Granted Patent B1

US 6,841,523 · App. 10/670,407 · Granted Jan 11, 2005

Abstract

Claims (15)

1. A single phase aqueous based nail polish remover composition comprising:

a) about 20 to about 80% methyl acetate;

b) about 5% to about 75% of a glycol ether coupling agent;

c) an effective amount of a buffering agent to maintain a pH of about 5 to about 9; and

d) about 10% to about 70% water.

2. The composition of claim 1 including about 0.1% to about 10% of a dimethyl ester with a vapor pressure of less than 0.1 mm Hg at 20° C.

3. The composition of claim 1 wherein the buffering agent is about 0.01% to about 1.0% sodium acetate.

4. The composition of claim 1 including about 0 to about 10% additives selected from the group consisting of dyes, conditioning agents, emollients, humectants and mixtures thereof.

5. The composition of claim 1 including about 1.0% to about 20% acetone.

6. The composition of claim 5 including about 5% acetone.

7. The composition of claim 1 wherein the pH is about 7.

8. The composition of claim 1 including a humectant for improving nail and skin conditioning.

9. The composition of claim 8 wherein the humectant is selected from the group consisting of glycerin, propylene glycol and fatty acid esters.

10. The composition of claim 1 wherein the glycol ether is diethylene glycol monobutyl ether.

11. The composition of claim 2 wherein the dimethyl ester is a blend of dimethyl adipate and dimethyl glutarate.

Assignments (8)