according to claim 20 , wherein the electrical conductor film is at a floating potential.
25. The semiconductor device according to claim 1 , wherein the breakdown-voltage sustaining layer comprises semiconductor regions of the first conductivity type and semiconductor regions of the second conductivity type arranged alternately.
26. The semiconductor device according to claim 1 , further comprising an organic polymer film protecting the surface of the semiconductor device.
27. The semiconductor device according to claim 1 , wherein the number of the guard rings is equal to or more than the number n calculated by the expression n=1.0 or greater×Vbr/100, where Vbr (V) is the breakdown voltage of the semiconductor device.
28. The semiconductor device according to claim 27 , wherein the number of the guard rings is equal to or more than the number n calculated by the expression n=1.5×Vbr/100.
29. The semiconductor device according to claim 27 , wherein the number of the guard rings is equal to or less than the number n calculated by the expression n=6.0×Vbr/100.
30. The semiconductor device according to claim 27 , wherein the spacing between the well region and the first guard ring is 0.5 μm or less.
31. The semiconductor device according to claim 30 , wherein the first guard ring is in contact with the well region.
32. The semiconductor device according to claim 27 , wherein the spacing between the first guard ring and the second guard ring second nearest to the well region is 1.5 μm or less.
33. The semiconductor device according to claim 32 , wherein the spacing between the first guard ring and the second guard is 1 μm or less.
34. The semiconductor device according to claim 33 , wherein the spacing between the first guard ring and the second guard ring is 0.5 μm or less.
35. The semiconductor device according to claim 32 , wherein the spacing between the second guard ring and the third guard ring third nearest to the well region is 2.0 μm or less.
36. The semiconductor device according to claim 35 , wherein the spacing between the second guard ring and the third guard ring is 1.0 μm or less.
37. The semiconductor device according to claim 35 , wherein the spacing between the third guard ring and the fourth guard ring fourth nearest to the well region is 2.5 μm or less.
38. The semiconductor device according to claim 37 , wherein the spacing between the third guard ring and the fourth guard ring is 2.0 μm or less.
39. The semiconductor device according to claim 27 , wherein the difference I 2 −I 1 between the spacing I 2 between the first guard ring nearest to the well region and the second guard ring second nearest to the well region and the spacing I 1 between the well region and the first guard ring is 1 μm or less.
40. The semiconductor device according to claim 39 , wherein the difference I 3 −I 2 between the spacing I 3 between the second guard ring and the third guard ring third nearest to the well region and the spacing I 2 between the first guard ring and the second guard ring is 1 μm or less.
41. The semiconductor device according to claim 40 , wherein the difference I 4 −I 3 between the spacing I 4 between the third guard ring and the fourth guard ring fourth nearest to the well region and the spacing I 3 between the second guard ring and the third guard ring is 1 μm or less.
42. The semiconductor device according to claim 27 , wherein the number of the guard rings is five or more, and the width of the first guard ring nearest to the well region is wider than the width of the fifth guard ring fifth nearest to the well region.
43. The semiconductor device according to claim 42 , wherein the number of the guard rings is six or more, and the width of the second guard ring second nearest to the well region is wider than the width of the sixth guard ring sixth nearest to the well region.
44. The semiconductor device according to claim 43 , wherein the number of the guard rings is seven or more, and the width of the third guard ring third nearest to the well region is wider than the width of the seventh guard ring seventh nearest to the well region.
45. The semiconductor device according to claim 27 , further comprising an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the well region and the first guard ring nearest to the well region with in insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
46. The semiconductor device according to claim 45 , further comprising an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the first guard ring and the second guard ring second nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
47. The semiconductor device according to claim 46 , wherein the number n of the guard rings is three or more and the semiconductor device further comprises an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the second guard ring and the third guard ring third nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
48. The semiconductor device according to claim 47 , wherein the number n of guard rings is four or more and the semiconductor device further comprises an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the third guard ring and the fourth guard ring fourth nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
49. The semiconductor device according to claim 45 , wherein the electrical conductor film is at a floating potential.
50. The semiconductor device according to claim 27 , wherein the breakdown-voltage sustaining layer comprises semiconductor regions of the first conductivity type and semiconductor regions of the second conductivity type arranged alternately.
51. The semiconductor device according to claim 27 , further comprising an organic polymer film protecting the surface of the semiconductor device.
52. A semiconductor device comprising:
a semiconductor chip;
a layer with low electrical resistance of a first conductivity type or a second conductivity type in the bottom portion of the semiconductor chip;
a breakdown-voltage sustaining layer above the layer with low electrical resistance, the breakdown-voltage sustaining layer comprising at least one or more semiconductor regions of the first conductivity type;
a well region of the second conductivity type in the surface portion of the breakdown-voltage sustaining layer;
guard rings of the second conductivity type in the surface portion of the semiconductor chip, the guard rings surroundings the well region; and
wherein the spacing between the well region and the first guard ring nearest to the well region being d 1 /4 or less, said d 1 being a shallower one of the junction depth of the well region and the junction depth of the guard rings.
53. The semiconductor device according to claim 52 , wherein the number of the guard rings is equal to or more than the number n calculated by an expression n=1.0×Vbr/100, where Vbr (V) is the breakdown voltage of the semiconductor device.
54. The semiconductor device according to claim 52 , wherein the spacing between the well region and the first guard ring is d 1 /8 or less.
55. The semiconductor device according to claim 53 , wherein the spacing between the well region and the first guard ring is d 1 /8 or less.
56. The semiconductor device according to claim 52 , wherein the spacing between the first guard ring and the second guard ring second nearest to the well region is d 2 /4 or less, where said d 2 is the junction depth of the guard rings.
57. The semiconductor device according to claim 53 , wherein the spacing between the first guard ring and the second guard ring second nearest to the well region is d 2 /4 or less, where said d 2 is the junction depth of the guard rings.
58. The semiconductor device according to claim 56 , wherein the spacing between the first guard ring and the second guard ring is d 2 /8 or less.
59. The semiconductor device according to claim 57 , wherein the spacing between the first guard ring and the second guard ring is d 2 /8 or less.
60. The semiconductor device according to claim 56 , wherein the spacing between the second guard ring and the third guard ring third nearest to the well region is d 2 /4 or less.
61. The semiconductor device according claim 57 , wherein the spacing between the second guard ring and the third guard ring third nearest to the well region is d 2 /4 or less.
62. The semiconductor device according to claim 60 , wherein the spacing between the second guard ring and the third guard ring is d 2 /8 or less.
63. The semiconductor device according to claim 61 , wherein the spacing between the second guard ring and the third guard ring is d 2 /8 or less.
64. The semiconductor device according to claim 52 , wherein the difference I 2 −I 1 between the spacing I 2 between the first guard ring nearest to the well region and the second guard ring second nearest to the well region and the spacing I 1 between the well region and the first guard ring 1 μm or less.
65. The semiconductor device according to claim 64 , wherein the difference I 2 −I 1 is from 0.2 to 0.8 μm.
66. The semiconductor device according to claim 64 , wherein the difference I 3 −I 2 between the spacing I 3 between the second guard ring and the third guard ring third nearest to the well region and the spacing I 2 between the first guard ring and the second guard ring is 1 μm or less.
67. The semiconductor device according to claim 66 , wherein the difference I 3 −I 2 is from 0.2 to 0.8 μm.
68. The semiconductor device according to claim 66 , wherein the difference I 4 −I 3 between the spacing I 4 between the third guard ring and the fourth guard ring fourth nearest to the well region and the spacing I 3 between the second guard ring and the third guard ring is 1 μm or less.
69. The semiconductor device according to claim 68 , wherein the difference I 4 −I 3 is from 0.2 to 0.8 μm.
70. The semiconductor device according to claim 52 , wherein the number of the guard rings is five or more, and the width of the first guard ring nearest to the well region is wider than the width of the fifth guard ring fifth nearest to the well region.
71. The semiconductor device according to claim 70 , wherein the number of the guard rings is six or more, and the width of the second guard ring second nearest to the well region is wider than the width of the sixth guard ring sixth nearest to the well region.
72. The semiconductor device according to claim 71 , wherein the number of the guard rings is seven or more, and the width of the third guard ring third nearest to the well region is wider than the width of the seventh guard ring seventh nearest to the well region.
73. The semiconductor device according to claim 52 , further comprising an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the well region and the first guard ring nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
74. The semiconductor device according to claim 73 , further comprising an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the first guard ring and the second guard ring second nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
75. The semiconductor device according to claim 74 , wherein the number n of the guard rings is three or more and the semiconductor device further comprises an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the second guard ring and the third guard ring third nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
76. The semiconductor device according to claim 75 , wherein the number n of the guard rings is four or more and the semiconductor device further comprises an electrical conductor film above the surface of the breakdown-voltage sustaining layer between the third guard ring and the fourth guard ring fourth nearest to the well region with an insulation film interposed between the electrical conductor film and the surface of the breakdown-voltage sustaining layer.
77. The semiconductor device according to claim 73 , wherein the electrical conductor film is at a floating potential.
78. The semiconductor device according to claim 52 , wherein the breakdown-voltage sustaining layer comprises semiconductor regions of the first conductivity type and semiconductor regions of the second conductivity type arranged alternately.
79. The semiconductor device according to claim 52 , further comprising an organic polymer film protecting the surface of the semiconductor device.
80. A semiconductor device comprising:
a semiconductor chip;
a layer with low electrical resistance of a first conductivity or a second conductivity type in the bottom portion of the semiconductor chip;
a breakdown-voltage sustaining layer above the layer with low electrical resistance, the breakdown-voltage sustaining layer comprising at least one or more semiconductor regions of the first conductivity type;
a well region of the second conductivity type in the surface portion of the breakdown-voltage sustaining layer; and
guard rings of the second conductivity type in the surface portion of the semiconductor chip, the guard ring surroundings the well region,
wherein the difference I 2 −I 1 between the spacing I 2 between the first guard ring nearest to the well region and the second guard ring second nearest to the well region and the spacing I 1 between the well region and the first guard rings is from 0.2 to 0.8 μm.
81. A semiconductor device comprising:
a semiconductor chip;
a layer with low electrical resistance of a first conductivity type or a second conductivity type in the bottom portion of the semiconductor chip;
a breakdown-voltage sustaining layer above the layer with low electrical resistance, the breakdown-voltage sustaining layer comprising at least one or more semiconductor regions of the first conductivity type;
a well region of the second conductivity type in the surface portion of the breakdown-voltage sustaining layer; and
guard rings of the second conductivity type in the surface portion of the semiconductor chip, the guard rings surroundings the well region,
wherein the difference I 3 −I 2 between the spacing I 3 between the second guard ring second nearest to the well region and the third guard ring third nearest to the well region and the spacing I 2 between the well region and the first guard ring nearest to the well region is from 0.2 to 0.8 μm.
82. A semiconductor device comprising:
a semiconductor chip;
a layer with low electrical resistance of a first conductivity type or a second conductivity type in the bottom portion of the semiconductor chip;
a breakdown-voltage sustaining layer above the layer with low electrical resistance, the breakdown-voltage sustaining layer comprising at least one or more semiconductor regions of the first conductivity type;
a well region of the second conductivity type in the surface portion of the breakdown-voltage sustaining layer; and
guard rings of the second conductivity type in the surface portion of the semiconductor chip, the guard rings surroundings the well region,
wherein the difference I 4 −I 3 between the spacing I 4 between the third guard ring third nearest to the well region and the fourth guard ring fourth nearest to the well region and the spacing I 3 between the second guard ring second nearest to the well region and the third guard ring is from 0.2 to 0.8 μm.