Bi-directional silicon controlled rectifier for electrostatic discharge protection
View Patent ↗A bi-directional silicon controlled rectifier formed in a silicon layer and disposed over shallow trench isolations and therefore electrically isolated from the substrate to be insensitive to substrate noise for electrostatic discharge protection an electrostatic discharge protection device that includes a semiconductor substrate, including a first p-type portion, a first n-type portion contiguous with the first p-type portion, a second p-type portion contiguous with the first p-type portion and the first n-type portion, a second n-type portion, a third p-type portion, a third n-type portion contiguous with the third p-type portion, and a fourth p-type portion contiguous with the third p-type portion and the third n-type portion, wherein at least one of the first p-type portion, second p-type portion, third p-type portion, fourth p-type portion, first n-type portion, second n-type portion, and third n-type portion overlaps the isolation structure.
1. A method for protecting a complementary metal-oxide semiconductor device from electrostatic discharge, comprising:
providing a bi-directional silicon controlled rectifier in the complementary metal-oxide semiconductor circuit;
isolating the bi-directional silicon controlled rectifier from a substrate of the complementary metal-oxide semiconductor circuit;
providing a signal pad coupled to the bi-directional silicon controlled rectifier for receiving an electrostatic discharge; and
protecting the device from the electrostatic discharge with the bi-directional silicon controlled rectifier.
2. The method as claimed in claim 1 , wherein the electrostatic discharge is a positive discharge.
3. The method as claimed in claim 1 , wherein the electrostatic discharge is a negative discharge.
4. The method as claimed in claim 1 , wherein the step of isolating the bi-directional silicon controlled rectifier from a substrate of the complementary metal-oxide semiconductor circuit includes a step of providing an insulator layer between the substrate and the bi-directional silicon controlled rectifier.
5. The method as claimed in claim 4 , further comprising a step of forming the bi-directional silicon controlled rectifier in a layer of silicon.