Array substrate for transflective liquid crystal display device and a fabricating method thereof

1. A fabricating method of an array substrate for a transflective liquid crystal display device, comprising:

forming a gate line on a substrate having a display portion and a surrounding portion;

forming a gate insulating layer covering the gate line;.

forming a data line on the gate insulating layer;

forming a gate pad and a data pad within the surrounding portion, the gate pad connected to the gate line and the data pad connected to the data line;

forming a switching device connected to the gate and data lines;

forming a reflective electrode within the display portion and connected to the switching device;

forming a sealant within the surrounding portion;

forming a reflective plate within the surrounding portion and beneath and overlapping the sealant, wherein the reflective plate is disposed exclusively only within a first region opposite to a second region where the gate and data pads are disposed, and wherein the reflective plate surrounds only two sides of the display portion;

forming a passivation layer on the reflective electrode and the reflective plate; and

forming a transmissive electrode on the passivation layer and connected to the reflective electrode.

2. The fabricating method according to claim 1 , wherein the switching device includes a thin film transistor.

3. The fabricating method according to claim 1 , wherein forming the reflective plate and forming the reflective electrode are performed simultaneously.

4. The fabricating method according to claim 1 , further comprising etching he passivation layer to form a contact hole exposing a portion of the reflective electrode.

5. The fabricating method according to claim 4 , wherein the transmissive electrode is connected to the reflective electrode through the contact hole.

6. The fabricating method according to claim 1 , wherein the transmissive electrode includes a transparent conductive material.

7. The fabricating method according to claim 1 , further comprising forming an interlayer insulating layer on the gate insulating layer and the switching device.

8. The fabricating method according to claim 1 , wherein the sealant is formed on the transmissive electrode.

9. The fabricating method according to claim 1 , wherein the reflective plate is electrically floating.

10. A fabricating method for forming a mobile communication system, comprising:

forming a transflective liquid crystal display panel having a display portion and a surrounding portion, wherein the transflective liquid crystal panel includes a gate pad, a data pad, a reflective plate within the surrounding portion, wherein the surrounding portion includes a sealant formed above and overlapping the reflective plate, wherein the reflective plate is disposed exclusively only within a first region opposite to a second region where the gate and data pads are disposed, and wherein the reflective plate surrounds only two sides of the display portion;

forming a backlight unit adjacent to the transflective liquid crystal panel; and forming a case enveloping the surrounding portion and the backlight unit.

11. The fabricating method according to claim 10 , further comprising forming a color filter layer, a transflective electrode, a gate line, and a data line within the display portion.

12. The fabricating method according to claim 11 , wherein forming the transflective electrode includes forming a reflective electrode and a transmissive electrode.

13. The fabricating method according to claim 12 , wherein the reflective electrode and the transmissive electrode overlap.

14. The fabricating method according to claim 12 , wherein forming the reflective electrode includes forming a transmissive hole.

15. The fabricating method according to claim 12 , wherein forming the reflective plate and forming the reflective electrode are simultaneously performed.