IP Library Patent Application 10676555
Patent Application Utility
App. No. 10/676,555 · Confirmation No. 7657

Hillock-free gate layer and method of manufacturing the same

Inventor: Cheng-Chi Wang
Abandoned -- Failure to Respond to an Office Action View Publication ↗
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Code Description Pages PDF
2005-04-05 ABN Abandonment 2 View
2004-06-14 CTNF Non-Final Rejection 6 View
2004-06-14 892 List of references cited by examiner 1 View
2004-06-14 FWCLM Index of Claims 1 View
2004-06-14 SRFW Search information including classification, databases and other search related notes 1 View
2004-06-08 SRNT Examiner's search strategy and results 2 View
2003-10-01 TRNA Transmittal of New Application 3 View
2003-10-01 SPEC Specification 12 View
2003-10-01 CLM Claims 2 View
2003-10-01 ABST Abstract 1 View
2003-10-01 DRW Drawings-only black and white line drawings 2 View
2003-10-01 OATH Oath or Declaration filed 2 View
2003-10-01 FRPR Certified Copy of Foreign Priority Application 22 View
2003-10-01 WFEE Fee Worksheet (SB06) 1 View
2003-10-01 WFEE Fee Worksheet (SB06) 1 View
2003-10-01 136A Authorization for Extension of Time all replies 3 View
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Quick Facts
App. No.
10/676,555
Filed
2003-10-01
Pub. No.
US20040140490A1
Art Unit
2813