Multi-segmented embossing apparatus and method

1. An embossing apparatus, comprising a rotary embossing device having an axis of rotation, an axial direction, a radial direction, a circumferential direction, and an outer peripheral surface, said embossing device including:

at least a first embossing-component which extends at least radially outward from said peripheral surface and is configured to provide for a first embossing-pattern;

a rotary shaft member;

at least a first, base embossing-segment which is operatively joined to said rotary shaft member and is configured to carry a first base-section of said first embossing-component;

a first, supplemental embossing-segment which is operatively joined to be selectively positionable on said rotary shaft member, and is configured to carry a first supplemental-section of said first embossing-component;

a first, spacing-mechanism for adjusting a radial position of said first, supplemental embossing-segment;

a first, supplemental attachment-mechanism which secures the radial position of said first supplemental embossing-segment.

2. An embossing apparatus as recited in claim 1 , wherein said embossing device further includes

a second, supplemental embossing-segment which is operatively joined to be selectively positionable on said rotary shaft member, and is configured to carry a second supplemental-section of said first embossing-component;

a second, spacing-mechanism for adjusting a radial position of said second, supplemental embossing-segment on said rotary shaft member; and

a second, supplemental attachment-mechanism which secures the radial position of said second, supplemental embossing-segment.

3. An embossing apparatus, comprising a rotary embossing device having an axis of rotation, an axial direction, a radial direction, a circumferential direction, and an outer peripheral surface, said embossing device including:

at least a first embossing-component which extends at least radially outward from said peripheral surface and is configured to provide for a first embossing-pattern;

a rotary shaft member;

at least a first, base embossing-segment which is operatively joined to said rotary shaft member and is configured to carry a first base-section of said first embossing-component;

a first, supplemental embossing-segment which is operatively joined to be selectively positionable on said rotary shaft member, and is configured to carry a first supplemental-section of said first embossing-component;

a first, spacing mechanism for adjusting a radial position of said first supplemental embossing-segment;

a first, supplemental attachment mechanism which secures the radial position of said first supplemental embossing-segment;

a second, supplemental embossing-segment which is operatively joined to be selectively positionable on said rotary shaft member, and is configured to carry a second supplemental-section of said first embossing-component;

a second, spacing mechanism for adjusting a radial position of said second supplemental embossing-segment;

a second, supplemental attachment mechanism which secures the radial position of said second supplemental embossing-segment;

at least a third supplemental embossing-segment which is operatively joined to said rotary shaft member and is configured to provide for a second embossing-pattern; and

a third spacing mechanism for adjusting a radial position of said third supplemental embossing-segment on said rotary shaft member.

4. An apparatus as recited in claim 1 , further comprising a cooperating rotary anvil which is located operatively adjacent said rotary embossing device.

5. An apparatus as recited in claim 1 , wherein said first spacing mechanism includes at least one separately provided shim member which is located between said rotary shaft member and said first supplemental embossing-segment.

6. An apparatus as recited in claim 1 , wherein embossing-component has a back-and-forth configuration located along at least the base-section of said first embossing-component, the back-and-forth configuration having a traversing frequency which is at least a minimum of about 1 cycle arranged to occur with a 5 cm, circumferential length section of said first embossing-component.

7. An apparatus as recited in claim 6 , wherein said back-and-forth configuration includes a lateral traversing distance which is at least a minimum of about 0.1 cm.

8. An apparatus as recited in claim 1 , further comprising a cooperating rotary, patterned anvil which is located operatively adjacent said rotary embossing device;

wherein said rotary anvil has an outer peripheral anvil surface; and

said anvil surface includes an anvil pattern which cooperatively matches said embossing pattern.

9. An embossing process, comprising: rotating a rotary embossing device having an axis of rotation, an axial direction, a radial direction, a circumferential direction, an outer peripheral surface, and a first embossing-component which has been configured to extend radially outward from said peripheral surface to provide for a first embossing-pattern;

wherein

said rotary embossing device has included

a rotary shaft member,

at least a first, base embossing-segment which is operatively joined to said rotary shaft member, and

a first, supplemental embossing-segment which is joined to said rotary shaft member and is selectively positionable on said rotary shaft member;

a radial position of said first, supplemental embossing-segment on said rotary shaft member has been adjusted with a first spacing mechanism; and

the radial position of said first, supplemental embossing-segment has been secured with a first, supplemental attachment-mechanism.

10. An embossing process as recited in claim 9 , wherein

said rotary embossing device has further included a second, supplemental embossing-segment which is joined to said rotary shaft member and is selectively positionable on said rotary shaft member;

a radial position of said second, supplemental embossing-segment on said rotary shaft member has been adjusted with a second spacing mechanism; and

the radial position of said second, supplemental embossing-segment has been secured with a second, supplemental attachment-mechanism.

11. An embossing process, comprising: rotating a rotary embossing device having an axis of rotation, an axial direction, a radial direction, a circumferential direction, an outer peripheral surface, and a first embossing-component which has been configured to extend radially outward from said peripheral surface to provide for a first embossing-pattern;

wherein

said rotary embossing device has included

a rotary shaft member,

at least a first, base embossing-segment which has been operatively joined to said rotary shaft member,

a first, supplemental embossing-segment which has been joined to said rotary shaft member and has been selectively positioned on said rotary shaft member,

a second, supplemental embossing-segment which has been joined to said rotary shaft member and has been selectively positioned on said rotary shaft member, and

at least a third supplemental embossing-segment which has been operatively joined to said rotary shaft member;

a radial position of said first, supplemental embossing-segment on said rotary shaft member has been adjusted with a first segment-spacing mechanism;

the radial position of said first, supplemental embossing-segment has been secured with a first, supplemental attachment-mechanism;

a radial position of said second supplemental embossing-segment on said rotary shaft member has been adjusted with a second segment-spacing mechanism; and

a radial position of said third supplemental embossing-segment has been adjusted with a corresponding third segment-spacing mechanism.

12. An embossing process as recited in claim 11 , wherein

the radial position of said second, supplemental embossing-segment has been secured with a second, supplemental attachment-mechanism; and

the radial position of said third, supplemental embossing-segment has been secured with a third, supplemental attachment-mechanism.

13. An embossing process as recited in claim 11 , further including cooperatively rotating a rotary anvil which has been located operatively adjacent said rotary embossing device.

14. An embossing process as recited in claim 11 , wherein said first spacing mechanism has included at least one separately provided shim member which has been located between said rotary shaft member and said first supplemental embossing-segment.

15. An embossing process as recited in claim 11 , wherein said first and second supplemental-sections of the first embossing-component are arranged to intersect and extend substantially continuously with respect to said base-section of the first embossing-component.

16. An embossing process as recited in claim 11 , wherein said first and second supplemental-sections of the first embossing-component are arranged to intersect and extend non-continuously with respect to said base-section of the first embossing-component.

17. An embossing process as recited in claim 11 , wherein said rotary shaft member includes a first support slot configured with a size and shape which operatively accommodates a placement of said first supplemental embossing-segment therein.

18. An embossing process as recited in claim 17 , wherein said rotary shaft member has included a second support slot configured with a size and shape which operatively accommodates the placement of said second supplemental embossing-segment therein.

19. An embossing process as recited in claim 18 , wherein said rotary shaft member has included an operative support mechanism which is appropriately configured to hold and carry said third supplemental embossing-segment.

20. An embossing process as recited in claim 18 , wherein said rotary shaft member has included a socket region that is appropriately sized and shaped to operatively accommodate the placement of said third supplemental embossing-segment into said socket region.