Apparatus for the efficient coating of substrates
View Patent ↗A process for the coating of substrates comprising insertion of a substrate into a process oven, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a metered chemical withdrawal subsystem, and a vaporization subsystem.
1. A process for coating of substrates comprising:
inserting a substrate into a process chamber;
dehydrating said substrate in the process chamber prior to reacting a silane with the substrate;
pre-heating a vaporization chamber to a first temperature with a vaporization chamber heater;
pre-determining a first volume of liquid silane to be used for the process;
removing the first volume of liquid silane from a silane liquid reservoir;
supplying the first volume of liquid silane to the heated vaporization chamber, wherein said heated vaporization chamber is fluidically coupled to said process chamber by a passageway open continuously while said first volume of liquid silane is supplied to said heated vaporization chamber;
vaporizing said first volume of liquid silane, wherein the vapor of said first volume of liquid silane enters said process chamber through the open passageway, whereby the vapor of said first volume of liquid silane reacts with the substrate to create a layer.
2. The process of claim 1 , wherein said first liquid silane reservoir is a chemical manufacturer's source bottle.
3. The process of claim 1 , wherein said dehydrating a substrate comprises:
inserting said substrate into said process chamber;
evacuating said chamber to a first pressure;
inputting a first gas into said process chamber after evacuating said chamber to a first pressure.
4. The process of claim 3 wherein said first gas is an inert gas.
5. The process of claim 4 wherein said inert gas is nitrogen.
6. The process of claim 3 wherein said first gas is heated.
7. The process of claim 3 further comprising re-evacuating said process chamber subsequent to said inputting a first gas into said process chamber.
8. The process of claim 7 wherein said re-evacuating said process chamber evacuates said process chamber to a second pressure.
9. The process of claim 8 wherein said second pressure is lower than said first pressure.
10. The process of claim 1 further comprising:
supplying a second chemical to a heated vaporization chamber;
vaporizing said second chemical; and
supplying the vapor of said second chemical to said process chamber.
11. The process of claim 1 wherein said vaporizing said first volume of liquid silane occurs in a first vaporization chamber.
12. The process of claim 11 wherein said vaporizing said first volume of liquid silane comprises heating said first volume of liquid silane.
13. The process of claim 11 wherein said vaporizing said first volume of liquid silane comprises exposing said first volume of liquid silane to reduced pressure.
14. The process of claim 12 wherein said vaporizing said first volume of liquid silane further comprises exposing said first volume of liquid silane to reduced pressure.
15. The process of claim 10 wherein said vaporizing said first volume of liquid silane occurs in a first vaporization chamber.
16. The process of claim 15 wherein said vaporizing said second chemical occurs in said first vaporization chamber.
17. The process of claim 16 wherein said vaporizing said first volume of liquid silane and said vaporizing said second chemical occur relatively simultaneously.